Download or read book Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Download or read book Transport Phenomena in Materials Processing written by and published by Academic Press. This book was released on 1996-06-25 with total page 447 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials processing and manufacturing are fields of growing importance whereby transport phenomena play a central role in many of the applications. This volume is one of the first collections of contributions on thesubject. The five papers cover a wide variety of applications

Download or read book Transport Simulation in Microelectronics written by Alfred Kersch and published by Birkhäuser. This book was released on 2012-12-06 with total page 235 pages. Available in PDF, EPUB and Kindle. Book excerpt: Computer simulation of semiconductor processing equipment and devices requires the use of a wide variety of numerical methods. Of these methods, the Monte Carlo approach is perhaps most fundamentally suited to mod eling physical events occurring on microscopic scales which are intricately connected to the particle structure of nature. Here physical phenomena can be simulated by following simulation particles (such as electrons, molecules, photons, etc. ) through a statistical sampling of scattering events. Monte Carlo is, however, generally looked on as a last resort due to the extremely slow convergence of these methods. It is of interest, then, to examine when in microelectronics it is necessary to use Monte Carlo methods, how such methods may be improved, and what are the alternatives. This book ad dresses three general areas of simulation which frequently arise in semicon ductor modeling where Monte Carlo methods playa significant role. In the first chapter the basic mathematical theory of the Boltzmann equation for particle transport is presented. The following chapters are devoted to the modeling of the transport processes and the associated Monte Carlo meth ods. Specific examples of industrial applications illustrate the effectiveness and importance of these methods. Two of these areas concern simulation of physical particles which may be assigned a time dependent position and velocity. This includes the molecules of a dilute gas used in such processing equipment as chemi cal vapor decomposition reactors and sputtering reactors. We also consider charged particles moving within a semiconductor lattice.

Download or read book CVD XI written by Karl E. Spear and published by . This book was released on 1990 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Transport Phenomena in Materials Processing and Manufacturing written by and published by . This book was released on 1996 with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Theory and Application of Laser Chemical Vapor Deposition written by J. Mazumder and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 406 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.

Download or read book Computational Mechanics 95 written by S.N. Atluri and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 3181 pages. Available in PDF, EPUB and Kindle. Book excerpt: AI!, in the earlier conferences (Tokyo, 1986; Atlanta, 1988, Melbourne, 1991; and Hong Kong, 1992) the response to the call for presentations at ICES-95 in Hawaii has been overwhelming. A very careful screening of the extended abstracts resulted in about 500 paper being accepted for presentation. Out of these, written versions of about 480 papers reached the conference secretariat in Atlanta in time for inclusion in these proceedings. The topics covered at ICES-95 range over the broadest spectrum of computational engineering science. The editors thank the international scientific committee, for their advice and encouragement in making ICES-95 a successful scientific event. Special thanks are expressed to the International Association for Boundary Elements Methods for hosting IABEM-95 in conjunction with ICES-95. The editors here express their deepest gratitude to Ms. Stacy Morgan for her careful handling of a myriad of details of ICES-95, often times under severe time constraints. The editors hope that the readers of this proceedings will find a kaleidoscopic view of computational engineering in the year 1995, as practiced in various parts of the world. Satya N. Atluri Atlanta, Georgia, USA Genki Yagawa Tokyo,Japan Thomas A. Cruse Nashville, TN, USA Organizing Committee Professor Genki Yagawa, University of Tokyo, Japan, Chair Professor Satya Atluri, Georgia Institute of Technology, U.S.A.

Download or read book Handbook of Fluid Dynamics written by Richard W. Johnson and published by CRC Press. This book was released on 2016-04-06 with total page 1544 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Fluid Dynamics offers balanced coverage of the three traditional areas of fluid dynamics—theoretical, computational, and experimental—complete with valuable appendices presenting the mathematics of fluid dynamics, tables of dimensionless numbers, and tables of the properties of gases and vapors. Each chapter introduces a different fluid dynamics topic, discusses the pertinent issues, outlines proven techniques for addressing those issues, and supplies useful references for further research. Covering all major aspects of classical and modern fluid dynamics, this fully updated Second Edition: Reflects the latest fluid dynamics research and engineering applications Includes new sections on emerging fields, most notably micro- and nanofluidics Surveys the range of numerical and computational methods used in fluid dynamics analysis and design Expands the scope of a number of contemporary topics by incorporating new experimental methods, more numerical approaches, and additional areas for the application of fluid dynamics Handbook of Fluid Dynamics, Second Edition provides an indispensable resource for professionals entering the field of fluid dynamics. The book also enables experts specialized in areas outside fluid dynamics to become familiar with the field.

Download or read book Applied Mathematics and Computational Mechanics for Smart Applications written by Lakhmi C. Jain and published by Springer Nature. This book was released on 2021-03-14 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents best selected research papers presented at the Thirteenth International Conference on Applied Mathematics and Mechanics in the Aerospace Industry (AMMAI 2020), held from September 6 to September 13, 2020, at the Alushta Health and Educational Center (The Republic of Crimea). The book is dedicated to solving actual problems of applied mechanics using modern computer technology including smart paradigms. Physical and mathematical models, numerical methods, computational algorithms, and software complexes are discussed, which allow to carry out high-precision mathematical modeling in fluid, gas, and plasma mechanics, in general mechanics, deformable solid mechanics, in strength, destruction and safety of structures, etc. Technologies and software systems that provide effective solutions to the problems at various multi-scale levels are considered. Special attention is paid to the training of highly qualified specialists for the aviation and space industry. The book is recommended for specialists in the field of applied mathematics and mechanics, mathematical modeling, information technologies, and developers of modern applied software systems.

Download or read book Lecture Notes on Principles of Plasma Processing written by Francis F. Chen and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Download or read book Miniaturized Transistors written by Lado Filipovic and published by MDPI. This book was released on 2019-06-24 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt: What is the future of CMOS? Sustaining increased transistor densities along the path of Moore's Law has become increasingly challenging with limited power budgets, interconnect bandwidths, and fabrication capabilities. In the last decade alone, transistors have undergone significant design makeovers; from planar transistors of ten years ago, technological advancements have accelerated to today's FinFETs, which hardly resemble their bulky ancestors. FinFETs could potentially take us to the 5-nm node, but what comes after it? From gate-all-around devices to single electron transistors and two-dimensional semiconductors, a torrent of research is being carried out in order to design the next transistor generation, engineer the optimal materials, improve the fabrication technology, and properly model future devices. We invite insight from investigators and scientists in the field to showcase their work in this Special Issue with research papers, short communications, and review articles that focus on trends in micro- and nanotechnology from fundamental research to applications.

Download or read book The DSMC Method written by G. A. Bird and published by . This book was released on 2013-08-19 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt: Direct Simulation Monte Carlo is a well-established method for the computer simulation of a gas flow at the molecular level. While there is a limit to the size of the flow-field with respect to the molecular mean free path, personal computers now allow solutions well into the continuum flow regime. The method can be applied to basic problems in gas dynamics and practical applications range from microelectromechanics systems (MEMS) to astrophysical flows. DSMC calculations have assisted in the design of vacuum systems, including those for semiconductor manufacture, and of many space vehicles and missions. The method was introduced by the author fifty years ago and it has been the subject of two monographs that have been published by Oxford University Press. It is now twenty years since the second of these was written and, since that time, most DSMC procedures have been superseded or significantly modified. In addition, visual interactive DSMC application programs have been developed that have proved to be readily applicable by non-specialists to a wide variety of practical problems. The computational variables are set automatically within the code and the programs report whether or not the criteria for a good calculation have been met. This book is concerned with the theory behind the current DSMC molecular models and procedures, with their integration into general purpose programs, and with the validation and demonstration of these programs. The DSMC and associated programs, including all source codes, can be freely downloaded through links that are provided in the book. The main accompanying program is simply called the "DSMC program" and, in future versions of the book, it will be applicable to homogeneous (or zero-dimensional) flows through to three-dimensional flow. All DSMC simulations are time-accurate unsteady calculations, but the flow may become steady at large times. The current version of the DSMC code is applicable only to zero and one-dimensional flows and the older DS2V code is employed for the two-dimensional validation and demonstration cases. It is because of this temporary use of the older and well-proven program that the DS2V source code is made freely available for the first time. Most of the homogeneous flow cases are validation studies, but include internal mode relaxation studies and spontaneous and forced ignition leading to combustion in an oxygen-hydrogen mixture. The one-dimensional cases include the structure of a re-entry shock wave that takes into account electronic excitation as well as dissociation, recombination and exchange reactions. They also include a spherically imploding shock wave and a spherical blast wave. The two-dimensional and axially-symmetric demonstration cases range from a typical MEMS flow to aspects of the flow around rotating planets. Intermediate cases include the formation and structure of a combustion wave, a vacuum pump driven by thermal creep, a typical vacuum processing chamber, and the flow around a typical re-entry vehicle

Download or read book Handbook of Advanced Plasma Processing Techniques written by R.J. Shul and published by Springer Science & Business Media. This book was released on 2011-06-28 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Download or read book Computational Science ICCS 2007 written by Yong Shi and published by Springer. This book was released on 2007-07-13 with total page 1310 pages. Available in PDF, EPUB and Kindle. Book excerpt: Part of a four-volume set, this book constitutes the refereed proceedings of the 7th International Conference on Computational Science, ICCS 2007, held in Beijing, China in May 2007. The papers cover a large volume of topics in computational science and related areas, from multiscale physics to wireless networks, and from graph theory to tools for program development.

Download or read book Nonequilibrium Gas Dynamics and Molecular Simulation written by Iain D. Boyd and published by Cambridge University Press. This book was released on 2017-03-23 with total page 383 pages. Available in PDF, EPUB and Kindle. Book excerpt: 7.1 Introduction -- 7.2 Rotational Energy Exchange Models -- 7.2.1 Constant Collision Number -- 7.2.2 The Parker Model -- 7.2.3 Variable Probability Exchange Model of Boyd -- 7.2.4 Nonequilibrium Direction Dependent Model -- 7.2.5 Model Results -- 7.3 Vibrational Energy Exchange Models -- 7.3.1 Constant Collision Number -- 7.3.2 The Millikan-White Model -- 7.3.3 Quantized Treatment for Vibration -- 7.3.4 Model Results -- 7.4 Dissociation Chemical Reactions -- 7.4.1 Total Collision Energy Model -- 7.4.2 Redistribution of Energy Following a Dissociation Reaction -- 7.4.3 Vibrationally Favored Dissociation Model -- 7.5 General Chemical Reactions -- 7.5.1 Reaction Rates and Equilibrium Constant -- 7.5.2 Backward Reaction Rates in DSMC -- 7.5.3 Three-Body Recombination Reactions -- 7.5.4 Post-Reaction Energy Redistribution and General Implementation -- 7.5.5 DSMC Solutions for Reacting Flows -- 7.6 Summary -- Appendix A: Generating Particle Properties -- Appendix B: Collisional Quantities -- Appendix C: Determining Post-Collision Velocities -- Appendix D: Macroscopic Properties -- Appendix E: Common Integrals -- References -- Index

Download or read book Computational Fluid and Solid Mechanics written by K.J. Bathe and published by Elsevier. This book was released on 2001-05-21 with total page 975 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MIT mission - "to bring together Industry and Academia and to nurture the next generation in computational mechanics is of great importance to reach the new level of mathematical modeling and numerical solution and to provide an exciting research environment for the next generation in computational mechanics." Mathematical modeling and numerical solution is today firmly established in science and engineering. Research conducted in almost all branches of scientific investigations and the design of systems in practically all disciplines of engineering can not be pursued effectively without, frequently, intensive analysis based on numerical computations.The world we live in has been classified by the human mind, for descriptive and analysis purposes, to consist of fluids and solids, continua and molecules; and the analyses of fluids and solids at the continuum and molecular scales have traditionally been pursued separately. Fundamentally, however, there are only molecules and particles for any material that interact on the microscopic and macroscopic scales. Therefore, to unify the analysis of physical systems and to reach a deeper understanding of the behavior of nature in scientific investigations, and of the behavior of designs in engineering endeavors, a new level of analysis is necessary. This new level of mathematical modeling and numerical solution does not merely involve the analysis of a single medium but must encompass the solution of multi-physics problems involving fluids, solids, and their interactions, involving multi-scale phenomena from the molecular to the macroscopic scales, and must include uncertainties in the given data and the solution results. Nature does not distinguish between fluids and solids and does not ever repeat itself exactly.This new level of analysis must also include, in engineering, the effective optimization of systems, and the modeling and analysis of complete life spans of engineering products, from design to fabrication, to possibly multiple repairs, to end of service.

Download or read book Handbook of Software Solutions for ICME written by Georg J. Schmitz and published by John Wiley & Sons. This book was released on 2016-12-19 with total page 628 pages. Available in PDF, EPUB and Kindle. Book excerpt: As one of the results of an ambitious project, this handbook provides a well-structured directory of globally available software tools in the area of Integrated Computational Materials Engineering (ICME). The compilation covers models, software tools, and numerical methods allowing describing electronic, atomistic, and mesoscopic phenomena, which in their combination determine the microstructure and the properties of materials. It reaches out to simulations of component manufacture comprising primary shaping, forming, joining, coating, heat treatment, and machining processes. Models and tools addressing the in-service behavior like fatigue, corrosion, and eventually recycling complete the compilation. An introductory overview is provided for each of these different modelling areas highlighting the relevant phenomena and also discussing the current state for the different simulation approaches. A must-have for researchers, application engineers, and simulation software providers seeking a holistic overview about the current state of the art in a huge variety of modelling topics. This handbook equally serves as a reference manual for academic and commercial software developers and providers, for industrial users of simulation software, and for decision makers seeking to optimize their production by simulations. In view of its sound introductions into the different fields of materials physics, materials chemistry, materials engineering and materials processing it also serves as a tutorial for students in the emerging discipline of ICME, which requires a broad view on things and at least a basic education in adjacent fields.