Download or read book Diagnostic Studies and Modeling of Inductively Coupled Plasmas written by Cheng-Che Hsu and published by . This book was released on 2006 with total page 502 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma Diagnostics and Plasma Surface Interactions in Inductively Coupled Plasmas written by Monica Joy Titus and published by . This book was released on 2010 with total page 430 pages. Available in PDF, EPUB and Kindle. Book excerpt: The semiconductor industry's continued trend of manufacturing device features on the nanometer scale requires increased plasma processing control and improved understanding of plasma characteristics and plasma-surface interactions. This dissertation presents a series of experimental results for focus studies conducted in an inductively coupled plasma (ICP) system. First novel "on-wafer" diagnostic tools are characterized and related to plasma characteristics. Second, plasma-polymer interactions are characterized as a function of plasma species and processing parameters. Complimentary simulations accompany each focus study to supplement experimental findings. Wafer heating mechanisms in inductively coupled molecular gas plasmas are explored with PlasmaTempTM, a novel "on-wafer" diagnostic tool. Experimental wafer measurements are obtained with the PlasmaTempTM wafer processed in argon (Ar) and argon-oxygen (Ar/O2) mixed plasmas. Wafer heating mechanisms were determined by combining the experimental measurements with a 3-dimensional heat transfer model of the wafer. Comparisons between pure Ar and Ar/O2 plasmas demonstrate that two additional wafer heating mechanisms can be important in molecular gas plasmas compared to atomic gas discharges. Thermal heat conduction from the neutral gas and O-atom recombination on wafer surface can contribute as much as 60 % to wafer heating under conditions of low-energy ion bombardment in molecular plasmas. Measurements of a second novel "on-wafer" diagnostic sensor, the PlasmaVoltTM, were tested and validated in the ICP system for Ar plasmas varying in power and pressure. Sensor measurements were interpreted with a numerical sheath simulation and comparison to scaling laws derived from the inhomogeneous sheath model. The study demonstrates sensor measurements are proportional to the RF-current through the sheath and the scaling is a function of sheath impedance. PlasmaVoltTM sensor measurements are proportional to the square root of the plasma density at the plasma-sheath interface, one-fourth root of the electron temperature, and one-fourth root of the RF bias voltage under conditions where the sheath is predominantly capacitive. When the sheath impedance becomes increasingly resistive, the sensor measurements deviate from the scaling law and tend to be directly proportional to the plasma density. Vacuum ultraviolet (VUV) emissions in Ar ICPs are characterized and the chemical and physical modifications to 193 nm photoresist (PR) polymer materials processed in Ar ICPs are investigated. Fourier transform infrared (FTIR) transmission measurements as a function of VUV photon fluence demonstrate that VUV-induced bond breaking occurs over a period of time. A numerical model demonstrates that VUV photons deplete near-surface O-containing bonds, leading to deeper, subsequent penetration and more bond losses, while the remaining near-surface C-C bonds absorb the incident radiation and slow VUV photon penetration. The roughening mechanism of blanket and patterned 193 nm PR samples are explored in a well characterized Ar ICP. FTIR and atomic force microscopy (AFM) analysis of plasma processed 193 nm PR suggests that ion-induced generation of a graphitized layer at high energies, combined with VUV bulk modification of 193 nm PR may initiate PR roughening. The roughness of blanket samples increases as a function of VUV fluence, ion energy, and substrate temperature. Line width roughness (LWR) measurements of patterned samples demonstrate a similar trend suggesting that LWR may correlate with surface roughness of patterns. The results are compared to PR studies previously conducted in an ultra-high vacuum beam system demonstrating that the vacuum beam system is a useful tool that can deconvolute and simplify complex plasma systems.

Download or read book Diagnostic Studies of Ion Beam Formation in Inductively Coupled Plasma written by and published by . This book was released on 2016 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the Second International Symposium on Process Control Diagnostics and Modeling in Semiconductor Manufacturing written by M. Meyyappan and published by The Electrochemical Society. This book was released on 1997 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Two dimensional Modeling of Pulsed Inductively Coupled Plasmas Using Moderate Parallelism written by Pramod Subramonium and published by . This book was released on 2001 with total page 218 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Diagnostics and Modelling of an Inductively Coupled RF Low pressure Low temperature Plasma written by Suidong Yang and published by . This book was released on 1998 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Inductively Coupled Plasmas in Analytical Atomic Spectrometry written by Akbar Montaser and published by John Wiley & Sons. This book was released on 1996-12-17 with total page 1044 pages. Available in PDF, EPUB and Kindle. Book excerpt: The broadest source of information on analytical ICP spectrometry available in a coherent, single volume. Renowned contributors define theory, diagnostics, models, instrumentation and applications. They also discuss atomic emission, atomic fluorescence and mass spectrometries based on ICP sources for atomization, excitation and ionization. 'This book is HIGHLY RECOMMENDED.' Analytical Chemistry '... a handy reference for anyone attempting to understand the theory of ICPs and how they work. The detailed discussions of the various types of instrumentation and methods will be quite helpful to students and researchers in the field who want to broaden their understanding of analytical atomic spectroscopy.' Applied Spectroscopy '...Everyone involved in elemental analysis using ICP should have this book. It is useful for both experienced and novice ICP spectroscopists.' Spectroscopy

Download or read book Modeling of Non equilibrium Plasmas in an Inductively Coupled Plasma Facility written by and published by . This book was released on 2014 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Experiments and Modeling with a Large area Inductively Coupled Plasma ICP Source written by and published by . This book was released on 1995 with total page 10 pages. Available in PDF, EPUB and Kindle. Book excerpt: We describe initial experiments with a large (30 in.) plasma source chamber to explore the problems associated with large-area Inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400 mm semiconductor wafers. Our experiments typically use a 25 in. diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N2 over the pressure range 3--50 mtorr. R.F. Inductive power was run up to 2000W, but typically data were taken over the range 100--1000W. Diagnostics Include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The B-dot and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400 mm processing are attainable. We present a comparison between computer modeling and experimental results for this source. Computer simulations using the fluid code INDUCT94 are used to explain variations In the plasma density profile measurements as a function of Inductive power, gas pressure and gas composition. Both Argon and Nitrogen discharges are modeled. INDUCT94 solves the 2D time-dependent fluid equations for electrons, ions and neutrals Including effects of both Inductive and capacitive coupling. Detailed volume and surface chemistry reactions are treated. We discuss the effects of pressure and power on plasma uniformity.

Download or read book Proceedings of the Symposium Om Process Control Diagnostics and Modeling in Semiconductor Manufacturing written by M. Meyyappan and published by The Electrochemical Society. This book was released on 1995 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Diagnostics and Modelling of an Inductively Coupled RF Low temperature Plasma written by Suidong Yang and published by . This book was released on 1998 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Dissertation Abstracts International written by and published by . This book was released on 2007 with total page 960 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Energy Research Abstracts written by and published by . This book was released on 1995 with total page 782 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Journal of Research of the National Institute of Standards and Technology written by and published by . This book was released on 1995 with total page 842 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.

Download or read book Mode Transition and Hysteresis in Inductively Coupled Plasma Sources written by Shu-Xia and published by . This book was released on 2020 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this chapter, the characteristics of low-temperature inductively coupled plasma sources, that is, non-equilibrium, weakly ionized and bounded plasma, are described. The phenomenon of mode transition and hysteresis is one of the main physics aspects that happens in this source. Via a hybrid model, the behaviors of plasma parameters, electron kinetics and neutral species during mode transition are presented. Still, the role of metastables and multistep ionization on triggering the hysteresis is investigated. Using a fluid model that couples the equivalent circuit module, the discontinuity of mode transition and hysteresis are observed by tuning the matching network impedance. The work indicates the mutual interaction between the plasma and the circuit excites hysteresis. Besides these findings, the other important aspects of this phenomenon are briefly discussed. To the author, the exploration on the precursors that trigger hysteresis is the most attractive topic. The investigations advance the improvement of analytical theory, numerical modeling and experimental diagnostics of low-temperature plasma physics.

Download or read book Computer Modeling of Enclosed Inductively Coupled Plasma Discharges written by Ana M. Gaillat and published by . This book was released on 1996 with total page 510 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt: