Download or read book Debris Characterization and Mitigation of Droplet Laser Plasma Sources for EUV Lithography written by Kazutoshi Takenoshita and published by . This book was released on 2006 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt: The design of a the laser plasma EUVL light source consists of a plasma produced from a high-intensity focused laser beam from a solid/liquid target, from which radiation is generated and collected by a large solid angle mirror or array of mirrors. The collector mirrors have the same reflectivity characteristics as the stepper mirrors. The EUVL light source is considered as the combination of both the hot-dense plasma and the collector mirrors.
Download or read book Radiation Studies of the Tin doped Microscopic Droplet Laser Plasma Light Source Specific to EUV Lithography written by Chiew-Seng Koay and published by . This book was released on 2006 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the other research program, debris mitigation and debris characterization of the source are also being carried out, and promising results have been demonstrated.
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Download or read book Comprehensive Biomedical Physics written by and published by Newnes. This book was released on 2014-07-25 with total page 4052 pages. Available in PDF, EPUB and Kindle. Book excerpt: Comprehensive Biomedical Physics, Ten Volume Set is a new reference work that provides the first point of entry to the literature for all scientists interested in biomedical physics. It is of particularly use for graduate and postgraduate students in the areas of medical biophysics. This Work is indispensable to all serious readers in this interdisciplinary area where physics is applied in medicine and biology. Written by leading scientists who have evaluated and summarized the most important methods, principles, technologies and data within the field, Comprehensive Biomedical Physics is a vital addition to the reference libraries of those working within the areas of medical imaging, radiation sources, detectors, biology, safety and therapy, physiology, and pharmacology as well as in the treatment of different clinical conditions and bioinformatics. This Work will be valuable to students working in all aspect of medical biophysics, including medical imaging and biomedical radiation science and therapy, physiology, pharmacology and treatment of clinical conditions and bioinformatics. The most comprehensive work on biomedical physics ever published Covers one of the fastest growing areas in the physical sciences, including interdisciplinary areas ranging from advanced nuclear physics and quantum mechanics through mathematics to molecular biology and medicine Contains 1800 illustrations, all in full color
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 2007 with total page 540 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1997 with total page 2240 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Smaller Satellites Bigger Business written by Michael J Rycroft and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt: Y. Fujimori, Symposium Programme Committee Chair, and Faculty Member, International Space University e-mail: [email protected] M.Rycroft, Faculty Member, International Space University e-mail: [email protected] N. Crosby, International Space University e-mail: [email protected] For the sixth annual ISU Symposium the theme was "Smaller Satellites: Bigger Business? Concepts, Applications and Markets for Micro/Nanosatellites in a New Information World". Thus, the Symposium addressed the crucial question: are small satellites the saviour of space programmes around the world It did this from the unique perspective of the International Space today? University - the interdisciplinary, international and intercultural perspective. This Symposium brought together a variety of people working on small satellites - engineers, scientists, planners, providers, operators, policy makers and business executives, together with representatives from regulatory bodies, from national and international organizations, and from the finance sector, and also entrepreneurs. Discussion and debate were encouraged, based on the papers presented and those published here.
Download or read book The Physics of Inertial Fusion written by Stefano Atzeni and published by OUP Oxford. This book was released on 2004-06-03 with total page 488 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is on inertial confinement fusion, an alternative way to produce electrical power from hydrogen fuel by using powerful lasers or particle beams. It involves the compression of tiny amounts (micrograms) of fuel to thousand times solid density and pressures otherwise existing only in the centre of stars. Thanks to advances in laser technology, it is now possible to produce such extreme states of matter in the laboratory. Recent developments have boosted laser intensities again with new possibilities for laser particle accelerators, laser nuclear physics, and fast ignition of fusion targets. This is a reference book for those working on beam plasma physics, be it in the context of fundamental research or applications to fusion energy or novel ultra-bright laser sources. The book combines quite different areas of physics: beam target interaction, dense plasmas, hydrodynamic implosion and instabilities, radiative energy transfer as well as fusion reactions. Particular attention is given to simple and useful modelling, including dimensional analysis and similarity solutions. Both authors have worked in this field for more than 20 years. They want to address in particular those teaching this topic to students and all those interested in understanding the technical basis.
Download or read book Nanotechnology Research Directions IWGN Workshop Report written by R.S. Williams and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 367 pages. Available in PDF, EPUB and Kindle. Book excerpt: energy production, environmental management, transportation, communication, computation, and education. As the twenty-first century unfolds, nanotechnology's impact on the health, wealth, and security of the world's people is expected to be at least as significant as the combined influences in this century of antibiotics, the integrated circuit, and human-made polymers. Dr. Neal Lane, Advisor to the President for Science and Technology and former National Science Foundation (NSF) director, stated at a Congressional hearing in April 1998, "If I were asked for an area of science and engineering that will most likely produce the breakthroughs of tomorrow, I would point to nanoscale science and engineering. " Recognizing this potential, the White House Office of Science and Technology Policy (OSTP) and the Office of Management and Budget (OMB) have issued a joint memorandum to Federal agency heads that identifies nanotechnology as a research priority area for Federal investment in fiscal year 2001. This report charts "Nanotechnology Research Directions," as developed by the Interagency W orking Group on Nano Science, Engineering, and Technology (IWGN) of the National Science and Technology Council (NSTC). The report incorporates the views of leading experts from government, academia, and the private sector. It reflects the consensus reached at an IWGN-sponsored workshop held on January 27-29, 1999, and detailed in contributions submitted thereafter by members of the V. S. science and engineering community. (See Appendix A for a list of contributors.
Download or read book Emerging Lithographic Technologies VIII written by and published by . This book was released on 2004 with total page 602 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fundamentals of Semiconductor Manufacturing and Process Control written by Gary S. May and published by John Wiley & Sons. This book was released on 2006-05-26 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt: A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Download or read book Atomic Properties in Hot Plasmas written by Jacques Bauche and published by Springer. This book was released on 2015-08-03 with total page 386 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is devoted to the calculation of hot-plasma properties which generally requires a huge number of atomic data. It is the first book that combines information on the details of the basic atomic physics and its application to atomic spectroscopy with the use of the relevant statistical approaches. Information like energy levels, radiative rates, collisional and radiative cross-sections, etc., must be included in equilibrium or non-equilibrium models in order to describe both the atomic-population kinetics and the radiative properties. From the very large number of levels and transitions involved in complex ions, some statistical (global) properties emerge. The book presents a coherent set of concepts and compact formulas suitable for tractable and accurate calculations. The topics addressed are: radiative emission and absorption, and a dozen of other collisional and radiative processes; transition arrays between level ensembles (configurations, superconfigurations); effective temperatures of configurations, superconfigurations, and ions; charge-state distributions; radiative power losses and opacity. There are many numerical examples and comparisons with experiment presented throughout the book. The plasma properties described in this book are especially relevant to large nuclear fusion facilities such as the NIF (California) and the ITER (France), and to astrophysics. Methods relevant to the central-field configurational model are described in detail in the appendices: tensor-operator techniques, second-quantization formalism, statistical distribution moments, and the algebra of partition functions. Some extra tools are propensity laws, correlations, and fractals. These methods are applied to the analytical derivation of many properties, specially the global ones, through which the complexity is much reduced. The book is intended for graduate-level students, and for physicists working in the field.
Download or read book The Theory of Atomic Structure and Spectra written by Robert D. Cowan and published by Univ of California Press. This book was released on 2023-11-15 with total page 752 pages. Available in PDF, EPUB and Kindle. Book excerpt: Both the interpretation of atomic spectra and the application of atomic spectroscopy to current problems in astrophysics, laser physics, and thermonuclear plasmas require a thorough knowledge of the Slater-Condon theory of atomic structure and spectra. This book gathers together aspects of the theory that are widely scattered in the literature and augments them to produce a coherent set of closed-form equations suitable both for computer calculations on cases of arbitrary complexity and for hand calculations for very simple cases.
Download or read book Nanoelectronics and Information Technology written by Rainer Waser and published by John Wiley & Sons. This book was released on 2012-05-29 with total page 1041 pages. Available in PDF, EPUB and Kindle. Book excerpt: Fachlich auf höchstem Niveau, visuell überzeugend und durchgängig farbig illustriert: Das ist die neue Auflage der praxisbewährten Einführung in spezialisierte elektronische Materialien und Bauelemente aus der Informationstechnologie. Über ein Drittel des Inhalts ist neu, alle anderen Beiträge wurden gründlich überarbeitet und aktualisiert.
Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Download or read book Digital Transformation written by Reimund Neugebauer and published by Springer. This book was released on 2019-05-14 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt: With the exception of written letters and personal conversations, digital technology forms the basis of nearly every means of communication and information that we use today. It is also used to control the essential elements of economic, scientific, and public and private life: security, production, mobility, media, and healthcare. Without exaggerating it is possible to say that digital technology has become one of the foundations of our technologically oriented civilization. The benefits of modern data technology are so impressive and the potential for future applications so enormous that we cannot fail to promote its development if we are to retain our leading role in the competitive international marketplace. In this process, security plays a vital role in each of the areas of application of digital technology — the more technological sectors are entrusted to data systems technology, the more important their reliability becomes to us. Developing digital systems further while simultaneously ensuring that they always act and respond in the best interests of people is a central goal of the technological research and development propagated and conducted by Fraunhofer.
