Download or read book Directed Self assembly Strategies for Orientation controlled Block Copolymers for Advanced Lithography written by Cindy Gomes Correia and published by . This book was released on 2019 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: L'objectif de ce travail était de mettre en évidence le potentiel du PDMSBb-PS pour des applications en nanolithographie avancée. Pour cela, nous avons fourni une compréhension du comportement d'auto-assemblage du PDMSB-b-PS en masse et en film mince. Nous avons réalisé l'auto-assemblage de ce copolymère semicristallin en cylindre et gyroïde bien définis avec des périodicités inférieures à 20 nm grâce à un paramètre d'interaction de Flory-Huggins élevé (Chapitre 2). Nous avons par la suite proposé une approche pour obtenir des lamelles perpendiculaires du PDMSB-b-PS en film mince grâce à l'utilisation de sur-couches neutres réticulables. La polyvalence de cette approche a été démontrée à l'aide de CPBs de masses moléculaires différentes et s'est ensuite étendue à la formation d'empilements via un processus d'auto-assemblage itératif (chapitre 3). Enfin, nous avons réticulé la surcouche neutre à l'aide d'agents photo-sensibles ce qui nous a permis d'obtenir un motif par photolithographie au-dessus du film CPB. Ainsi, il a été possible de contrôler l'orientation du CPB à des endroits spécifiques du film (Chapitre 4).

Download or read book Next Generation Materials for Block Copolymer Lithography written by Michael Joseph Maher and published by . This book was released on 2016 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: The electronics industry is a trillion dollar industry that has drastically changed everyday life. Advances in lithography have enabled manufacturers to continually shrink the dimensions of microelectronic components, which has resulted in devices that outperform previous generations. Unfortunately, conventional patterning techniques are approaching their physical resolution limits. The ability to economically pattern sub-10 nm features is necessary for the future growth of the industry. Block copolymer self-assembly has emerged as a leading candidate for next generation lithography and nanofabrication because block copolymers self-assemble into periodic nanostructures (e.g. cylinders and lamellae) on a length scale that exceeds the physical limits of optical lithography. However, for block copolymer lithography to be realized, the block copolymer domains need to form sub-10 nm features and display etch resistance for pattern transfer. Additionally, the orientation, alignment, and placement of block copolymer domains must be carefully controlled. This dissertation discusses the synthesis, orientation and alignment of silicon-containing BCPs that are inherently etch resistant and provide access to nanostructures in the sub-10 nm regime. The orientation of domains is controlled by interactions between each block copolymer domain and each interface. Preferential interactions between the block copolymer domains and the either the substrate or air interface lead to a parallel orientation of domains, which is not useful for lithography. Non-preferential (“neutral”) interactions are needed to promote the desired perpendicular orientation. The synthesis of surface treatments and top coats is described, and methods to determine the preferential and non-preferential interactions are reported. Orientation control is demonstrated via rapid thermal annealing between two neutral surfaces. Combining orientation control of block copolymer domains with well established directed self-assembly strategies was used to produce perpendicular domains with long range order. Chapter 1 provides an introduction to lithography and block copolymer self-assembly. Chapter 2 discusses the synthesis of silicon-containing block copolymers. Chapters 4-6 focus on controlling block copolymer domain orientation, and Chapter 7 focuses on directed self-assembly. Chapter 8 covers spatial orientation control of domains using photopatternable interfaces. Finally, Chapter 9 covers tin-containing polymers that are resistant to fluorine-containing etch chemistries and can be used to pattern silicon oxide.

Download or read book Directed Self assembly of High 1D7C0 Block Copolymers for Advanced Patterning Applications written by Gabriela Alva and published by . This book was released on 2016 with total page 78 pages. Available in PDF, EPUB and Kindle. Book excerpt: High-{1D7C0} block copolymers (BCP) have gained interest to be used as an alternative to currently used multiple patterning techniques for obtaining sub-lithographic features due to their ability to self-assemble at the nanoscale. However, there is a challenge in controlling the orientation of high-{1D7C0} BCPs at the air interface. This work describes the use of a formulation-based approach wherein different surface active polymers (SAP) were added as additives to control the orientation of poly(styrene-b-methyl carbonate) (PS-b-PMeCAR) lamellae at the air interface. The resulting thin films made from these formulations showed successful formation of perpendicular lamellae on neutral underlayer substrates upon thermal annealing. The higher surface active SAP demonstrated better orientation control with lower loadings and on thicker films. These films were characterized by atomic force microscopy, grazing incidence small angle x-ray spectroscopy, and x-ray photoelectron spectroscopy to confirm the perpendicular orientation of the lamellar domains and the distribution of the SAP in the BCP thin film. The vertically oriented BCP domains were used as an etch mask by selectively removing the more etch labile PMeCAR block by reactive ion etching using oxygen plasma. A technique called sequential infiltration synthesis (SIS), followed by removing the PS block to obtain ~9.5 nm half pitch domains, was also used. Directed self-assembly via graphoepitaxy was also successfully demonstrated. Future work includes investigation of different BCP platforms and morphologies other than lamellae for patterning work.

Download or read book Physical Design and Mask Synthesis for Directed Self Assembly Lithography written by Seongbo Shim and published by Springer. This book was released on 2018-03-21 with total page 144 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

Download or read book Templated Self assembly for Complex Pattern Fabrication written by Jae-Byum Chang and published by . This book was released on 2014 with total page 157 pages. Available in PDF, EPUB and Kindle. Book excerpt: The long-term goal of my Ph.D. study has been controlling the self-assembly of various materials using state-of-the-art nanofabrication techniques. Electron-beam lithography has been used for decades to generate nanoscale patterns, but its throughput is not high enough for fabricating sub-10-nm patterns over a large area. Templated block copolymer(BCP) self assembly is attractive for fabricating few-nanometer-scale structures at high throughput. On an unpattermed substrate, block copolymer self-assembly generates dense arrays of lines or dots without long-range order. Fortunately, physical features defined by electron lithography can guide the self-assembly of block copolymer. In our previous work, the orientation of cylindrical phase block copolymer was controlled simply by changing the distance between physical features, and resulting polymer patterns were analyzed by an image analysis program. Here, we first demonstrated high throughput sub-10-nm feature sizes by applying the same approach to a cylindrical morphology 16kg/mol PS-PDMS block copolymer. The half-pitch of the PDMS cylinders of this block copolymer film is 9 nm, so sub-10-nm structures can be fabricated. We also applied the similar approach to a triblock terpolymer to achieve dot patterns with square symmetry. To achieve a more complex pattern, electron-beam induced cross-linking of a block copolymer and second solvent-annealing process was used. By using this method, a line-dot hybrid pattern was achieved. Despite that the block copolymer self-assembly area had been heavily studied, researchers had yet to ascertain how to design nanostructures to achieve a desired target pattern using block copolymers. To address this problem, we developed a modular method that greatly simplifies the nanostructure design, and using this method, we achieved a circuit-like block-copolymer pattern over a large area. The key innovation is the use of a binary set of tiles that can be used to very simply cover the desired patterning area. Despite the simplicity of the approach, by exploiting neighbor-neighbor interactions of the tiles, a complex final pattern can be formed. The vision is thus one of programmability of patterning by using a simple instruction set. This development will thus be of interest to scientists and engineers across many fields involving self-assembly, including biomolecule, quantum-dot or nanowire positioning; algorithmic self-assembly; and integrated-circuit development. We applied this concept - controlling the assembly of materials using nanostructures - to a different material, protein. Single-molecule protein arrays are useful tools for studying biological phenomena at the single-molecule level, but have been developed only for a few specific proteins using the streptavidin-biotin complex as a linker. By using carefully designed gold nanopatterns and cysteine-gold interaction, we developed a process to make single-molecule protein arrays that can be used for patterning a broad range of proteins.

Download or read book High Interaction Parameter Block Copolymers for Advanced Lithography written by Julia Dianne Cushen and published by . This book was released on 2013 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymers demonstrate potential in next-generation lithography as a solution for overcoming the limitations of conventional lithographic techniques. Ideal block copolymer materials for this application can be synthesized on a commercial scale, have high [chi]-parameters promoting self-assembly into sub-20 nm pitch domains, have controllable alignment and orientation, and have high etch contrast between the domains for facilitating pattern transfer into the underlying substrate. Block copolymers that contain silicon in one domain are attractive for nanopatterning since they often fulfill at least three of these requirements. However, silicon-containing materials are notoriously difficult to orient in thin films due to the low surface energy of the silicon-containing block, which typically wets the free surface interface. In this work, the methodology behind material choice and the synthesis of new silicon-containing block copolymers by a variety of polymerization techniques will be described. Thin film self-assembly of the block copolymers with domains oriented perpendicular to the plane of the substrate is achieved using different solvent annealing and neutral surface treatments with thermal annealing conditions. Block copolymer patterns are transferred to the underlying substrate by reactive ion etching and directed self-assembly of the polymers is demonstrated using chemical contrast patterns. Interesting thermodynamics governing the self-assembly of block copolymers with solvent annealing will also be discussed. Finally, new amphiphilic block copolymers will be described that were created with lithographic applications in mind but that are most useful for biological applications in drug delivery.

Download or read book Engineering Block Copolymers for Advanced Lithography written by Sunshine Zhou and published by . This book was released on 2016 with total page 410 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymer (BCP) nanoimprint lithography is an attractive possible solution for manufacturing hard disk drives with information densities greater than 1 Tbit/in2. At these densities, individual bits must be smaller than 10 nm, and BCPs can be engineered to spontaneously self-segregate into features on this size scale. In addition to small feature sizes, industrially relevant BCPs should have simple orientation strategies and possess good etch contrast and resistance. Several silicon-containing BCPs were investigated due to the increased etch contrast and resistance imparted by silicon. The synthesis, characterization, and thin film studies of three silicon-containing BCPs are detailed. Due to the surface energy mismatch between the silicon-containing block and the organic block, solvent annealing and top coats were needed to perpendicularly orient these materials. While these materials possess many advantages, they each have shortcomings that prevent them from being ideal industrial materials. A derivative of poly(styrene-block-methyl methacrylate) was engineered to take advantage of its simple orientation procedure while decreasing the smallest achievable feature size. The synthesis and characterization, including determination of the [chi] parameter, of this BCP are detailed. The thin film assembly of this BCP was also successfully demonstrated, and this dissertation concludes with several ideas for future studies.

Download or read book Advanced Materials for Block Copolymer Lithography written by Christopher Martin Bates and published by . This book was released on 2013 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt: The multi-billion dollar per year lithography industry relies on the fusion of chemistry, materials science, and engineering to produce technological innovations that enable continual improvements in the speed and storage density of microelectronic devices. A critical prerequisite to improving the computers of today relies on the ability to economically and controllably form thin film structures with dimensions on the order of tens of nanometers. One class of materials that potentially meets these requirements is block copolymers since they can self-assemble into structures with characteristic dimensions circa three to hundreds of nanometers. The different aspects of the block copolymer lithographic process are the subject of this dissertation. A variety of interrelated material requirements virtually necessitate the synthesis of block copolymers specifically designed for lithographic applications. Key properties for the ideal block copolymer include etch resistance to facilitate thin film processing, a large interaction parameter to enable the formation of high resolution structures, and thin film orientation control. The unifying theme for the materials synthesized herein is the presence of silicon in one block, which imparts oxygen etch resistance to just that domain. A collection of silicon-containing block copolymers was synthesized and characterized, many of which readily form features on approximately the length scale required for next-generation microelectronic devices. The most important thin film processing step biases the orientation of block copolymer domains perpendicular to the substrate by control of interfacial interactions. Both solvent and thermal annealing techniques were extensively studied to achieve orientation control. Ultimately, a dual top and bottom surface functionalization strategy was developed that utilizes a new class of "top coats" and cross-linkable substrate surface treatments. Perpendicular block copolymer features can now be produced quickly with a process amenable to existing manufacturing technology, which was previously impossible. The development of etching recipes and pattern transfer processes confirmed the through-film nature of the features and the efficacy of both the block copolymer design and the top coat process.

Download or read book Block Copolymer Self assembly a Computational Approach Towards Novel Morphologies written by Karim Raafat Gadelrab and published by . This book was released on 2019 with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt: Spontaneous self-assembly of materials is a phenomenon exhibited by different molecular systems. Among many, Block copolymers (BCPs) proved to be particularly interesting due to their ability to microphase separate into periodic domains. Nonetheless, the rising need for arbitrary, complex, 3D nanoscale morphology shows that what is commonly achievable is quite limited. Expanding the range of BCPs morphologies could be attained through the implementation of a host of strategies that could be used concurrently. Using directed self-assembly (DSA), a sphere forming BCP was assembled in a randomly displaced post template to study system resilience towards defect creation. Template shear-like distortion seemed to govern local defect generation. Defect clusters with symmetries compatible with that of the BCP showed enhanced stability. Using 44 and 32434 Archimedean tiling templates that are incompatible with BCP six-fold symmetry created low symmetry patterns with an emergent behavior dependent on pattern size and shape. A variation of DSA is studied using modulated substrates. Layer-by-layer deposition of cylinder forming BCPs was investigated. Self-consistent field theory (SCFT) and strong segregation theory SST were employed to provide the understanding and the conditions under which particular orientations of consecutive layers were produced. Furthermore, deep functionalized trenches were employed to create vertically standing high-[chi] BCP structures. Changing annealing conditions for a self-assembled lamellar structure evolved the assembled pattern to a tubular morphology that is non-native to diblock copolymers. A rather fundamental but challenging strategy to go beyond the standard motifs common to BCPs is to synthesize multiblock molecules with an expanded design space. Triblock copolymers produced bilayer perforated lamellar morphology. SCFT analysis showed a large window of stability of such structures in thin films. In addition, a model for bottlebrush BCPs (BBCPs) was constructed to investigate the characteristics of BBCPs self-assembly. Pre-stacked diblock sidechains showed improved microphase separation while providing domain spacing relevant to lithography applications. A rich phase diagram was constructed at different block concentrations. The ability to explore new strategies to discover potential equilibrium morphologies in BCPs is supported by strong numerical modeling and simulations efforts. Accelerating SCFT performance would greatly benefit BCP phase discovery. Preliminary work discussed the first attempt to Neural Network (NN) assisted SCFT. The use of NN was able to cut on the required calculations steps to reach equilibrium morphology, demonstrating accelerated calculation, and escaping trapped states, with no effect on final structure.

Download or read book Self assembled Patterns of Block Copolymer homopolymer Blends written by Dongsik Park and published by . This book was released on 2008 with total page 225 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many researchers have studied the orientation behavior of block copolymers (BCPs) with the most recent works directed towards nanotechnologies. Self-assembly of block copolymers is very relevant in controlling periodic nanostructures for nanotechnological applications. Nanotechnological applications of BCPs are possible due to their physical properties related to mass and energy transport, as well as mechanical, electrical, and optical properties. These properties provide substantial benefits in nanostructure membranes, nanotemplates, photonic crystals, and high-density information storage media. In many applications, such nanopatterns need to be achieved as ordered and tunable structures. Consequently, the control of orientation of such structures with defect-free ordering on larger length scales still remain as major research challenge in many cases. In addition to their pure block forms, blends of copolymers with other polymers offer productive research areas in relation to nanostructural self-assembly. We prepared well-aligned nanocylinders into block copolymer over the enhanced sample area and scale of height without any external field applications or modification of interaction between the sample and the substrate. Self-assembled 3-dimensional perpendicular cylinder orientation was achieved mainly by blending of minority homopolymer into the blockcopolymer. Thus, this study investigated a spontaneous and simple method for the orientation of perpendicular cylinders in BCP/homopolymer mixtures on a preferential substrate, by increasing the interaction force between the homologous polymer pair at a fixed composition of minority block component. Since the thermodynamical changes have been simply accomplished by the control of incompatibility between the block components, the intrinsic advantages of block copolymer nanopatterning, such as fast and spontaneous 3-dimensional nanopatterning with a high thermodynamic stability and reproducibility, have been completely preserved in this fabrication strategy. By exploiting thermodynamical changes using temperature variation and by blending a homopolymer with well controlled molecular weight, we illustrated that redistribution of homopolymer resulted in a shift of phase boundaries and in the stabilization of well-ordered structures to create new opportunities for nanotechnologies.

Download or read book Solvent Vapor Assisted Self Assembly of Patternable Block Copolymers written by Joan K. Bosworth and published by . This book was released on 2009 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymer self assembly presents a method for patterning and templating applications on the 10-50 nm length scale, a smaller scale than can be easily achieved by photolithography. Here we investigate the use of functionalized polar-nonpolar block copolymers both as photopatternable self-assembling materials and for selective infiltration of one block for patterning. Block copolymer thin films with defect-free self-assembled morphology over large domains combined with careful control of the orientation of the morphology are critical for these patterning applications. Self assembly of block copolymers is facilitated by polymer chain mobility, commonly achieved by heating block copolymer films above the glass transition temperature of the blocks. However, many block copolymer systems, including those discussed here, are thermally incompatible. Swelling in a solvent vapor, called solvent annealing, provides sufficient mobility for self assembly. Solvent annealing proved critical to forming ordered structures of functional polar-nonpolar block copolymer thin films. Thermal instability initially led to limited self assembly of combined topdown/bottom-up block copolymer systems. In this case, photolithographic functionality has been designed into block copolymers, allowing the majority component of a block copolymer to behave as a negative-tone photoresist. Solvent vapor annealing has provided a simple and inexpensive method for allowing the bottom-up self assembly of these top-down photopatternable materials. An additional benefit of solvent annealing is the ability to reversibly tune the morphology formed using the selectivity of different swelling solvents to the two blocks: that is, the choice of solvent for annealing directs the formation of different morphologies in the dried film, here spherical and cylindrical. This behavior is reversible, alternating annealing sessions lead to switching of the morphology in the film. Secondary ordering techniques applied in tandem with solvent annealing can be used to further control the self assembly and give highly ordered block copolymer domains. Here we demonstrate the use of graphoepitaxy to align block copolymer self assembly to patterns in substrates. The combination of block copolymer self assembly with lithographic crosslinking in films was initially pursued to allow precise location of assembled patterns. Taking this behavior a step further, we combine solvent annealing, used to reversibly tune the self-assembled morphology, and lithographic patterning, used to prevent switching in exposed regions. This combined process has provided a method for selectively patterning 100 nm-wide domains of spherical morphology within regions of parallel-oriented cylindrical morphology. We also investigate solvent annealing of a block copolymer blended with a hydrogen bonding material that selectively segregates into the polar block. Blending provides a method of tuning the periodicity upon solvent annealing for self assembly, with morphology control again possible by solvent selectivity. Selective extraction of the blended material forms voids displaying the tunable periodicity, and the pattern is then transferred by templating to inorganic materials.

Download or read book Directed Self assembly of Block Copolymer Films on Chemically Nanopatterned Surfaces written by Adam M. Welander and published by . This book was released on 2009 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Self assembly of Block Copolymers for the Fabrication of Functional Nanomaterials written by Li Yao and published by . This book was released on 2014 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt: This dissertation explores the use of block copolymers which can self-assemble into different morphologies as templates to fabricate nanostructured materials. The first section (Chapters 2-4) reports the formation of mesoporous silica films with spherical, cylindrical and bicontinuous pores up to 40 nm in diameter through replicating the morphologies of the solid block copolymer (BCP) templates, polystyrene-b-poly(tert-butyl acrylate) (PS-b-PtBA), via phase selective condensation of tetraethylorthosilicate in supercritical CO2. Next, directed self-assembly was used to control the orientation of cylindrical domains in PS-b-PtBA templates. Large-area aligned mesochannels in silica films with diameters tunable between 5 and 30 nm were achieved through the replication of oriented templates via scCO2 infusion. The long-range alignment of mesochannels was confirmed through GISAXS with sample stage azimuthal rotation. In the second section (Chapters 5-6), enantiopure tartaric acid was used as an additive to dramatically improve ordering in poly(ethylene oxide-block-tert-butyl acrylate) (PEO-b-PtBA) copolymers. Transmission electron microscopy (TEM), atomic force microscopy (AFM) and X-ray scattering were used to study the phase behavior and morphologies within both bulk and thin films. With the addition of a photo acid generator, photo-induced disorder in the PEO-b-PtBA/tartaric acid composite system was achieved upon UV exposure which deprotected the PtBA block to yield poly(acrylic acid) (PAA), which is phase-miscible with PEO. Area-selective UV exposure using a photo-mask was applied with the assistance of trace amounts of base quencher to achieve high-resolution hierarchical patterns. Helical superstructures were observed by TEM in this BCP/chiral additive system with 3D handedness confirmed by TEM tomography. In the last section (Chapter 7), ultra-high loadings of nanoparticles into target domains of block copolymer composites were achieved by blending the block copolymer hosts with small molecule additives that exhibit strong interactions with one of the polymer chain segments and with the nanoparticle ligands via hydrogen bonding. The addition of 40 wt% D-tartaric acid to poly(ethylene oxide-block-tert-butyl acrylate) (PEO-b-PtBA) enabled the loading of up to 150 wt% of 4-hydroxythiophenol functionalized Au nanoparticles relative to the mass of the target hydrophilic domain. This was equivalent to over 40% Au by mass of the resulting well ordered composite as measured by thermal gravimetric analysis.

Download or read book Self assembly of Block Copolymers for Nanopatterning written by Nathanael Lap-Yan Wu and published by . This book was released on 2014 with total page 185 pages. Available in PDF, EPUB and Kindle. Book excerpt: The impressive developments in the semiconductor industry over the past five decades have largely been dependent on the ability to continually reduce the dimensions of devices on a chip. However, as critical dimension requirements for these devices approach the limits of photolithography, new fabrication strategies must be introduced for these remarkable advances to continue. One technology listed by the International Technology Roadmap for Semiconductors as a candidate for next-generation nanostructure fabrication is the directed self-assembly of block copolymers. Block copolymers have received significant attention of late for their ability to template large regular arrays of nanostructures with dimensions ranging from 10 to 50 nm. The production of denser sub-10 nm nanostructures is also possible by reducing the size of these polymers, but a reduction of the polymer size also compromises the quality of nanostructures, making small polymers extremely difficult to use. In this thesis, two different patterning approaches are introduced to push the nanostructure density limits possible for a given polymer. In the first, a novel patterning approach involving thin films of bilayer block copolymer domains is used to effectively double the nanostructure density patterned by a given polymer. The technique is successfully applied to different types and sizes of polymer, and can also form highly controlled arrays of patterns with the help of surface topography. By varying different process parameters during the self-assembly or subsequent plasma steps, the dimensions of these density-doubled patterns may be finely-tuned to the desired width and pitch. The surface coverage of these density-doubled nanostructures is also maximized through adjusting the film thickness and parameters in the self-assembly process. Besides using bilayer films, dense arrays of nanostructures may also be patterned using a multi-step patterning approach. In this approach, multiple layers of block copolymer films are subsequently deposited onto the substrate to template nanostructures. Because nanostructures from previous layers contribute to the surface topography, they influence the self-assembly of successive layers and more dense and complex patterns may be produced as a result.

Download or read book Points Lines and Walls written by Maurice Kléman and published by John Wiley & Sons. This book was released on 1983 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Polymer Thin Films written by Ophelia Kwan Chui Tsui and published by World Scientific. This book was released on 2008 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ch. 1. Block copolymer thin films / J.-Y. Wang, S. Park and T. P. Russell -- ch. 2. Equilibration of block copolymer films on chemically patterned surfaces / G. S. W. Craig, H. Kang and P. F. Nealey -- ch. 3. Structure formation and evolution in confined cylinder-forming block copolymers / G. J. A. Sevink and J. G. E. M. Fraaije -- ch. 4. Block copolymer lithography for magnetic device fabrication / J. Y. Cheng and C. A. Ross -- ch. 5. Hierarchical structuring of polymer nanoparticles by self-organization / M. Shimomura ... [et al.] -- ch. 6. Wrinkling polymers for surface structure control and functionality / E. P. Chan and A. J. Crosby -- ch. 7. Crystallization in polymer thin films: morphology and growth / R. M. Van Horn and S. Z. D. Cheng -- ch. 8. Friction at soft polymer surface / M. K. Chaudhury, K. Vorvolakos and D. Malotky -- ch. 9. Relationship between molecular architecture, large-strain mechanical response and adhesive performance of model, block copolymer-based pressure sensitive adhesives / C. Creton and K. R. Shull -- ch. 10. Stability and dewetting of thin liquid films / K. Jacobs, R. Seemann and S. Herminghaus -- ch. 11. Anomalous dynamics of polymer Films / O. K. C. Tsui.

Download or read book Directed Self assembly of Diblock Copolymer Thin Films on Chemically Nanopatterned Substrates written by Erik WiIliam Edwards and published by . This book was released on 2005 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: