Download or read book Chemical Vapor Deposition of Heteroepitaxial Boron Phosphide Thin Films written by John Daniel Brasfield and published by . This book was released on 2013 with total page 229 pages. Available in PDF, EPUB and Kindle. Book excerpt: Boron monophosphide (BP) is a group III-V compound semiconductor with a wide band gap of 2.3 eV. Its unique electrical properties make it a promising material for use as a room temperature thermal neutron detector and thermoelectric device in high temperature and radiation fields. A thin film of BP enriched in the boron-10 isotope can yield 2.8MeV of energy, which in solid-state BP can yield ∼0.5 million electron-hole pairs that would be detectable with minimal amplification in a device. The high carrier concentration, wide band gap, inertness and refractory nature make it an attractive material for use in the extreme environments of nuclear reactors. The main drawback to BP is the difficulty in synthesizing high quality thin films. The majority of the previous work on BP was performed on Si substrates. The high lattice mismatch between Si and BP incorporates strain in the BP film which causes varying defects and charge traps to be introduced, adversely affecting electrical performance. It is the purpose of this work to identify the parameters necessary to deposit highly ordered zincblende boron phosphide (BP) thin films on 4° off-axis C-face 4H-SiC(0001) substrates by chemical vapor deposition. SiC only has a 4% lattice mismatch from BP, which could greatly reduce the inherent strain from heteroepitaxial growth. Ultra high purity diborane and phosphineare used as reactive precursors, with hydrogen as the carrier gas. Conditions necessary for high quality BP thin films will be explored. SEM, XRD, TEM and Raman spectroscopy are used to characterize the BP films and identify the temperature, phosphine to diborane flow rate ratios, SiC wafer termination and wafer surface preparation to elucidate optimum BP thin films for eventual device fabrication.

Download or read book Chemical vapour deposition of boron carbon thin films from organoboron precursors written by Maiwulidan (Mewlude) Yimamu (Imam) and published by Linköping University Electronic Press. This book was released on 2016-01-13 with total page 29 pages. Available in PDF, EPUB and Kindle. Book excerpt: Boron-carbon (BxC) thin films enriched in 10B are potential neutron converting layers for 10Bbased solid-state neutron detectors given the good neutron absorption cross-section of 10B atoms in the thin film. Chemical Vapour Deposition (CVD) of such films faces the challenge that the maximum temperature tolerated by the aluminium substrate is 660 °C and low temperature CVD routes for BxC films are thus needed. This thesis presents the use of two different organoboron precursors, triethylboron –B(C2H5)3 (TEB) and trimethylboron – B(CH3)3 (TMB) as single-source precursors for CVD of BxC thin films. The CVD behaviour of TEB in thermal CVD has been studied by both BxC thin film deposition and quantum chemical calculations of the gas phase chemistry at the corresponding CVD conditions. The calculations predict that the gas phase reactions are dominated by ?-hydride eliminations of C2H4 to yield BH3. In addition, a complementary bimolecular reaction path based on H2-assisted C2H6 elimination to BH3 is also present at lower temperatures in the presence of hydrogen molecules. A temperature window of 600 – 1000 °C for deposition of X-ray amorphous BxC films with 2.5 ? x ? 4.5 is identified showing good film density (2.40 – 2.65 g/cm3) which is close to the bulk density of crystalline B4C, 2.52 g/cm3 and high hardness (29 – 39 GPa). The impurity level of H is lowered to < 1 at. % within the temperature window. Plasma chemical vapour deposition has been studied using TMB as single-source precursor in Ar plasma for investigating BxC thin film deposition at lower temperature than allowed by thermal CVD and further understanding of thin film deposition process. The effect of plasma power, total pressure, TMB and Ar gas flow on film composition and morphology are investigated. The highest B/C ratio of 1.9 is obtained at highest plasma power of 2400 W and TMB flow of 7 sccm. The H content in the films seems constant at 15±5 at. %. The B-C bond is dominant in the films with small amount of C-C and B-O bonds, which are likely due to the formation of amorphous carbon and surface oxidation, respectively. The film density is determined as 2.16±0.01 g/cm3 and the internal compressive stresses are measured to be <400 MPa.

Download or read book Setup of Low Pressure Chemical Vapor Deposition of Boron Nitride Thin Films written by Hsiao C. Liu and published by . This book was released on 1991 with total page 36 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition written by Jong-Hee Park and published by ASM International. This book was released on 2001 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Study of Plasma Enhanced Chemical Vapor Deposition of Boron doped Hydrogenated Amorphous Silicon Thin Films and the Application to P channel Thin Film Transistor written by Helinda Nominanda and published by . This book was released on 2004 with total page 178 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Thin Films by Chemical Vapour Deposition written by C. E. Moroșanu and published by . This book was released on 1990 with total page 724 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition Polymerization written by Jeffrey B. Fortin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.

Download or read book Deposition of Boron Carbide Thin Films by Supersonic Plasma Jet Chemical Vapor Deposition written by Olivier Postel and published by . This book was released on 1998 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Low Pressure Chemical Vapor Deposition of Semiconducting Boron Carbide Thin Films on Silicon written by Thomas Gregory Wulz and published by . This book was released on 2014 with total page 61 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Selective Area Deposition of Boron Thin Films Using a Novel Chemical Vapor Deposition Technique with Boranes and Carboranes written by Frank Keith Perkins and published by . This book was released on 1992 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Deposition of Cubic Boron Nitride Thin Films by Supersonic D C Plasma enhanced Chemical Vapor Deposition written by Eric Runde and published by . This book was released on 2004 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition Doping and Characterization of Boron Phosphide written by Shyam Gopal Garg and published by . This book was released on 1981 with total page 322 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Low Pressure Chemical Vapor Deposition of Boron Nitride Thin Films from Triethylamine Borane Complex and Ammonia written by Narahari Ramanuja and published by . This book was released on 1998 with total page 178 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Conformal Chemical Vapor Deposition of Boron Carbide Thin Films written by Arun Haridas Choolakkal and published by . This book was released on 2023 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Synthesis of Thin Films in Boron carbon nitrogen Ternary System by Microwave Plasma Enhanced Chemical Vapor Deposition written by Ratandeep Kukreja and published by . This book was released on 2010 with total page 186 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition 1960 1980 written by Donald T. Hawkins and published by Springer. This book was released on 1981-11-30 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Hot Filament Activated Chemical Vapor Deposition of Nitride and Carbide Thin Films written by Sadanand Vinayak Deshpande and published by . This book was released on 1994 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: