Download or read book Chemical Vapor Deposition of Refractory Metals and Ceramics Volume 168 Materials Research Society Symposium Proceedings Held in Boston Massachusetts on 29 November 1 December 1989 written by Theodore M. Besmann and published by . This book was released on 1990 with total page 422 pages. Available in PDF, EPUB and Kindle. Book excerpt: Contents: Fundamentals/Modeling; Diagnostics; Process-Microstructure Relationships; Microstructure-Mechanical Property Relationships; Novel/Large-Scale Technologies; Metal-Organic Chemical Vapor Deposition. Keywords: Chemical vapor, Gas phase reactions, Thin alumina films, Tungsten films, Glass. (KR).

Download or read book Chemical Vapor Deposition of Refractory Metals and Ceramics Volume 168 written by Theodore M. Besmann and published by . This book was released on 1990-04-11 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Papers originally presented at the symposium on [title] held in Boston, November/December 1989. The contributions are organized into six sections, covering fundamentals/modeling, diagnostics, process- microstructure relationships, microstructure-mechanical property relationships, novel/large-scale technologies, and metal-organic chemical vapor deposition. Acidic paper. Annotation copyrighted by Book News, Inc., Portland, OR

Download or read book Chemical Vapor Deposition of Refractory Metals and Ceramics written by and published by . This book was released on 1989 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition of Refractory Metals and Ceramics 2 Materials Research Society Symposium Proceedings Held in Boston Massachusetts on December 4 6 1991 written by and published by . This book was released on 1993 with total page 375 pages. Available in PDF, EPUB and Kindle. Book excerpt: The production of thin or thin films of metals or ceramics by chemical vapor deposition has often been achieved by the use of halide gas precursors. In certain cases, this choice was made purely for reasons of simplicity: gas cylinder, gas species already used in another field, etc. Experience has subsequently shown, however, that this choice can give rise to significant changes in the nature and proportions of deposited phases. These are highly dependent upon: the value of the oxidiser: reducer ratio in the gas phase, the degree of metal oxidation in the halide considered, and possible competition between two reducing agents designed to reduce the halide. These factors, among others, strongly influence the thermochemistry of the deposition reaction. Their roles must therefore be clearly understood, interpreted and predicted by the thermochemical analysis. Based on examples relating to silicide, nitride and boride deposits, an attempt will be made to determine sensitive parameters and deduce selection criteria.

Download or read book Chemical Vapor Deposition of Refractory Metals and Ceramics III Volume 363 written by Bernard M. Gallois and published by Materials Research Society. This book was released on 1995-04-05 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), "smart" material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.

Download or read book Chemical Vapor Deposition of Refractory Metals and Ceramics II Volume 250 written by Theodore M. Besman and published by . This book was released on 1992-05-22 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

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Download or read book Chemical Vapor Deposition of Refractory Metals and Ceramics III Volume 363 written by Bernard M. Gallois and published by . This book was released on 1995-04-05 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), "smart" material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.

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Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt: