Download or read book Dry Etching and Oxidation of Si Devices Using a Multipolar Electron Cyclotron Resonance Source written by Kuo-Tung Sung and published by . This book was released on 1994 with total page 354 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Comparison of Electron Cyclotron Resonance Dry Etch Chemistries for Silicon Carbide written by Gavin McDaniel and published by . This book was released on 1997-06-01 with total page 91 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma etching using an electron cyclotron resonance (ECR) source has been used to study dry etching of SiC. Gas chemistries studied include C12/Ar, Cl2/ H2, SF6/Ar, IBr/Ar, and Ar. The variables studied include ECR power (400 to 1000 W), RF power (50 to 350 W), chamber pressure (1.5 to 10 mTorr), and active to total gas flow rate ratios (0 to 1). Etch rates in excess of 2000 A/min. have been achieved with SF6/Ar ECR discharges at low power (400 Watts) and moderate RF power (100-150 Watts). The rates for Cl2/Ar are comparable to SF6/Ar rates with those for Cl2/ H2 being somewhat lower. IBr/Ar is found to be a very poor chemistry for SiC with etch rates reaching only 1000 A/min. Pure Ar sputtering achieved rates of less than 800 A/min. Smooth surfaces (0.6-0.8 nm RMS roughness) have been achieved in all plasma chemistries with no dependence of roughness on plasma conditions. Auger electron analysis confirmed carbon enrichment of the surface in most cases. High RF biases resulted in stoichiometric termination of the SiC surface. Silicon depletion was noted for low RF biases and high chlorine content plasmas. Contamination by F and S was noted in SF6/Ar discharges. All gas chemistries studied favored the chemically dominant side of the theoretical etch rate curve with the exception of pure argon, which favored the sputter dominant side. Chlorine showed the most synergistic effects and covered the largest range of the theoretical etch rate curve for the experimental conditions studied.
Download or read book Dry Etching Technology for Semiconductors written by Kazuo Nojiri and published by Springer. This book was released on 2014-10-25 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
Download or read book Macroscopic Properties of a Multipolar Electron Cyclotron Resonance Microwave cavity Plasma Source for Anisotropic Silicon Etching written by Jeffrey Alan Hopwood and published by . This book was released on 1990 with total page 538 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Oxidation of Si and SiGe at a Low Substrate Temperature Using Electron Cyclotron Resonance Plasma written by Dmitri Tchikatilov and published by . This book was released on 1998 with total page 346 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book American Doctoral Dissertations written by and published by . This book was released on 1994 with total page 800 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Design Fabrication and Characterization of Self aligned Gated Silicon Field Emission Devices written by Mohammad Reza Rakhshandehroo and published by . This book was released on 1998 with total page 454 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Physics Briefs written by and published by . This book was released on 1994 with total page 1162 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 836 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Anodic Growth and Cathodic Removal of Silicon Dioxide Layers Utilizing an Electron Cyclotron Resonant Microwave Plasma Disk Reactor written by Geoffrey Todd Salbert and published by . This book was released on 1992 with total page 468 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ceramic Abstracts written by American Ceramic Society and published by . This book was released on 1995 with total page 1150 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Science Abstracts written by and published by . This book was released on 1993 with total page 980 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1994 with total page 976 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Micromachining and Microfabrication Process Technology written by and published by . This book was released on 1996 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Thin Film Transistor Technologies VI written by Yue Kuo and published by The Electrochemical Society. This book was released on 2003 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Extended Abstracts written by Electrochemical Society and published by . This book was released on 1988 with total page 856 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book High Energy Chemistry written by and published by . This book was released on 1998 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt:
