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Book Dual domain Lateral Shearing Interferometer

Download or read book Dual domain Lateral Shearing Interferometer written by and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The phase-shifting point diffraction interferometer (PS/PDI) was developed to address the problem of at-wavelength metrology of extreme ultraviolet (EUV) optical systems. Although extremely accurate, the fact that the PS/PDI is limited to use with coherent EUV sources, such as undulator radiation, is a drawback for its widespread use. An alternative to the PS/PDI, with relaxed coherence requirements, is lateral shearing interferometry (LSI). The use of a cross-grating, carrier-frequency configuration to characterize a large-field 4.times.-reduction EUV lithography optic is demonstrated. The results obtained are directly compared with PS/PDI measurements. A defocused implementation of the lateral shearing interferometer in which an image-plane filter allows both phase-shifting and Fourier wavefront recovery. The two wavefront recovery methods can be combined in a dual-domain technique providing suppression of noise added by self-interference of high-frequency components in the test-optic wavefront.

Book EUV Lithography

    Book Details:
  • Author : Vivek Bakshi
  • Publisher : SPIE Press
  • Release : 2009
  • ISBN : 0819469645
  • Pages : 704 pages

Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

Book Dual domain Point Diffraction Interferometer

Download or read book Dual domain Point Diffraction Interferometer written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI is provided. The dual-domain PS/PDI combines the separate noise-suppression capabilities of the widely-used phase-shifting and Fourier-transform fringe pattern analysis methods. The dual-domain PS/PDI relies on both a more restrictive implementation of the image plane PS/PDI mask and a new analysis method to be applied to the interferograms generated and recorded by the modified PS/PDI. The more restrictive PS/PDI mask guarantees the elimination of spatial-frequency crosstalk between the signal and the scattered-light noise arising from scattered-reference-light interfering with the test beam. The new dual-domain analysis method is then used to eliminate scattered-light noise arising from both the scattered-reference-light interfering with the test beam and the scattered-reference-light interfering with the "true" pinhole-diffracted reference light. The dual-domain analysis method has also been demonstrated to provide performance enhancement when using the non-optimized standard PS/PDI design. The dual-domain PS/PDI is essentially a three-tiered filtering system composed of lowpass spatial-filtering the test-beam electric field using the more restrictive PS/PDI mask, bandpass spatial-filtering the individual interferogram irradiance frames making up the phase-shifting series, and bandpass temporal-filtering the phase-shifting series as a whole.

Book A Polarized Lateral Shearing Interferometer and Application for On machine Form Error Measurement of Engineering Surfaces

Download or read book A Polarized Lateral Shearing Interferometer and Application for On machine Form Error Measurement of Engineering Surfaces written by and published by . This book was released on with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: HKUST Call Number: Thesis MECH 2003 LiuX.

Book Interferogram Analysis For Optical Testing

Download or read book Interferogram Analysis For Optical Testing written by Zacarias Malacara and published by CRC Press. This book was released on 2018-10-03 with total page 333 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this day of digitalization, you can work within the technology of optics without having to fully understand the science behind it. However, for those who wish to master the science, rather than merely be its servant, it's essential to learn the nuances, such as those involved with studying fringe patterns produced by optical testing interferometers. When Interferogram Analysis for Optical Testing originally came to print, it filled the need for an authoritative reference on this aspect of fringe analysis. That it was also exceptionally current and highly accessible made its arrival even more relevant. Of course, any book on something as cutting edge as interferogram analysis, no matter how insightful, isn't going to stay relevant forever. The second edition of Interferogram Analysis for Optical Testing is designed to meet the needs of all those involved or wanting to become involved in this area of advanced optical engineering. For those new to the science, it provides the necessary fundamentals, including basic computational methods for studying fringe patterns. For those with deeper experience, it fills in the gaps and adds the information necessary to complete and update one's education. Written by the most experienced researchers in optical testing, this text discusses classical and innovative fringe analysis, principles of Fourier theory, digital image filtering, phase detection algorithms, and aspheric wavelength testing. It also explains how to assess wavefront deformation by calculating slope and local average curvature.

Book Optical Shop Testing

    Book Details:
  • Author : Daniel Malacara
  • Publisher : John Wiley & Sons
  • Release : 2007-08-03
  • ISBN : 9780470135969
  • Pages : 888 pages

Download or read book Optical Shop Testing written by Daniel Malacara and published by John Wiley & Sons. This book was released on 2007-08-03 with total page 888 pages. Available in PDF, EPUB and Kindle. Book excerpt: The purpose of this third edition is to bring together in a single book descriptions of all tests carried out in the optical shop that are applicable to optical components and systems. This book is intended for the specialist as well as the non-specialist engaged in optical shop testing. There is currently a great deal of research being done in optical engineering. Making this new edition very timely.

Book Fringe 2005

    Book Details:
  • Author : Wolfgang Osten
  • Publisher : Springer Science & Business Media
  • Release : 2006-01-26
  • ISBN : 3540293035
  • Pages : 729 pages

Download or read book Fringe 2005 written by Wolfgang Osten and published by Springer Science & Business Media. This book was released on 2006-01-26 with total page 729 pages. Available in PDF, EPUB and Kindle. Book excerpt: In 1989 the time was hot to create a workshop series dedicated to the dicussion of the latest results in the automatic processing of fringe patterns. This idea was promoted by the insight that automatic and high precision phase measurement techniques will play a key role in all future industrial applications of optical metrology. However, such a workshop must take place in a dynamic environment. The- fore the main topics of the previous events were always adapted to the most interesting subjects of the new period. In 1993 new prin- ples of optical shape measurement, setup calibration, phase unwr- ping and nondestructive testing were the focus of discussion, while in 1997 new approaches in multi-sensor metrology, active measu- ment strategies and hybrid processing technologies played a central role. 2001, the first meeting in the 21st century, was dedicated to - tical methods for micromeasurements, hybrid measurement te- nologies and new sensor solutions for industrial inspection. The fifth workshop takes place in Stuttgart, the capital of the state of Baden- Württemberg and the centre of a region with a long and remarkable tradition in engineering. Thus after Berlin 1989, Bremen 1993, 1997 and 2001, Stuttgart is the third Fringe city where international - perts will meet each other to share new ideas and concepts in optical metrology. This volume contains the papers presented during FRINGE 2005.

Book Phase Estimation in Optical Interferometry

Download or read book Phase Estimation in Optical Interferometry written by Pramod Rastogi and published by CRC Press. This book was released on 2014-11-21 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers the essentials of phase-stepping algorithms used in interferometry and pseudointerferometric techniques. It presents the basic concepts and mathematics needed for understanding modern phase estimation methods. The book first focuses on phase retrieval from image transforms using a single frame. It then examines the local environment of a fringe pattern, the phase estimation approach based on local polynomial phase modeling, temporal high-resolution phase evaluation methods, and methods of phase unwrapping. It also discusses experimental imperfections liable to adversely influence the accuracy of phase measurements.

Book Australian Official Journal of Patents

Download or read book Australian Official Journal of Patents written by and published by . This book was released on 2001 with total page 354 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Fringe Scanning Murty Lateral Shearing Interferometer

Download or read book Fringe Scanning Murty Lateral Shearing Interferometer written by and published by . This book was released on 1997 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Non linear Electromagnetic Systems

Download or read book Non linear Electromagnetic Systems written by Volkmar Kose and published by IOS Press. This book was released on 1998 with total page 926 pages. Available in PDF, EPUB and Kindle. Book excerpt: The contents is dominated by the latest problems of applied electrical engineering, micro electromechanics, biosensor technology and biomagnetism. The book covers the numerical calculation methods for the design and optimization of sensors, actuators and electric machines, as well as the treatment of inverse problems, in materials testing and in the field of medicine in particular. Other central topics are the material properties and their simulation and much consideration is given to micro-electromechanics.

Book Optical Interferometry  2e

Download or read book Optical Interferometry 2e written by P. Hariharan and published by Academic Press. This book was released on 2003-09-22 with total page 369 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology, sensor and measurement industries depend on these advances in optical interferometry for accuracy and profitability.

Book Applications of the Lateral Shearing Interferometer in Measurement of Synchrotron Radiation Optical Elements

Download or read book Applications of the Lateral Shearing Interferometer in Measurement of Synchrotron Radiation Optical Elements written by and published by . This book was released on 1987 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The use of a single plate shearing, or Murty, interferometer for measuring the surface quality of several optical elements is reviewed and several results are given. The principle of the Murty interferometer is also explained. (LEW).

Book Interferogram Analysis for Optical Testing

Download or read book Interferogram Analysis for Optical Testing written by Daniel Malacara and published by CRC Press. This book was released on 1998-07-21 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Lays out the fundamentals of, as well as computational methods for, studying fringe patterns produced by optical testing interferometers--providing beginners with the necessary background to enter this field and helping seasoned researchers to refine current analytical approaches. Discusses classical and state-of-the-art fringe analysis techniques with exceptional clarity."

Book Radial Shearing Interferometer

Download or read book Radial Shearing Interferometer written by Naiting Gu and published by . This book was released on 2019 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Radial shearing interferometer (RSI) is one of the most powerful tools in many domains, especially in optical testing. RSI has compact size and good vibration immunity, which is adaptive to various environments, due to its common-path configuration. Moreover, it is very convenient application because no plane referencing wavefront is needed. The disadvantages of the conventional RSIs are that the distorted wavefront is hard to extract quickly and accurately from one radial shearography due to the phase extract algorithm is complex. Fortunately, the new RSIs can receive benefits from the accuracy of the methods of phase-shifting interferometry, and phase-shifting shearography is more sensitive than simple digital shearography. There are two mainly trend to the RSIs based on phase-shifting technique, i.e. instantaneous phase-shifting and compact size. In this chapter, a development process of RSI will be introduced briefly firstly, and then the some new RSIs based phase-shifting techniques in our work will be described in following parts, including initial RSI by using four-step polarization phase-shifting, modal wavefront reconstruction method for RSI with lateral shear and a new kind of compact RSI based micro-optics technique.

Book Application of Lateral Shearing Interferometry to Stochastic  random  Inputs

Download or read book Application of Lateral Shearing Interferometry to Stochastic random Inputs written by Ronald Robert Gruenzel and published by . This book was released on 1972 with total page 108 pages. Available in PDF, EPUB and Kindle. Book excerpt: