Download or read book Diagnostics and Modelling of an Inductively Coupled RF Low temperature Plasma written by Suidong Yang and published by . This book was released on 1998 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Diagnostics and Modelling of an Inductively Coupled RF Low pressure Low temperature Plasma written by Suidong Yang and published by . This book was released on 1998 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Modelling and Diagnostics of Atmospheric Argon Radio Frequency Inductively Coupled Plasma microform written by Guangning Gao and published by Library and Archives Canada = Bibliothèque et Archives Canada. This book was released on 2004 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: This dissertation describes the work on the modelling and diagnostics of atmospheric argon radio frequency (RF) inductively coupled plasma (ICP).A fully computer-controlled optical emission spectroscopy (OES) experimental system was established during this project, and it was used to measure the plasma temperature and electron densities of a 40 MHz argon RF ICP. The excitation temperature measured from the Boltzmann plot, and electron density from the continuum emission are proved to be reliable estimations. The temperature measurement showed agreement with the prediction of the model, whereas the estimation of the electron density needed improvement. Emission asymmetry was found to exist within the coil zone of the RF plasma. The tomography technique was applied to obtain the two-dimensional local emission profile of a 40 MHz argon RF ICP. This technique provides the basis for further investigation of the effect of the emission asymmetry on the plasma field measurement, and development of the current model. We developed a new integrated model by applying the EEDF obtained using the Boltzmann equation solver ELENDIF. The two-temperature model and ELENDIF program were combined and numerically solved together. The Maxwellian EEDF assumption was then relaxed in the new model. The model was applied to calculate the plasma fields for argon RF ICP at frequencies 13.56 and 40 MHz. The results show that the Maxwellian EEDF is still a good assumption for a 40 MHz argon RF ICP, whereas it will cause errors for the predictions of the plasma fields of the 13.56 MHz plasma. The new model can treat more complicated cases of argon RF ICP. The assumption of the Maxwellian electron energy density function (EEDF) in the two-temperature model was examined by applying the Boltzmann equation solver ELEN-DIF program. The Maxwellian EEDFs of 13.56 and 40 MHz argon RF ICP, under non-equilibrium conditions, are proved to give inaccurate estimations of the high energy electron population and the energy transfer from the electrons to atoms/ions, which will consequently affect prediction of the plasma fields.
Download or read book Diagnostic Studies and Modeling of Inductively Coupled Plasmas written by Cheng-Che Hsu and published by . This book was released on 2006 with total page 502 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Diagnostics and Plasma Surface Interactions in Inductively Coupled Plasmas written by Monica Joy Titus and published by . This book was released on 2010 with total page 430 pages. Available in PDF, EPUB and Kindle. Book excerpt: The semiconductor industry's continued trend of manufacturing device features on the nanometer scale requires increased plasma processing control and improved understanding of plasma characteristics and plasma-surface interactions. This dissertation presents a series of experimental results for focus studies conducted in an inductively coupled plasma (ICP) system. First novel "on-wafer" diagnostic tools are characterized and related to plasma characteristics. Second, plasma-polymer interactions are characterized as a function of plasma species and processing parameters. Complimentary simulations accompany each focus study to supplement experimental findings. Wafer heating mechanisms in inductively coupled molecular gas plasmas are explored with PlasmaTempTM, a novel "on-wafer" diagnostic tool. Experimental wafer measurements are obtained with the PlasmaTempTM wafer processed in argon (Ar) and argon-oxygen (Ar/O2) mixed plasmas. Wafer heating mechanisms were determined by combining the experimental measurements with a 3-dimensional heat transfer model of the wafer. Comparisons between pure Ar and Ar/O2 plasmas demonstrate that two additional wafer heating mechanisms can be important in molecular gas plasmas compared to atomic gas discharges. Thermal heat conduction from the neutral gas and O-atom recombination on wafer surface can contribute as much as 60 % to wafer heating under conditions of low-energy ion bombardment in molecular plasmas. Measurements of a second novel "on-wafer" diagnostic sensor, the PlasmaVoltTM, were tested and validated in the ICP system for Ar plasmas varying in power and pressure. Sensor measurements were interpreted with a numerical sheath simulation and comparison to scaling laws derived from the inhomogeneous sheath model. The study demonstrates sensor measurements are proportional to the RF-current through the sheath and the scaling is a function of sheath impedance. PlasmaVoltTM sensor measurements are proportional to the square root of the plasma density at the plasma-sheath interface, one-fourth root of the electron temperature, and one-fourth root of the RF bias voltage under conditions where the sheath is predominantly capacitive. When the sheath impedance becomes increasingly resistive, the sensor measurements deviate from the scaling law and tend to be directly proportional to the plasma density. Vacuum ultraviolet (VUV) emissions in Ar ICPs are characterized and the chemical and physical modifications to 193 nm photoresist (PR) polymer materials processed in Ar ICPs are investigated. Fourier transform infrared (FTIR) transmission measurements as a function of VUV photon fluence demonstrate that VUV-induced bond breaking occurs over a period of time. A numerical model demonstrates that VUV photons deplete near-surface O-containing bonds, leading to deeper, subsequent penetration and more bond losses, while the remaining near-surface C-C bonds absorb the incident radiation and slow VUV photon penetration. The roughening mechanism of blanket and patterned 193 nm PR samples are explored in a well characterized Ar ICP. FTIR and atomic force microscopy (AFM) analysis of plasma processed 193 nm PR suggests that ion-induced generation of a graphitized layer at high energies, combined with VUV bulk modification of 193 nm PR may initiate PR roughening. The roughness of blanket samples increases as a function of VUV fluence, ion energy, and substrate temperature. Line width roughness (LWR) measurements of patterned samples demonstrate a similar trend suggesting that LWR may correlate with surface roughness of patterns. The results are compared to PR studies previously conducted in an ultra-high vacuum beam system demonstrating that the vacuum beam system is a useful tool that can deconvolute and simplify complex plasma systems.
Download or read book Atomic and Molecular Processes written by D.R. Bates and published by Elsevier. This book was released on 2016-06-03 with total page 921 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic and Molecular Processes focuses on radiative and collisional processes involving atoms or molecules, including photoionization, elastic and inelastic scattering of electrons, energy loss by slow electrons, excitation, ionization, detachment, charge transfer, elastic scattering, and chemical reactions. The selection first offers information on forbidden and allowed transitions, including forbidden transitions in diatomic molecular spectra; forbidden transitions in crystals; calculations of atomic line strengths; and measurements of atomic transition probabilities. The book also ponders on photoionization processes, photodetachment, and high temperature shock waves. The manuscript elaborates on electronic and ionic recombination, elastic scattering of electrons, and the motions of slow electrons in gases. The book also evaluates the theory of excitation and ionization by electron impact; measurement of collisional excitation and ionization cross sections; and spectral line broadening in plasmas. The selection is a dependable reference for readers interested in atomic and molecular processes.
Download or read book Advances in Low Temperature Rf Plasmas written by Toshiaki Makabe and published by Elsevier Publishing Company. This book was released on 2002 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low temperature plasmas have had a very broad range of applications ever since their discovery. However, recent developments in the dextrous handling of dry etching non-equilibrium plasma have attracted a great common interest that has driving force behind the major developments in diagnostic, theoretical and numerical techniques since the 1980s. A greater fundamental understanding of the kinetics of radio-frequency (rf) plasmas and their interaction with surfaces in regard to the process of large scale integrated circuits has been achieved through the cooperation between academia and industry. At the same time, new applications have become possible, and the basic understanding of low temperature rf plasmas has diffused to other areas of plasma physics. in the special issue of Applied Surface Science, which is published in memory of the International Workshop on Basis for Low Temperature Plasma Applications at Hakone in Japan on July 24 - 25 of 2001. The basic goal in the selection of topics was to cover the range of issues that represent the building blocks of the complex, vertically integrated plasma simulation schemes including surface processes. The text also shows examples of integrated codes and how they are implemented in the development of new strategies of plasma processing. Such codes may be used both in modern experiments and in the computer aided design and control of the plasma devices of the next generation. These are based on the transport theory of electrons, ions and neutrals, as well as on numerical modellings and on the available collision and transport data describing gas and surface phases. density plasmas. All the chapters present a relatively complete review of the developments in these fields since the 1980s as well as a review of their status of development in 2002, and there is a blend of research reviews from both academia and industry.
Download or read book Optical Diagnostics and Modeling of Low temperature Laboratory Plasmas written by and published by . This book was released on 2014 with total page 100 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Spectroscopy written by Takashi Fujimoto and published by Clarendon Press. This book was released on 2004-06-17 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book focuses on the characteristics of optical radiation, or a spectrum, emitted by various plasmas. In plasma, the same atomic species can produce quite different spectra, or colours, depending on the nature of the plasma. This book gives a theoretical framework by which a particular spectrum can be interpreted correctly and coherently. The uniqueness of the book lies in its comprehensive treatment of the intensity distribution of spectral lines and the population density distribution among the atomic levels in plasmas. It is intended to provide beginners with a good perspective of the field, laying out the physics in an extremely clear manner and starting from an elementary level. A useful feature of the book is the asterisked sections and chapters which can be skipped by readers who only wish to gain a quick and basic introduction to plasma spectroscopy. It will also be useful to researchers working actively in the field, acting as a guide for carrying out experiments and interpreting experimental observations.
Download or read book Journal of Research of the National Institute of Standards and Technology written by and published by . This book was released on 1995 with total page 842 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.
Download or read book Electrical Probes for Plasma Diagnostics written by John Douglas Swift and published by Iliffe. This book was released on 1969 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Low Temperature Plasma Technology written by Paul K. Chu and published by CRC Press. This book was released on 2013-07-15 with total page 497 pages. Available in PDF, EPUB and Kindle. Book excerpt: Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.
Download or read book Physics of Radio Frequency Plasmas written by Pascal Chabert and published by Cambridge University Press. This book was released on 2011-02-24 with total page 395 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.
Download or read book Modeling of Low pressure RF Plasma Sintering written by Seungho Paik and published by . This book was released on 1990 with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Low Pressure Plasmas and Microstructuring Technology written by Gerhard Franz and published by Springer Science & Business Media. This book was released on 2009-04-09 with total page 743 pages. Available in PDF, EPUB and Kindle. Book excerpt: Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]—no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].
Download or read book Modelling and Diagnostics of Low Pressure Plasma Discharges written by and published by . This book was released on 2002 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Energy and Particle Flow in Low Temperature Plasmas written by and published by . This book was released on 1995 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: Increased interest in the development of high density plasma sources for ultra large scale integrated circuit manufacturing with varying geometry and power coupling strategies require the development of 2D models for accurate plasma reactor studies. An objective of their research was to develop a computationally efficient numerical code that would be useful as a design tool for inductively coupled plasma reactors. To achieve that goal the authors created a 2D fluid model (INDUCT2D) of an argon discharge. As uniformity is a primary issue in wafer manufacturing they have used INDUCT2D to investigate the effect of pressure and reactor geometry on the spatial uniformity of the etching ion flux. They have found that the optimum pressure for maximum uniformity depends upon the spatial profile of the inductive heating, and decreases with the reactor aspect ratio.
