Download or read book Damage Nucleation in Si During Ion Irradiation written by and published by . This book was released on 1984 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Damage nucleation in single crystals of silicon during ion irradiation is investigated. Experimental results and mechanisms for damage nucleation during both room and liquid nitrogen temperature irradiation with different mass ions are discussed. It is shown that the accumulation of damage during room temperature irradiation depends on the rate of implantation. These dose rate effects are found to decrease in magnitude as the mass of the ions is increased. The significance of dose rate effects and their mass dependence on nucleation mechanisms is discussed.
Download or read book Damage Growth in Si During Self ion Irradiation written by and published by . This book was released on 1989 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Damage nucleation/growth in single-crystal Si during ion irradiation is discussed. For MeV ions, the rate of growth as well as the damage morphology are shown to vary widely along the track of the ion. This is attributed to a change in the dominant, defect-related reactions as the ion penetrates the crystal. The nature of these reactions were elucidated by studying the interaction of MeV ions with different types of defects. The defects were introduced into the Si crystal prior to high-energy irradiation by self-ion implantation at a medium energy (100 keV). Varied damage morphologies were produced by implanting different ion fluences. Electron microscopy and ion-channeling measurements, in conjunction with annealing studies, were used to characterize the damage. Subtle changes in the predamage morphology are shown to result in markedly different responses to the high-energy irradiation, ranging from complete annealing of the damage to rapid growth. These divergent responses occur over a narrow range of dose (2--3 /times/ 1014 cm/sup -2/) of the medium-energy ions; this range also marks a transition in the growth behavior of the damage during the predamage implantation. A model is proposed which accounts for these observations and provides insight into ion-induced growth of amorphous layers in Si and the role of the amorphous/crystalline interface in this process. 15 refs, 9 figs.
Download or read book Void Nucleation and Phase Stability in Heavy Ion Irradiated Materials written by Donald Lynn Plumton and published by . This book was released on 1985 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 702 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Processing and Characterization of Materials Using Ion Beams Volume 128 written by Lynn E. Rehn and published by Mrs Proceedings. This book was released on 1989-04-19 with total page 800 pages. Available in PDF, EPUB and Kindle. Book excerpt: Author index.
Download or read book Advanced Photon and Particle Techniques for the Characterization of Defects in Solids Volume 41 written by J. B. Roberto and published by . This book was released on 1985-05-15 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Download or read book Ion Implantation Technology 94 written by S. Coffa and published by Newnes. This book was released on 1995-05-16 with total page 1031 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.
Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1976 with total page 1292 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Dose Rate Effects on Damage Formation in Ion implanted Gallium Arsenide written by and published by . This book was released on 1990 with total page 14 pages. Available in PDF, EPUB and Kindle. Book excerpt: The residual damage in GaAs was measured by ion channeling following implantation of either 100 keV 3°Si at temperatures of 300K or 77K, or 360 keV 12°Sn at 300K. For room-temperature Si implants and fluences between 1 and 10 × 1014 Si/cm2, the amount of damage created was strongly dependent upon the ion current density, which was varied between 0.05 and 12 [mu]A/cm2. Two different stages of damage growth were identified by an abrupt increase in the damage growth rate as a function of fluence, and the threshold fluence for the onset of the second stage was found to be dependent on the dose rate. The dose rate effect on damage was substantially weaker for 12°Sn+ implants and was negligible for Si implants at 77K. The damage was found to be most sensitive to the average current density, demonstrating that the defects which are the precursors to the residual dose-rate dependent damage have active lifetimes of at least 3 × 10−4 s. The dose rate effect and its variation with ion mass and temperature are discussed in the context of homogeneous nucleation and growth of damage during ion irradiation.
Download or read book Ion Beam Processing of Advanced Electronic Materials Volume 147 written by N. W. Cheung and published by Mrs Proceedings. This book was released on 1989 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Papers presented at the Symposium on Ion Beam Processing of Advanced Electronic Materials.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1972 with total page 628 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Laser Induced Damage in Optical Materials written by and published by . This book was released on 1984 with total page 522 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chaos and Stability in Defect Processes in Semiconductors written by Igor V. Verner and published by . This book was released on 1993 with total page 224 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book introduces a new scientific ideology for known phenomena, and the authors show how some results of radiation physics of semiconductors, for example processes of disordering and amorphization, can be considered from a synergetics point of view, and how one can apply these concepts and mathematical tools to derive completely new insights.
Download or read book Ion Irradiation Induced Damage in Nuclear Materials written by Diana Bachiller Perea and published by Springer. This book was released on 2018-09-26 with total page 191 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis investigates the behavior of two candidate materials (a-SiO2 and MgO) for applications in fusion (e.g., the International Thermonuclear Experimental Reactor ITER) and Generation IV fission reactors. Both parts of the thesis – the development of the ionoluminescence technique and the study of the ion-irradiation effects on both materials – are highly relevant for the fields of the ion-beam analysis techniques and irradiation damage in materials. The research presented determines the microstructural changes at different length scales in these materials under ion irradiation. In particular, it studies the effect of the irradiation temperature using several advanced characterization techniques. It also provides much-needed insights into the use of these materials at elevated temperatures. Further, it discusses the development of the ion-beam-induced luminescence technique in different research facilities around the globe, a powerful in situ spectroscopic characterization method that until now was little known. Thanks to its relevance, rigorosity and quality, this thesis has received twoprestigious awards in Spain and France.
Download or read book Low Energy Ion Irradiation of Materials written by Bernd Rauschenbach and published by Springer Nature. This book was released on 2022-08-19 with total page 763 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive introduction to all aspects of low-energy ion–solid interaction from basic principles to advanced applications in materials science. It features a balanced and insightful approach to the fundamentals of the low-energy ion–solid surface interaction, focusing on relevant topics such as interaction potentials, kinetics of binary collisions, ion range, radiation damages, and sputtering. Additionally, the book incorporates key updates reflecting the latest relevant results of modern research on topics such as topography evolution and thin-film deposition under ion bombardment, ion beam figuring and smoothing, generation of nanostructures, and ion beam-controlled glancing angle deposition. Filling a gap of almost 20 years of relevant research activity, this book offers a wealth of information and up-to-date results for graduate students, academic researchers, and industrial scientists working in these areas.
Download or read book Multicomponent and Multilayered Thin Films for Advanced Microtechnologies Techniques Fundamentals and Devices written by O. Auciello and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 625 pages. Available in PDF, EPUB and Kindle. Book excerpt: The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.
