Download or read book Damage to VUV EUV and X ray Optics written by Libor Juha and published by SPIE-International Society for Optical Engineering. This book was released on 2007 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Download or read book High precision EUV and X ray Optics for Advanced Photon Source Facilities written by Qiushi Huang and published by Frontiers Media SA. This book was released on 2023-02-02 with total page 95 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Handbook of X ray and Gamma ray Astrophysics written by Cosimo Bambi and published by Springer Nature. This book was released on with total page 5912 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Technologies for Extreme Ultraviolet and Soft X ray Coherent Sources written by Federico Canova and published by Springer. This book was released on 2015-08-17 with total page 205 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Download or read book X Ray Free Electron Laser written by Kiyoshi Ueda and published by MDPI. This book was released on 2018-07-04 with total page 457 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a printed edition of the Special Issue "X-Ray Free-Electron Laser" that was published in Applied Sciences
Download or read book Lithography written by Michael Wang and published by BoD – Books on Demand. This book was released on 2010-02-01 with total page 680 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.
Download or read book Damage to VUV EUV and X ray Optics II written by Libor Juha and published by . This book was released on 2009 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Damage to VUV EUV and X Ray Optics VI written by Libor Juha and published by . This book was released on 2018-02-28 with total page 80 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Download or read book Damage to VUV EUV and X Ray Optics IV and EUV and X ray Optics written by Libor Juha and published by . This book was released on 2013-05-30 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.
Download or read book Laser Induced Damage in Optical Materials written by Detlev Ristau and published by CRC Press. This book was released on 2014-12-03 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: Dedicated to users and developers of high-powered systems, Laser-Induced Damage in Optical Materials focuses on the research field of laser-induced damage and explores the significant and steady growth of applications for high-power lasers in the academic, industrial, and military arenas. Written by renowned experts in the field, this book concentr
Download or read book Damage to VUV EUV and X Ray Optics V written by Libor Juha and published by . This book was released on 2015-07-30 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Download or read book Damage to VUV EUV and X ray Optics VI written by Libor Juha and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Interference Coatings written by Norbert Kaiser and published by Springer. This book was released on 2013-06-29 with total page 510 pages. Available in PDF, EPUB and Kindle. Book excerpt: Designed to give a concise but complete overview of the field, this book features contributions written by leading experts in the various areas. Topics include design, materials, film growth, deposition including large area, characterization and monitoring, and mechanical stress.
Download or read book Electron beam X ray EUV and Ion beam Submicrometer Lithographies for Manufacturing written by and published by . This book was released on 1996 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book High Intensity X rays Interaction with Matter written by Stefan P. Hau-Riege and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: Filling the need for a book bridging the effect of matter on X-ray radiation and the interaction of x-rays with plasmas, this monograph provides comprehensive coverage of the topic. As such, it presents and explains such powerful new X-ray sources as X-ray free-electron lasers, as well as short pulse interactions with solids, clusters, molecules, and plasmas, and X-ray matter interactions as a diagnostic tool. Equally useful for researchers and practitioners working in the field.
Download or read book X ray and EUV FUV Spectroscopy and Polarimetry written by Silvano Fineschi and published by . This book was released on 1995 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.