Download or read book Efficient Extreme Ultraviolet Mirror Design written by Yen-Min Lee and published by . This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method.
Download or read book Extreme Ultraviolet Astronomy written by Martin A. Barstow and published by Cambridge University Press. This book was released on 2003-03-13 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the development of astronomy in the Extreme Ultraviolet wavelength range, from the first rocket-based experiments to later satellite missions. It will be of great value to graduate students and researchers.
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Astrophysics in the Extreme Ultraviolet written by Stuart Bowyer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 603 pages. Available in PDF, EPUB and Kindle. Book excerpt: From the beginning of Space Astronomy, the Extreme Ultraviolet band of the spectrum (roughly defined as the decade in energy from 90-900 Å) was deemed to be the `unobservable ultraviolet'. Pioneering results from an EUV telescope on the Apollo-Soyuz Mission in 1975 forcibly demonstrated that this view was incorrect; but it required the all-sky surveys of the English Wide-Field Camera and the Extreme Ultraviolet Explorer to demonstrate the broad potential of this field. Over 700 EUV sources have now been detected. Over 150 researchers from 16 countries gathered to share results in this new field at the International Astronomical Union Colloquium No. 152. Papers were presented on a wide variety of topics including cool star coronae, white dwarf atmospheres and evolution, neutron stars, the Io torus, cataclysmic variable stars, active galactic nuclei, the interstellar medium, winds and atmospheres of early type stars, and EUV plasma diagnostics. Selected manuscripts from this meeting are provided in these Conference Proceedings.
Download or read book Ultraviolet Visible and Gravity Astrophysics written by and published by . This book was released on 1992 with total page 84 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Vacuum Ultraviolet Spectroscopy I written by and published by Academic Press. This book was released on 1998-08-17 with total page 441 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume is for practitioners, experimentalists, and graduate students in applied physics, particularly in the fields of atomic and molecular physics, who work with vacuum ultraviolet applications and are in need of choosing the best type of modern instrumentation. It provides first-hand knowledge of the state-of-the-art equipment sources and gives technical information on how to use it, along with a broad reference bibliography.Key Features* Aimed at experimentalists who are in need of choosing the best type of modern instrumentation in this applied field* Contains a detailed chapter on laboratory sources* Provides an up-to-date description of state-of-the-art equipment and techniques* Includes a broad reference bibliography
Download or read book Plasma Processing of Nanomaterials written by R. Mohan Sankaran and published by CRC Press. This book was released on 2017-12-19 with total page 417 pages. Available in PDF, EPUB and Kindle. Book excerpt: We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.
Download or read book Publications of the National Institute of Standards and Technology Catalog written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1991 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Applications of Thin film Multilayered Structures to Figured X ray Optics written by Gerald F. Marshall and published by . This book was released on 1985 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Astronomy and Astrophysics Abstracts written by S. Böhme and published by Springer Science & Business Media. This book was released on 2013-12-14 with total page 1180 pages. Available in PDF, EPUB and Kindle. Book excerpt: From the reviews: Astronomy and Astrophysics Abstracts has appeared in semi-annual volumes since 1969 and it has already become one of the fundamental publications in the fields of astronomy, astrophysics and neighbouring sciences. It is the most important English-language abstracting journal in the mentioned branches. ... The abstracts are classified under more than hundred subject categories, thus permitting a quick survey of the whole extended material. The AAA is a valuable and important publication for all students and scientists working in the fields of astronomy and related sciences. As such it represents a necessary ingredient of any astronomical library all over the world." Space Science Reviews #1 "Dividing the whole field plus related subjects into 108 categories, each work is numbered and most are accompanied by brief abstracts. Fairly comprehensive cross-referencing links relevant papers to more than one category, and exhaustive author and subject indices are to be found at the back, making the catalogues easy to use. The series appears to be so complete in its coverage and always less than a year out of date that I shall certainly have to make a little more space on those shelves for future volumes." The Observatory Magazine #1
Download or read book Publications written by United States. National Bureau of Standards and published by . This book was released on 1981 with total page 684 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book NBS Special Publication written by and published by . This book was released on 1968 with total page 684 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Download or read book High Resolution X ray Spectroscopy of Cosmic Plasmas written by International Astronomical Union. Colloquium and published by Cambridge University Press. This book was released on 1990-04-26 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book gives an account of the proceedings of the International Astronomical Union Colloquium 115: High Resolution X-Ray Spectroscopy of Cosmic Plasmas. This was the first IAU meeting dedicated to high resolution X-ray spectroscopy of objects outside the solar system. A broad range of objects and astrophysical conditions are discussed. Results from the first generation of satellites with spectroscopic capability, i.e. the Einstein Observatory, EXOSAT, and Tenma, are reviewed from a perspective of a more precise interpretation allowed by improved theoretical models and plasma diagnostics. Laboratory and solar X-ray results that model or are relevant to conditions found in cosmic X-ray sources are also presented. The colloquium presents a forum for discussion of scientific objectives of new international missions in high resolution X-ray spectroscopy.
Download or read book UV and X Ray Spectroscopy of Laboratory and Astrophysical Plasmas written by Eric H. Silver and published by Cambridge University Press. This book was released on 2004-01-29 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: Up-to-date accounts of recent and future advances in short-wavelength spectroscopy of laboratory and cosmic plasmas.
