Download or read book Microwave Discharges written by Carlos M. Ferreira and published by Springer Science & Business Media. This book was released on 2013-11-21 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of a NATO ARW held in Vimeiro, Portugal, May 11-15, 1992

Download or read book The Physics and Technology of Ion Sources written by Ian G. Brown and published by John Wiley & Sons. This book was released on 2006-03-06 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.

Download or read book Electron Cyclotron Resonance Ion Sources and ECR Plasmas written by R Geller and published by Routledge. This book was released on 2018-12-13 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt: Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour

Download or read book High Density Plasma Sources written by Oleg A. Popov and published by . This book was released on 1995 with total page 445 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing.

Download or read book Recent Developments in Mechatronics and Intelligent Robotics written by Srikanta Patnaik and published by Springer Nature. This book was released on 2020-03-04 with total page 892 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book gathers selected papers presented at the Third International Conference on Mechatronics and Intelligent Robotics (ICMIR 2019), held in Kunming, China, on May 25–26, 2019. The proceedings cover new findings in the following areas of research: mechatronics, intelligent mechatronics, robotics and biomimetics; novel and unconventional mechatronic systems; modeling and control of mechatronic systems; elements, structures and mechanisms of micro- and nano-systems; sensors, wireless sensor networks and multi-sensor data fusion; biomedical and rehabilitation engineering, prosthetics and artificial organs; artificial intelligence (AI), neural networks and fuzzy logic in mechatronics and robotics; industrial automation, process control and networked control systems; telerobotics and human–computer interaction; human–robot interaction; robotics and artificial intelligence; bio-inspired robotics; control algorithms and control systems; design theories and principles; evolutional robotics; field robotics; force sensors, accelerometers and other measuring devices; healthcare robotics; kinematics and dynamics analysis; manufacturing robotics; mathematical and computational methodologies in robotics; medical robotics; parallel robots and manipulators; robotic cognition and emotion; robotic perception and decisions; sensor integration, fusion and perception; and social robotics.

Download or read book Selected Topics in Plasma Physics written by Sukhmander Singh and published by BoD – Books on Demand. This book was released on 2020-11-19 with total page 146 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is planned to introduce the advances topics of plasma physics for research scholars and postgraduate students. This book deals with basic concepts in plasma physics, non-equilibrium plasma modeling, space plasma applications, and plasma diagnostics. It also provides an overview of the linear and nonlinear aspects of plasma physics. Chapters cover such topics as plasma application in space propulsion, microwave–plasma interaction, plasma antennas, solitary waves, and plasma diagnostic techniques.

Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2005-04-08 with total page 795 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

Download or read book Electrical Probes for Plasma Diagnostics written by John Douglas Swift and published by Iliffe. This book was released on 1969 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Physics of Electric Propulsion written by Robert G. Jahn and published by Courier Corporation. This book was released on 2006-05-26 with total page 370 pages. Available in PDF, EPUB and Kindle. Book excerpt: Literaturangaben. - Originally published: New York, NY : McGraw-Hill, 1968

Download or read book Physics of Radio Frequency Plasmas written by Pascal Chabert and published by Cambridge University Press. This book was released on 2011-02-24 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.

Download or read book Lecture Notes on Principles of Plasma Processing written by Francis F. Chen and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Download or read book Advances in Superconductivity III written by Koji Kajimura and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 1312 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since the discovery of high temperature superconductors, many new materials have been invented. In the last year, several new materials were also discovered, but their critical temperatures are still below lOOK. Precise physical and chemical work has made tremendous progress in the theoretical and experimental study of physical properties and carrier state characterizations. The de Haas van Alphen effect measurement showed the existence of a Fermi surface in YBCO. Flux dynamics is a well-known new problem in which flux creep and irreversibility line features are especially important for a fundamental understanding of the critical current and flux pinning. Flux pinning centers which are intentionally added using non-superconducting precipitates, neutrons, and protons, etc. increase critical currents to practical levels. The analysis of electric and magnetic properties are expected to reveal the pinning mechanism and also to further application development. As for wires and bulks, many melt-like sintering techniques have improved the material performance of critical current densities. A new seeding Quench-Melt Growth technique enlarged crystal size and increased the repulsion force. These melting processes, in conjunction with a mechanical strength improvement have been effectively introduced into wire fabrication in order to realize kilometer range wires and will put the oxide wires to practical use. Where thin film is con cerned, when many fabrication methods had been developed using the assistance effect of activated oxygen such as ozone and oxygen radicals, a high current 2 density of 106A/cm at 77K was reported.

Download or read book Dry Etching Technology for Semiconductors written by Kazuo Nojiri and published by Springer. This book was released on 2014-10-25 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.

Download or read book Fundamentals of Electric Propulsion written by Dan M. Goebel and published by John Wiley & Sons. This book was released on 2008-12-22 with total page 528 pages. Available in PDF, EPUB and Kindle. Book excerpt: Throughout most of the twentieth century, electric propulsion was considered the technology of the future. Now, the future has arrived. This important new book explains the fundamentals of electric propulsion for spacecraft and describes in detail the physics and characteristics of the two major electric thrusters in use today, ion and Hall thrusters. The authors provide an introduction to plasma physics in order to allow readers to understand the models and derivations used in determining electric thruster performance. They then go on to present detailed explanations of: Thruster principles Ion thruster plasma generators and accelerator grids Hollow cathodes Hall thrusters Ion and Hall thruster plumes Flight ion and Hall thrusters Based largely on research and development performed at the Jet Propulsion Laboratory (JPL) and complemented with scores of tables, figures, homework problems, and references, Fundamentals of Electric Propulsion: Ion and Hall Thrusters is an indispensable textbook for advanced undergraduate and graduate students who are preparing to enter the aerospace industry. It also serves as an equally valuable resource for professional engineers already at work in the field.

Download or read book GaN and Related Materials written by Stephen J. Pearton and published by CRC Press. This book was released on 2021-10-08 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents views on current developments in heat and mass transfer research related to the modern development of heat exchangers. Devotes special attention to the different modes of heat and mass transfer mechanisms in relation to the new development of heat exchangers design. Dedicates particular attention to the future needs and demands for further development in heat and mass transfer. GaN and related materials are attracting tremendous interest for their applications to high-density optical data storage, blue/green diode lasers and LEDs, high-temperature electronics for high-power microwave applications, electronics for aerospace and automobiles, and stable passivation films for semiconductors. In addition, there is great scientific interest in the nitrides, because they appear to form the first semiconductor system in which extended defects do not severely affect the optical properties of devices. This series provides a forum for the latest research in this rapidly-changing field, offering readers a basic understanding of new developments in recent research. Series volumes feature a balance between original theoretical and experimental research in basic physics, device physics, novel materials and quantum structures, processing, and systems.

Download or read book C H N and O in Si and Characterization and Simulation of Materials and Processes written by A. Borghesi and published by North Holland. This book was released on 1996 with total page 624 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry.The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.

Download or read book Fusion Energy Update written by and published by . This book was released on 1986 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt: