Download or read book Effect of Oxygen argon Gas Ratio on the Structure and Optical Properties of Sputter deposited Nanocrystalline HfO2 Thin Films written by and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Structure Optical Behavior and Thermal Stability of Sputter deposited HfO2 Single Layer and HfO2 Al2O3 Nanolaminate Thin films written by Elizabeth Ellen Hoppe and published by . This book was released on 2009 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Structural Optical and Electrical Properties of WOxNy Filmsdeposited by Reactive Dual Magnetron Sputtering written by and published by . This book was released on 2006 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin films of tungsten oxynitride were prepared by dual magnetron sputtering of tungsten using argon/oxygen/nitrogen gas mixtures with various nitrogen/oxygen ratios. The presence of even small amounts of oxygen had a great effect not only on the composition but on the structure of WOxNy films, as shown by Rutherford backscattering and x-ray diffraction, respectively. Significant incorporation of nitrogen occurred only when the nitrogen partial pressure exceeded 89 percent of the total reactive gas pressure. Sharp changes in the stoichiometry, deposition rate, room temperature resistivity, electrical activation energy and optical band gap were observed when the nitrogen/oxygen ratio was high. The deposition rate increased from 0.31 to 0.89 nm/s, the room temperature resistivity decreased from 1.65 x 108 to 1.82 x 10-2?cm, the electrical activation energy decreased from 0.97 to 0.067 eV, and the optical band gap decreased from 3.19 to 2.94 eV upon nitrogen incorporation into the films. WOxNy films were highly transparent as long as the nitrogen incorporation was low, and were brownish (absorbing) and partially reflecting as nitrogen incorporation became significant.
Download or read book Glancing Angle Deposition of Thin Films written by Matthew M. Hawkeye and published by John Wiley & Sons. This book was released on 2014-07-03 with total page 435 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a highly practical treatment of Glancing Angle Deposition (GLAD), a thin film fabrication technology optimized to produce precise nanostructures from a wide range of materials. GLAD provides an elegant method for fabricating arrays of nanoscale helices, chevrons, columns, and other porous thin film architectures using physical vapour deposition processes such as sputtering or evaporation. The book gathers existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers: Development and description of GLAD techniques for nanostructuring thin films Properties and characterization of nanohelices, nanoposts, and other porous films Design and engineering of optical GLAD films including fabrication and testing, and chiral films Post-deposition processing and integration to optimize film behaviour and structure Deposition systems and requirements for GLAD fabrication A patent survey, extensive relevant literature, and a survey of GLAD's wide range of material properties and diverse applications.
Download or read book Advanced Strategies in Thin Film Engineering by Magnetron Sputtering written by Alberto Palmero and published by MDPI. This book was released on 2020-12-10 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.
Download or read book Crystal Structure Phase and Optical Properties of Yttrium doped Hafnium Oxide Nanocrystalline Thin Films written by Alejandro Ortega and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Effect of RF Sputtering Deposition Parameters on the Functional Properties of Chrom Ium Oxide Thin Films written by John Gerald Kavanagh and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: An investigation was made into the effect of rf magnetron deposition parameters on the resulting properties of chromium oxide thin films. The films were sputtered in an argon/ oxygen plasma environment with the main deposition parameters being the argon and oxygen flow rate, chamber pressure, deposition-time and the deposition power (forward and back). Tire effect of the sputter deposition regime which is controlled by the sputtering hysteresis phenomenon i.e. the reactive and metallic regimes, are expected to have a significant effect on the properties of the sputtered films and will have to be taken into account. The films were deposited on a range of substrates such as silicon, glass micro-slides and stainless steel 304 and the composition of the mainly amorphous sputtered films was determined through XPS, EDX and XRD. Optical characterisation and determination of optical constants was undertaken by transmission/reflection spectrophotometry, ellipsometry and Raman and FTIR analysis. Two designs of a solar thermal absorber (multilayer interference and tandem absorber) were designed and fabricated based on the optical constants measured by the methods previously stated and their performance analysed. The surface energy was calculated through measurement of the contact angle with three different liquids and the corrosion resistance of the films measured by OCP, linear sweep and EIS analysis in 3.5wt% NaCI solution. The mechanical properties were measured by nanoindentation, from which the hardness and elastic modulus of the samples could be obtained. The electrical properties were measured using a four point probe to calculate the thin film resistivity and the Kelvin probe analysis was used to measure the work function of the samples.
Download or read book The Formation Characterization and Application of Sputtered Al203 and Gamma Fe202 Thin Films written by Ga-Lane Chen and published by . This book was released on 1985 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Thin Film Metal Oxides written by Shriram Ramanathan and published by Springer Science & Business Media. This book was released on 2009-12-03 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.
Download or read book Microstructure and Electrical Performance of Sputter deposited Hafnium Oxide HfO2 Thin Films written by Brandon A. Aguirre and published by . This book was released on 2009 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Microstructure and Superlattice Effects on the Optical Properties of Ferroelectric Thin Films written by Jussi Hiltunen and published by . This book was released on 2008 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis deals with the microstructure effects on the optical properties of (i) polycrystalline Nd-modified lead-zirkonium-titanate (PNZT) and (ii) highly oriented BaTiO3 (BTO) thin films together with the stacking structure influence on the optical properties of (iii) BaTiO3-SrTiO3 (STO) superlattice thin films. All the films were grown on MgO(001) substrates by pulsed laser deposition. Different structures were obtained by tuning the thin film processing conditions. PNZT thin films were deposited at room temperature and different crystallite size distributions were produced by varying the post-annealing temperature. The refractive index and electro-optic responses were found to increase with increasing mean crystallite size. Oxygen pressure during the film deposition at 700 °C was found to be a very critical parameter to modify the crystallographic and consequent other physical properties of BTO thin films as suggested by the dielectric and optical measurements. Low oxygen pressure films were epitaxial, with elongated lattice parameters along the surface normal, while increased working oxygen pressure produced non-epitaxial films with lattice elongation along the in-plane orientation. An effective electro-optic coefficient of ~21 pm/V was measured for the BTO films. Periodic BTO-STO superlattices were deposited with varying stacking periodicity between 27 and 1670 A. Birefringence decreased with increasing stacking periodicity, due to relaxation of the lattice strain induced by the layer interfaces. The electro-optic response was found to reach a maximum at a specific stacking periodicity and it decreases with both increasing and decreasing individual layer thickness. The operation of a Mach-Zehnder waveguide intensity modulator based on the BTO-STO superlattice with effective electro-optic coefficient of 73 pm/V was also demonstrated.
Download or read book Growth by Sputtering and Optical Properties of Titanium nitrogen oxygen Thin Films written by Michael David Rubin and published by . This book was released on 1988 with total page 334 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Preparation and Post Annealing Effects on the Optical Properties of Indium Tin Oxide Thin Films written by Rongxin Wang and published by Open Dissertation Press. This book was released on 2017-01-26 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This dissertation, "Preparation and Post-annealing Effects on the Optical Properties of Indium Tin Oxide Thin Films" by Rongxin, Wang, 王榮新, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. Abstract: Abstract of thesis entitled PREPARATION AND POST-ANNEALING EFFECTS ON THE OPTICAL PROPERTIES OF INDIUM TIN OXIDE THIN FILMS Submitted by WANG Rong Xin for the degree of Doctor of Philosophy at The University of Hong Kong in April 2005 Many opto-electronic devices, such as III-V compound devices, liquid crystal displays, solar cells, organic and inorganic light emitting devices, and ultraviolet photodetectors, demand transparent electrode materials simultaneously having high electrical conductance. To meet the requirements for particular applications, a great deal of basic research and studies have been carried out on the electrical and optical properties of these materials. As a most promising candidate for such materials, indium tin oxide (ITO) has attracted interest in recent years. Furthermore, ITO has many unique properties such as excellent adhesion on the substrate, thermal stability and ease of patterning. The deposition of high-quality ITO thin films is a key step for successful application of ITO thin films as transparent electrode materials. To obtain optimal electrical and optical properties of ITO films, the growth parameters and conditions must be determined. Moreover, the optical and electrical properties of ITO contact layers, which can either be on the top side or the bottom side of a device, are influenced by various post-deposition treatments. For the present work, ITO thin films were deposited on glass and quartz substrates using e-beam evaporation with different deposition rates. The influence of substrate material, deposition rate, deposition gas environment and post-deposition annealing on the optical properties of the films was investigated in detail. Atomic force microscopy, X-ray diffraction and X-ray photoemission spectroscopy was employed to obtain information on the chemical state and crystallization of the films. Analysis of these data suggests that the substrate material, deposition rate, deposition gas environment and post-deposition annealing conditions strongly affect the chemical composition and the microstructure of the ITO films and these in turn influence the optical properties of the film. Oxygen incorporation transfers the In O phase to the In O phase and removes metallic In to form both indium oxide 2 3-x 2 3 phases. Both of these reactions are beneficial for the optical transmittance of ITO thin films. Moreover, it was found that the incorporation and decomposition reactions of oxygen can be controlled so as to change the optical properties of the ITO thin films reversibly. DOI: 10.5353/th_b3154617 Subjects: Thin films - Optical properties Indium compounds Annealing of metals
Download or read book Controlling Opto electric Properties of Cadmium Stannate Thin Films Deposited by RF Sputtering written by Evan Kimberly and published by . This book was released on 2011 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: In this research, the optical and electrical properties of cadmium stannate thin films were studied in order to determine how these properties depend on the deposition and heat treatment conditions used during film formation. Trends in band gap energy, transmittance, mobility, resistivity and carrier density were studied, as well as the growth rate and the indices of refraction and extinction. Optical data was primarily measured using variable angle spectroscopic ellipsometry. In the process of acquiring this data, a procedure for accurately determining the optical properties using variable angle spectroscopic ellipsometry was developed. Ultimately, samples achieved the highest quality when deposited in 5% atmospheric oxygen at room temperature and heat treated at 600 °C in contact with a cadmium sulfide layer in an argon atmosphere. It was found that oxygen content and film thickness may affect the heat treatment process, while temperature treatments below 600 °C will not sufficiently induce crystallization. Further study should be given to controlling the cadmium sulfide diffusion rate in order to optimize carrier density and mobility.
Download or read book Microstructure and Properties of Hard and Optically Transparent HfO2 Films Prepared by High rate Reactive High power Impulse Magnetron Sputtering written by Nai-Wen Pi and published by . This book was released on 2016 with total page 50 pages. Available in PDF, EPUB and Kindle. Book excerpt: Hafnium Dioxide (HfO2) has an extraordinary high bulk modulus, high hardness, high chemical stability, high melting point and high thermal stability. This material can be used as protective coatings for application involving high temperature environments. HfO2 films were fabricated on Si using high-rate reactive high-power impulse magnetron sputtering (HiPIMS) using different deposition-averaged target power density Sd and voltage pulse durations t1. Five HfO2 films were prepared with (1) t1 = 25 microsecond, Sd = 7.6 Wcm−2 (T25S7), (2) t1 = 100 microsecond Sd =7.2 Wcm−2 (T100S7), (3) t1 = 200 microsecond, Sd =7.3 Wcm−2 (TS200S7), (4) t1 = 200 microsecond, Sd =18 Wcm−2 (T200S18) and (5) t1 = 200 microsecond, Sd =54 Wcm−2 (T200S54). Atomic force microscopy (AFM) images of the T200S54, T200S18 and T200S7 films exhibit a coarser granular structure with a similar grain size varying from 25 nm to 120 nm in diameter and an average grain size of ~70 nm. AFM images of the T25S7 and T100S7 films show smaller granular structures compared to the other three films. Transmission electron microscopy (TEM) studies show that all films are composed of an interlayer next to the Si interface followed by a nano-columnar structure layer. The interlayer structure of the films consists of a population of lower density nanoscale regions. A reduction in t1 and Sd in films T200S54, T200S18, T200S7 and T100S7 caused an increase in the interlayer thickness and a decrease in the width of the nano-columnar structures from ~46 nm to ~21 nm. This microstructural change was accompanied by a concomitant change of the grain boundary structure from tight and interlocking in films T200S54 and T200S18, to rough and thicker (~1 nm) boundaries in films T200S7 and T100S7. Film T25S7 exhibited an entirely different microstructure composed of a multilayered interlayer (~3 nm) and nano-columnar (~15 nm) structure. Films prepared with large t1 (200 microsecond) have a monoclinic HfO2 structure and that with small t1 (25 microsecond) an orthorhombic HfO2 structure. Film prepared with an intermediate t1 value (100 microsecond) exhibited a mixture of both monoclinic and orthorhombic phases. A high hardness of 17.6-17.0 GPa was shown for films with a monoclinic HfO2 structure. The films exhibited a refractive index of 2.02-2.11 and an extinction coefficient between [less than or equal to] 2x10-3 and 0.1x10-3 (both at a wavelength of 550 nm). High optical quality was achieved for films T200S54 and T200S18 owing to the presence of a dense microstructure with sharp and interlocking grain boundaries.
Download or read book An Investigation of Electrical and Optical Properties of Sputtered Amorphous Silicon Nitride and Germanium Thin Films written by Rajendra S. Khandelwal and published by . This book was released on 1987 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low temperature preparation of thin amorphous Silicon Nitride and Germanium Films by direct RF sputter deposition was investigated. Influence of various sputtering parameters on film properties was studied. Infrared transmission spectrophotometry was used to evaluate optical properties of the films whereas electrical characteristics of the films were determined from current-voltage measurements of MIS structures. For Silicon Nitride films it was observed that the stoichiometry, as indicated by the IR transmission, dielectric constant and current density versus square root of electric field measurements, was a strong function of the sputtering gas composition and particularly the Ar/N ratio in the sputtering gas. It was established from the current-voltage relationship that the dominant conduction mechanism in these films is of PooleFrenkel type. The current-voltage characteristics of the MIS devices were observed to be independent of the electrode material, device area and the film thickness. It is concluded that the insulating films thus deposited were comparable to those deposited using any other deposition method and is anticipated that due to the low deposition temperatures, sputtering may emerge as a highly potential process for optoelectronic device passivation.
Download or read book Effect of Plasma energy Plasma Power Working Distance and Inert Gas Pressure on Composition of Sputtered Thermoelastic Titanium nickel Thin Films written by Jiun-Chung Lee and published by . This book was released on 1994 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt:
