Download or read book Deposition of Zinc Sulphide Thin Films Using Organometallic Atomic Layer Epitaxy written by Adolph Hunter and published by . This book was released on 1987 with total page 184 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Atomic Layer Epitaxy written by T. Suntola and published by Springer. This book was released on 1989-10-31 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a detailed study of the Atomic Layer Epitaxy technique (ALE), its development, current and potential applications. The rapid development of coating technologies over the last 25 years has been instrumental in generating interest and expertise in thin films of materials, and indeed the market for thin film coatings is currently £3 billion with projected annual growth of 20 to 30% [1]. ALE is typical of thin-film processes in that problems in the processing or preparation of good quality epitaxial films have been overcome, resulting in better performance, novel applications of previously unsuitable materials, and the development of new devices. Many materials exhibit interesting and novel properties when prepared as thin films and doped. Vapour-deposited coatings and films are used extensively in the semiconductor and related industries for making single devices, integrated circuits, microwave hybrid integrated circuits, compact discs, solar reflective glazing, fibre optics, photo voltaic cells, sensors, displays, and many other products in general, everyday use. The ALE technique was developed by a research team led by Tuomo Suntola, working for Instrumentarium Oy in Finland. The key members of this team were lorma Antson, Arto Pakkala and Sven Lindfors. In 1977, the research team moved from Instrumentarium to Lohja Corporation, where they continued the development of ALE and were granted a patent in the same year. By 1980, the technique was sufficiently advanced that they were producing flat-screen electroluminescent displays based on a manganese-doped zinc sulphide layer.

Download or read book Growth and Characterization of Electrodeposited Zinc Sulphide and Chemical Vapour Atomic Layer Deposited Zinc Oxide Sulphide and Oxysulphide Thin Films microform written by Sanders, Brian Wayne and published by National Library of Canada = Bibliothèque nationale du Canada. This book was released on 1991 with total page 181 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The atomic layer epitaxy growth and characterization of zinc sulfide and alkaline earth sulfide thin films for electroluminescent applications written by Markku Tammenmaa and published by . This book was released on 1988 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Download or read book Epitaxial Zinc Oxide Thin Films and Nanowires written by Maximilian Kolhep and published by . This book was released on 2023* with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Deposition of Binary and Ternary Oxide Thin Films of Trivalent Metals by Atomic Layer Epitaxy written by Minna Nieminen and published by . This book was released on 2001 with total page 57 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Electroreflectance of Polycrystalline ZnS Thin Film Grown by Atomic Layer Epitaxy Method written by J. Lahtinen and published by . This book was released on 1981 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Development of Low temperature Deposition Processes by Atomic Layer Epitaxy for Binary and Ternary Oxide Thin Films written by Matti Putkonen and published by . This book was released on 2002 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Atomic Layer Controlled Deposition of Thin Films Using Sequential Surface Reactions written by Jason Wells Klaus and published by . This book was released on 1999 with total page 598 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Growth Characterization and Applications of Zinc Sulfide Thin Films by Solution Based Processes written by Dick Chiu and published by . This book was released on 2017 with total page 132 pages. Available in PDF, EPUB and Kindle. Book excerpt: Zinc Sulfide (ZnS) thin film, with a wide band gap, has been used for many applications, such as buffer layer for CIGS solar cells, light emitting diodes and thin film electroluminescent devices. In this work, ZnS thin films were prepared using two different deposition processes. In the first method, ZnS thin films were deposited by using conventional chemical bath deposition (CBD) process. Micro-reactor assisted solution deposition (MASD) with a flow cell was used as the second method. Growth kinetics of ZnS thin films in CBD was analyzed using in-situ quartz crystal microbalance measurements, and ex-situ transmission electron microscopy (TEM) and scanning electron microscopy (SEM) measurements. The results from the TEM and SEM measurements suggest that the film growth follows a two-step process with the formation of the nuclei in the solution first, attachment to the surface, followed by aggregation of nanoparticles into half spheres on the surface of the substrate and finally half spheres connect to the neighbor half spheres, thereby forming a continuous film. The mechanism study, verified by the SEM images, shows that nucleation starts very early in the CBD process. The degree of supersaturation influences the growth rate and final surface morphology. Temperature-dependent growth rate in the linear growth region follows the Arrhenius equation with an estimated value of activation energy (Ea) to be around 36 KJ/mol. This value, which is considered low (less than 40 kJ/mol), indicates that the rate limiting step is more likely to be a physical process such as adsorption or diffusion, rather than a chemical process, which tends to have higher activation energies. In our study, the chemical bath is vigorously stirred so that the rate-limiting step is likely controlled by a physically adsorption mechanism. The continuous flow micro reactor was used to deposit ZnS thin films using various flow cells of different designs. The depositions were carried out on display glass of 1 inch wide by 3 inches long. Both analytical equations (Hagen-Poiseuille) and computational fluid dynamics were applied to determine proper height for the flow channel. COMSOL Multiphysics simulation of fluid flow along with particle tracer was carried out to find an optimum cut out radius for further study. The film thickness growth kinetics and solute concentration near the substrate surface was simulated using the COMSOL Multiphysics program with an assumption of laminar flow, transport of diluted species and a simplified first order reaction. An insert that mimics a cut out radius of 2.31 inches was fabricated using a 3D printer and installed in the flow cell to deposit ZnS thin films. ZnS thin films deposited using the flow cells with and without the 3D printed insert were investigated. The results were analyzed using plane-view and cross-sectional SEM images. The film thickness was determined by cross-sectional SEM image. The results indicated that the thickness uniformity was improved with the 3D printed insert. We found toward the end of the substrate, the ZnS thin film was not continuous due to the lower solution concentration caused by the depletion of reactants. New flow cell designs were proposed and COMSOL simulation was performed to examine the effectiveness of these flow cells. To demonstrate the utility of the ZnS thin films by solution-based processes, SnS and CuS thin films were deposited on top of the ZnS thin film to form SnS/CuS/ZnS layered precursor film then followed by selenziation at various temperatures in an attempt to produce CZTSSe absorber layers for CZTSSe thin film solar cells.

Download or read book Handbook of Manufacturing Engineering and Technology written by Andrew Y. C. Nee and published by Springer. This book was released on 2014-10-31 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.

Download or read book Atomic Layer Deposition of Metal Sulfide Thin Films Using Non halogenated Precursors written by and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A method for preparing a metal sulfide thin film using ALD and structures incorporating the metal sulfide thin film. The method includes providing an ALD reactor, a substrate, a first precursor comprising a metal and a second precursor comprising a sulfur compound. The first and the second precursors are reacted in the ALD precursor to form a metal sulfide thin film on the substrate. In a particular embodiment, the metal compound comprises Bis(N, N'-di-sec-butylacetamidinato)dicopper(I) and the sulfur compound comprises hydrogen sulfide (H.sub. 2S) to prepare a Cu.sub. 2S film. The resulting metal sulfide thin film may be used in among other devices, photovoltaic devices, including interdigitated photovoltaic devices that may use relatively abundant materials for electrical energy production.

Download or read book Exploiting Atomic Layer Epitaxy Thin Film Deposition Technique in Solid state Chemical Sensor Applications written by Mikko Utriainen and published by . This book was released on 1999 with total page 80 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Optical properties of Zn O S thin films deposited by RF sputtering atomic layer deposition and chemcial bath deposition written by and published by . This book was released on 2012 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt: Zn(O, S) thin films 27 - 100 nm thick were deposited on glass or Cu(InxGa1-x)Se2/Molybdenum/glass with RF sputtering, atomic layer deposition, and chemical bath deposition.