Download or read book Diffusion of Phosphorous and Boron Into Silicon Through Silicon Monoxide Layers written by Chao-Chen Mai and published by . This book was released on 1968 with total page 66 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Diffusion of Phosphorus and Boron Into Silicon Through Silicon Monoxide Layers written by Chao-Chen Mai and published by . This book was released on 1967 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Diffusion of Phosphorous and Boron in Silicon written by Pravin Chandra Parekh and published by . This book was released on 1967 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Silicon Device Processing written by Charles P. Marsden and published by . This book was released on 1970 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt: The objective of the Symposium was to provide an opportunity for engineers and applied scientists actively engaged in the silicon device technology field to discuss the most advanced measurement methods for process control and materials characterization.The basic theme of the meeting was to stress the interdependence of measurements techniques, facilities, and materials as they relate to the overall problems of improving and advancing silicon device sciences and technologies.(Author).
Download or read book Integrated Silicon Device Technology Diffusion written by Research Triangle Institute and published by . This book was released on 1964 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Phosphorus Diffusion Into Silicon Through an Oxide Layer written by Dawon Kahng and published by . This book was released on 1959 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Diffusion of Boron and Phosphorus Into Silicon written by David Joseph Ager and published by . This book was released on 1969 with total page 244 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Diffusion of Boron Into Silicon from an Oxide Source written by P. J. Gregory and published by . This book was released on 1970 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1971 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Diffusion of Boron and Phosphorus in Silicon written by Teh Ming Ou and published by . This book was released on 1965 with total page 92 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis presents some experimental results for producing controlled PN and NPN diffused structures in silicon by varying the strength of the diffusion sources. Boron diffusions were carried out in a N2 atmosphere at 1200°C with 10%, 20%, 30% and 40% B203 in silicic acid as sources. Phosphorus diffusions were carried out at 1150°C with a P205, source at temperatures of 220°C, 300°C, 400°C and 500°C and 02 as a carrier gas. For boron diffusions, the surface concentration of the boron impurity atoms diffused into an N-type silicon wafer varied from 2.18 x 1017 to 1.45 x 1020 atoms/cm3 as the composition of the source was changed. Similarly, for phosphorus diffusions, the surface concentration of phosphorus impurity atoms diffused into a P-type silicon wafer varied from 1.8 x 1018 to 9.5 x 1021 atoms/cm3 as the temperature of the source was changed. Post-diffusion, which consists of heating a silicon wafer previously diffused with impurity atoms, was investigated to impurity atoms. structures were determine the Using these fabricated by redistribution of the results, NPN and FNP double diffusions.
Download or read book The effects of making oxide on the diffusion of boron into silicon written by Shuja Ahmad Abbasi and published by . This book was released on 1980 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Piezoresistive Properties of Boron and Phosphorous Implanted Layers in Silicon written by Shao-Fu Chü and published by . This book was released on with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Silicon Device Processing written by Charles P. Marsden and published by . This book was released on 1970 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: The objective of the Symposium was to provide an opportunity for engineers and applied scientists actively engaged in the silicon device technology field to discuss the most advanced measurement methods for process control and materials characterization.The basic theme of the meeting was to stress the interdependence of measurements techniques, facilities, and materials as they relate to the overall problems of improving and advancing silicon device sciences and technologies.(Author).
Download or read book Impurity Doping Processes in Silicon written by F.F.Y. Wang and published by Elsevier. This book was released on 2012-12-02 with total page 652 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book introduces to non-experts several important processes of impurity doping in silicon and goes on to discuss the methods of determination of the concentration of dopants in silicon. The conventional method used is the discussion process, but, since it has been sufficiently covered in many texts, this work describes the double-diffusion method.
Download or read book Fundamentals of Silicon Integrated Device Technology Oxidation diffusion and epitaxy v 2 Bipolar and unipolar transistors written by Robert M. Burger and published by . This book was released on 1967 with total page 528 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1975 with total page 764 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Official Gazette of the United States Patent and Trademark Office written by United States. Patent and Trademark Office and published by . This book was released on 2002 with total page 1420 pages. Available in PDF, EPUB and Kindle. Book excerpt:
