Download or read book Diagnostic Techniques for Semiconductor Materials Processing Materials Research Society Symposium Proceedings Held in Boston Massachusetts on November 29 December 2 1993 written by O. J. Glembocki and published by . This book was released on 1994 with total page 499 pages. Available in PDF, EPUB and Kindle. Book excerpt: The symposium focused on various aspects of process diagnostics and device processing. Diagnostic techniques which were considered fell into two classes: invasive and non invasive. Optical characterization techniques were the most widely applied characterization tools used in both materials and process monitoring. Techniques such as reflectance difference, ellipsometry, reflectance, absorption, light scattering, photoreflectance, Raman scattering and thermal wave modulated reflectance were shown to be powerful probes of various materials properties. The materials properties that were probed included surface stoichiometry and morphology, etch damage, Fermi level pinning position and thin film properties such as thickness, alloy content, and interfacial roughness. Real time diagnostics such as ellipsometry and reflectance difference were shown to be sensitive tools of materials properties during processing.

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