Download or read book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications written by John E.J. Schmitz and published by William Andrew. This book was released on 1992-12-31 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publisher description.

Download or read book Tungsten and Other Advanced Metals for VLSI ULSI Applications written by and published by . This book was released on 1990 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma enhanced Chemical Vapor Deposition of Tungsten Silicide written by Andris Edgar Petriceks and published by . This book was released on 1986 with total page 326 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Tungsten and Other Advanced Metals for ULSI Applications in 1990 Volume 6 written by Gregory C. Smith and published by Mrs Conference Proceedings. This book was released on 1991-03 with total page 422 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Download or read book Tungsten and Other Refractory Metals for VLSI Applications IV written by Robert S. Blewer and published by . This book was released on 1989 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Kinetics of Low Pressure Chemical Vapor Deposition of Tungsten Silicide written by Damodaran Srinivas and published by . This book was released on 1989 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.

Download or read book Chemical Vapour Deposition of Tungsten and Tungsten Silicide Layers for Applications in Novel Silicon Technology written by F.X Li and published by . This book was released on 2002 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Tungsten and Other Refractory Metals for VLSI Applications II Volume 2 written by Eliot K. Broadbent and published by . This book was released on 1987-12 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Download or read book A Study of the Low Pressure Chemical Vapor Deposition of Tungsten for Applications in Integrated Circuits written by Han-Cheng Wulu and published by . This book was released on 1989 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Tungsten and Other Refractory Metals for VLSI Applications written by R. S. Blewer and published by . This book was released on 1986 with total page 594 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Laser assisted chemical vapor deposition of tungsten written by Jan Paul van Maaren and published by . This book was released on 1990 with total page 101 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Selectivity and Kinetics During the Chemical Vapor Deposition of Tungsten by the Hydrogen Reduction and Silane Reduction of Tungsten Hexafluoride written by Nathan Desatnik and published by . This book was released on 1997 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book A Characterization of Tungsten and Tungsten Silicide for VLSI Circuit Applications written by Mohammad Ziyad Mahmoud Al-Shargatli and published by . This book was released on 1985 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Kinetics of Chemical Vapor Deposition of Tungsten written by H. CHEUNG and published by . This book was released on 1971 with total page 14 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Dopant Concentration Influence on Tunnel Formation in Chemically Vapor Deposited Tungsten on Silicon written by Lucia My Feng and published by . This book was released on 1991 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Selective Low Pressure Chemical Vapor Deposition of Tungsten on Silicon Implanted SiO2 S written by William A. Hennessy and published by . This book was released on 1987 with total page 110 pages. Available in PDF, EPUB and Kindle. Book excerpt: