Download or read book Deposition of Organic Thin Films Using Energy Tunable Molecular Beams on Silicon Dioxide and Octadecyltrichlorosilane Modified Silicon Dioxide written by Jared Lynn Mack and published by . This book was released on 2006 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Interface Formation and Thin Film Deposition for Molecular and Organic Electronics written by Aravind Srinivasa Killampalli and published by . This book was released on 2006 with total page 608 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Thin Film Deposition Employing Supersonic Molecular Beams of Tunable Kinetic Energy and Angle of Incidence written by Samuel Edward Roadman and published by . This book was released on 2000 with total page 542 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Partially Ionized Beam Deposition of Silicon Dioxide and Aluminum Thin Films Defects Generation written by Justin Wai-Chow Wong and published by . This book was released on 1987 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Handbook of Thin Film Deposition written by Krishna Seshan and published by William Andrew. This book was released on 2012-12-06 with total page 411 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films. A practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applications Covers core processes and applications in the semiconductor industry and new developments in the photovoltaic and optical thin film industries The new edition takes covers the transition taking place in the semiconductor world from Al/SiO2 to copper interconnects with low-k dielectrics Written by acknowledged industry experts from key companies in the semiconductor industry including Intel and IBM Foreword by Gordon E. Moore, co-founder of Intel and formulator of the renowned ‘Moore’s Law’ relating to the technology development cycle in the semiconductor industry
Download or read book Chemical Solution Deposition of Functional Oxide Thin Films written by Theodor Schneller and published by Springer Science & Business Media. This book was released on 2014-01-24 with total page 801 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.
Download or read book Silicon Dioxide Deposition at 100 C Using Vacuum Ultraviolet Light written by J. Marks and published by . This book was released on 1988 with total page 12 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin films of silicon dioxide are used extensively as insulators in the fabrication of many semiconductor devices. Silicon dioxide films deposited by chemical vapor deposition typically require temperatures near 800 C. However, some processes, such as the fabrication of devices with multilevel aluminum interconnects, require deposition temperatures below 350 C. Several techniques that have been developed for low-temperature deposition of silicon dioxide include plasma-assisted deposition, low-pressure chemical vapor deposition, and photo-assisted chemical vapor deposition. Some photochemical deposition reaction use Hg vapor as a photochemical catalyst to decompose nitrous oxide in the pressure of silane. Films deposited with these reactions have been found to have adhesion problems, and tend to be in completely oxidized. Several other deposition reactions using photodissociation of molecular oxygen or disilane have been reported. (jes).
Download or read book Handbook of Thin film Deposition Processes and Techniques written by Klaus K. Schuegraf and published by William Andrew. This book was released on 1988 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt: The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.
Download or read book Thin Film Deposition Employing Supersonic Molecular Beams written by Todd William Schroeder and published by . This book was released on 2004 with total page 660 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Bulk Properties of Silicon Dioxide Thin Films Prepared by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition written by Robert George Andosca and published by . This book was released on 1991 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Formation of Low Temperature Silicon Dioxide Films Using Chemical Vapor Deposition written by Hsiao-Hui Chen and published by . This book was released on 1991 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Low Temperature Oxide (LTO) thin films were prepared using a Low Pressure Chemical Vapor Deposition process. The process was characterized by applying traditional statistical studies and response surface technique. The uniformities within wafer and from wafer to wafer were examined by determining the mean and the standard deviation of films thicknesses. Response surface methodology was employed to determine the optimum process conditions. Time, temperature and gas flow ratio were used as the experimental factors. Index of refraction and deposition rate were used as the experimental responses. Additionally, etch rate, density, dielectric constant and infrared (IR) spectra were found for the silicon dioxide films prepared at the determined optimum condition. The IR spectra were obtained by employing Fourier Transform Infrared Spectroscopy (FTIR). The average deposition rate was found to be 46 A per minute and the average index of refraction was 1.44. The calculated density, activation energy, etch rate, dielectric constant and dielectric strength agreed with reported values. A double metal test run was performed using LTO oxide. The results indicated that the recommended baseline LTO process is suitable for multilayer metallization processes."--Abstract.
Download or read book Synthesis and Characterization of Silicon Dioxide Thin Films by Plasma Enhances Chemical Vapor Deposition from Diethylsilane and Nitrous Oxide written by Lan Chen and published by . This book was released on 1995 with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Molecular Layer Deposition for Tailored Organic Thin Film Materials written by Tetsuzo Yoshimura and published by CRC Press. This book was released on 2023-03-14 with total page 429 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reviews various types of MLD processes including vapor-phase MLD, liquid-phase MLD, and selective MLD. Introduces organic multiple quantum dots (Organic MQDs) that are typical tailored organic thin-film materials produced by MLD. Designs light modulators/optical switches, predicts their performance, and discusses impacts of the organic MQDs on them. Discusses impacts of the organic MQDs on optical interconnects within computers and on optical switching systems. Presents proposals of MLD applications to energy conversion systems, molecular targeted drug delivery, photodynamic therapy, and laser surgery for cancer therapy.
Download or read book Characterization of LPCVD Deposited Silicon Dioxide Thin Films written by Xue Du and published by . This book was released on 1992 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition Using Ditertiarybutylsilane and Oxygen written by Sung-Jun Lee and published by . This book was released on 1996 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Low Pressure Chemical Vapor Deposition of Silicon Dioxide and Phosphosilicate Glass Thin Films written by Vijayalakshmi Venkatesan and published by . This book was released on 1996 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition written by Sutham Niyomwas and published by . This book was released on 1997 with total page 86 pages. Available in PDF, EPUB and Kindle. Book excerpt:
