Download or read book Deposition of Titanium Dioxide by Physical Vapor Deposition written by Nishantha B. Dissanayake and published by . This book was released on 2003 with total page 144 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films written by Polly Wanda Chu and published by . This book was released on 1994 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.
Download or read book Photocatalytically Active and Optically Transparent Titanium Dioxide Thin Films Prepared by Ion Assisted Physical Vapor Deposition written by Redouan Boughaled el Lakhmissi and published by . This book was released on 2013 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films written by David Christopher Gilmer and published by . This book was released on 1998 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition Applied to Titanium Dioxide written by Alfred J. Lutz and published by . This book was released on 1983 with total page 70 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Titanium Dioxide TiO2 Thin Film Deposition by Using Chemical vapor Deposition CVD Technique written by and published by . This book was released on 2014 with total page 49 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Selective Light Induced Chemical Vapour Deposition of Titanium Dioxide Thin Films written by Estelle Wagner and published by . This book was released on 2003 with total page 198 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Low Pressure Metal Organic Chemical Vapor Deposition of Titanium Dioxide Thin Films in Conjunction with Photocatalytic Investigations written by Abon Jason Manuel del Rosario and published by . This book was released on 2003 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book A Kinetic and Mechanistic Study of the Chemical Vapor Deposition of Titanium Dioxide Using Alkoxide Precursors written by Carl Pete Fictorie and published by . This book was released on 1997 with total page 494 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Aerosol Assisted Chemical Vapour Deposition of Titanium Dioxide and Tungsten Oxide Thin Films written by and published by . This book was released on 2014 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Thin Film Titanium Dioxide by Chemical Vapor Deposition written by Dale Ralph Harbison and published by . This book was released on 1969 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electric Field Assisted Chemical Vapour Deposition Processes on Titanium Dioxide Thin Films for Photocatalysis written by Luz Romero and published by . This book was released on 2014 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Aerosol Assisted Chemical Vapour Deposition of Titanium Dioxide and Tungsten Oxide Thin Films written by Cynthia Edusi and published by . This book was released on 2014 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Photoelectrochemical Activity of Titanium Dioxide Thin Films written by Aida Mehdinezhad Roshan and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Titanium dioxide (TiO2) is considered as an oxide semiconductor with several unique properties, including environmental sensing capabilities, biocompatibility and photocurrent generation, long-term stability, cost efficiency, and chemical inertness. TiO2 thin films have a wide range of applications in dye-sensitized solar cells. TiO2 films have been deposited on two different substrates, aluminum and titanium. Two different methods used for deposition of the thin films namely: Plasma Electrolytic Oxidation (PEO) and Physical Vapor Deposition (PVD). In order to study the effect of roughness of the substrate on photocurrent generation of the deposited films, one group of substrates were "patterned" by Electrolytic Plasma Processing (EPP) prior to deposition. A "hill and valley" morphology was observed on the uppermost layer of the EPP-treated substrates. The microstructure and also roughness of the EPP-treated substrates were characterized by Scanning Electron Microscopy (SEM) and Profilometry. Similarly, the deposited TiO2 thin films were also characterized by SEM, Energy Dispersive Spectroscopy (EDS), Raman, Transmission Electron Microscopy (TEM), X-ray Diffractometry (XRD), and Profilometry. It was found that the PEO deposited film on titanium substrate was composed of anatase and the film on the aluminum substrate was amorphous. The average thickness of the PEO deposited films was about 6-10 microns. TiO2 thin films deposited by DC magnetron sputtering were found to be almost amorphous with an average thickness of 650 nm. High resolution TEM analysis showed some areas of crystallinity with a grain size of ~5 nm. Photoelectrocurrent measurements were then performed on all deposited films by a standard single-compartment, three-electrode electrochemical cell. It has been observed that the films deposited by PVD technique have a much higher quality and produce much higher photocurrent comparing to ones of PEO method.
Download or read book Chemical Vapor Deposition of Titanium Dioxide in a Batch Reactor Using Titanium Tetra isopropoxide and Oxygen written by Allyson K. Shaler Smith and published by . This book was released on 2000 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition of Titanium Dioxide as Means of Increasing the Tissue Compatibility of 316L Stainless Steel Orthopedic Implants written by Glenn F. Cueman and published by . This book was released on 1973 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Transient Chemical Vapor Deposition of Titanium Dioxide Using Titanium Tetra isopropoxide as a Precursor in a Batch Reactor written by Benjamin L. Schauerhamer and published by . This book was released on 2000 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt:
