Download or read book Characterization of Reactive Ion Etching of III V Compound Semiconductor Materials written by Ebrahim Andideh and published by . This book was released on 1990 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reactive ion etching (RIE) of III-V compound semiconductor materials such as InP, InGaAs, InAlAs, and InGaAsP in methane (CH$sb4$) gas mixtures has been investigated. Etch rates of 800, 400 and 600 A are obtained for InP, InGaAs, and InGaAsP, respectively. Optimum processes have been developed for reliable fabrication of uniform short period gratings with smooth etched surfaces and excellent stoichiometry in these compounds. Highly anisotropic structures with dimensions down to 300 A at a pitch of 600 A are demonstrated in InP. A selective RIE process for InGaAs on InAlAs in a CH$sb4$:H$sb2$ plasma has been developed and utilized to fabricate 0.26 $mu$m T-gate modulation doped field-effect transistors (MODFETs). The microwave measurements of reactive-ion-etched and wet-etched devices show identical performance. The RIE of GaAs and AlGaAs have been characterized in SiCl$sb4$ plasma chemistry. The optical, electrical and chemical properties of the etched materials have been investigated. The effects of different RIE parameters such as gas chemistry, RF power, and reactor pressure have been studied. The RIE of laser facets in the GaAs/AlGaAs/InGaAs material system and the growth on RIE-patterned GaAs substrates are reported. Selective RIE of GaAs on AlGaAs in SiCl$sb4$/SiF$sb4$ plasma is studied. A selectivity ratio of 350:1 has been obtained at low power. A small decrease in the saturation current of gateless MODFET structures has been observed after etching the GaAs cap layer and has been ascribed to low energy ion bombardment of the surface. This process is applied to the fabrication of 0.2 $mu$m T-gate pseudomorphic MODFETs. The dc and microwave performances of RIE and wet-etched devices are identical. For these short-gatelength devices, a threshold voltage standard deviation of only 30 mV is obtained for the reactive-ion-etched devices as compared to 230 mV for the wet-etched devices. This uniform distribution is essential to the realization of integrated circuits. Surface analysis methods, such as scanning electron microscopy (SEM), Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectroscopy (SIMS), and Fourier transform infra-red spectroscopy (FTIR), have been utilized extensively to determine the chemistry of etched surfaces. Raman spectroscopy, Hall carrier mobility measurement and photoluminescence spectroscopy indicate insignificant electrical damage to the materials under optimal RIE conditions. Results of the surface analysis have been used to delineate optimum processes for the fabrication of the above devices.
Download or read book Reactive Ion Etching of III V Compound Semiconductors written by Yuh-Jyh Feng and published by . This book was released on 1989 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Dry Etching for Microelectronics written by R.A. Powell and published by Elsevier. This book was released on 2012-12-02 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides the reader with more specialised information and references than found in a general review article. In addition, it presents a broad perspective which would otherwise have to be gained by reading a large number of individual research papers. An additional important and unique feature of this book is the inclusion of an extensive literature review of dry processing, compiled by search of computerized data bases. A subject index allows ready access to the key points raised in each of the chapters.
Download or read book Magnetron Enhanced Reactive Ion Etching of Group III Nitride Semiconductor Materials written by and published by . This book was released on 1996 with total page 19 pages. Available in PDF, EPUB and Kindle. Book excerpt: Magnetron enhanced reactive ion etch rates of GaN, AlN, and InN wide bandgap semiconductors were investigated as a function of cathode power, pressure, and flow rate in BCl3 plasmas. Etch rates were obtained which were significantly higher than previously reported for dry etching of these materials. Surface analysis of etched samples revealed the presence of boron and chlorine residues. Etching produced a gallium surface deficiency in GaN extending 10 nm below the surface, and a preferential loss of nitrogen in InN. Etch rates were determined for the ternary alloys In(0.25)Ga(0.75)N and In(0.75)Al(0.25)N as a function of the addition of H2, SF6, and Ar to BC13. In(0.25)Ga(0.75)N etch rates increased for additions up to 60% H2, 20% SF6 and 60% Ar concentrations in the gas mixtures, with higher additions producing a decrease in etch rates. For In(0.75)Al(0.25)N, etch rate increased slightly for Ar concentrations up to 40%, while H2 and SF6 additions reduced etch rates.
Download or read book GaN and Related Materials written by Stephen J. Pearton and published by CRC Press. This book was released on 2021-10-08 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents views on current developments in heat and mass transfer research related to the modern development of heat exchangers. Devotes special attention to the different modes of heat and mass transfer mechanisms in relation to the new development of heat exchangers design. Dedicates particular attention to the future needs and demands for further development in heat and mass transfer. GaN and related materials are attracting tremendous interest for their applications to high-density optical data storage, blue/green diode lasers and LEDs, high-temperature electronics for high-power microwave applications, electronics for aerospace and automobiles, and stable passivation films for semiconductors. In addition, there is great scientific interest in the nitrides, because they appear to form the first semiconductor system in which extended defects do not severely affect the optical properties of devices. This series provides a forum for the latest research in this rapidly-changing field, offering readers a basic understanding of new developments in recent research. Series volumes feature a balance between original theoretical and experimental research in basic physics, device physics, novel materials and quantum structures, processing, and systems.
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2005 with total page 860 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characterisation of Reactive Ion Etch Processes for Ternary III V Semiconductors written by Andrew Stuart Bunting and published by . This book was released on 1996 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Analytical Techniques for the Characterization of Compound Semiconductors written by G. Bastard and published by Elsevier. This book was released on 1991-07-26 with total page 554 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume is a collection of 96 papers presented at the above Conference. The scope of the work includes optical and electrical methods as well as techniques for structural and compositional characterization. The contributed papers report on topics such as X-ray diffraction, TEM, depth profiling, photoluminescence, Raman scattering and various electrical methods. Of particular interest are combinations of different techniques providing complementary information. The compound semiconductors reviewed belong mainly to the III-V and III-VI families. The papers in this volume will provide a useful reference on the implications of new technologies in the characterization of compound semiconductors.
Download or read book Microdevices Laboratory MDL written by and published by . This book was released on 1990 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Growth and Characterization of III V Compound Semiconductor Materials by Metalorganic Chemical Vapor Deposition and Laser Photochemical Vapor Deposition written by Pamela Kay York and published by . This book was released on 1990 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Advances in Materials Processing and Devices in III V Compound Semiconductors Volume 144 written by Devendra K. Sadana and published by Mrs Proceedings. This book was released on 1989-11-20 with total page 758 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Download or read book Materials for Optoelectronic Devices OEICs and Photonics written by H. Schlötterer and published by Elsevier. This book was released on 1991-10-08 with total page 542 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim of the contributions in this volume is to give a current overview on the basic properties and applications of semiconductor and nonlinear optical materials for optoelectronics and integrated optics. They provide a cross-linkage between different materials (III-V, II-VI, Si-Ge, glasses, etc.), various sample dimensions (from bulk crystals to quantum dots), and a range of techniques for growth (LPE to MOMBE) and for processing (from surface passivation to ion beams). Major growth techniques and materials are discussed, including the sophisticated technologies required to exploit the exciting properties of low dimensional semiconductors. These proceedings will prove an invaluable guide to the current state of optoelectronic and nonlinear optical materials development, as well as indicating trends and also future markets for optoelectronic devices.
Download or read book Compound Semiconductor Power Transistors and written by Electrochemical Society. Meeting and published by The Electrochemical Society. This book was released on 1998 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Waveguides written by María L. Calvo and published by CRC Press. This book was released on 2018-10-03 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt: Although the theory and principles of optical waveguides have been established for more than a century, the technologies have only been realized in recent decades. Optical Waveguides: From Theory to Applied Technologies combines the most relevant aspects of waveguide theory with the study of current detailed waveguiding technologies, in particular, photonic devices, telecommunication applications, and biomedical optics. With self-contained chapters written by well-known specialists, the book features both fundamentals and applications. The first three chapters examine the theoretical foundations and bases of planar optical waveguides as well as critical optical properties such as birefringence and nonlinear optical phenomena. The next several chapters focus on contemporary waveguiding technologies that include photonic devices and telecommunications. The book concludes with discussions on additional technological applications, including biomedical optical waveguides and the potential of neutron waveguides. As optical waveguides play an increasing part in modern technology, photonics will become to the 21st century what electronics were to the 20th century. Offering both novel insights for experienced professionals and introductory material for novices, this book facilitates a better understanding of the new information era—the photonics century.
Download or read book Characterization of Deep Reactive Ion Etching DRIE for Via Formation in Chip Stacking Application written by Isibhakhomen Umolu Abhulimen and published by . This book was released on 2008 with total page 334 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Etching of III V Semiconductors written by Peter H. L. Notten and published by Elsevier Science & Technology. This book was released on 1991 with total page 376 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Magnetic Materials Processes and Devices VII and Electrodeposition of Alloys written by S. Krongelb and published by . This book was released on 2003 with total page 736 pages. Available in PDF, EPUB and Kindle. Book excerpt:
