Download or read book Characterization of Extreme Ultraviolet Imaging Systems written by Edita Tejnil and published by . This book was released on 1997 with total page 500 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Extreme Ultraviolet Imaging and Resist Characterization Using Spatial Filtering Techniques written by Michael David Shumway and published by . This book was released on 2004 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characterization of an Expanded field Schwarzschild Objective for Extreme Ultraviolet Lithography written by and published by . This book was released on 1994 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt: The performance of a new 10x-reduction Schwarzschild system for projection imaging at 13.4 nm wavelength is reported. The optical design is optimized to achieve 0.1 [mu]m resolution over a 0.4 mm image field of view, an increase in area of a factor of 100 over previous designs. An off-set aperture, located on the convex primary, defines an unobscured 0.08 numerical aperture. The system is illuminated using extreme ultraviolet (EUV) radiation emitted from a laser plasma source and collected by an ellipsoidal condenser. A 450 turning mirror is used to relay the collected EUV radiation onto a near-normal reflecting mask. Multiple sets of primary and secondary elements were fabricated, matched and clocked to minimize the effects of small figure errors on imaging performance. Optical metrology indicates that the wave-front error within the subaperture used is within a factor of two of the design value. Images recorded in PMMA and ZEP 520 resists reveal good imaging fidelity over much of the 0.4 mm field with equal line/space gratings being resolved to 0.1 [mu]m.
Download or read book At wavelength Characterization of the Extreme Ultraviolet Engineering Test Stand Set 2 Optic written by and published by . This book was released on 2001 with total page 18 pages. Available in PDF, EPUB and Kindle. Book excerpt: At-wavelength interferometric characterization of a new 4x-reduction lithographic-quality extreme ultraviolet (EUV) optical system is described. This state-of-the-art projection optic was fabricated for installation in the EUV lithography Engineering Test Stand (ETS) and is referred to as the ETS Set-2 optic. EUV characterization of the Set-2 optic is performed using the EUV phase-shifting point diffraction interferometer (PS/PDI) installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. This is the same interferometer previously used for the at-wavelength characterization and alignment of the ETS Set-1 optic. In addition to the PS/PDI-based full-field wavefront characterization, we also present wavefront measurements performed with lateral shearing interferometry, the chromatic dependence of the wavefront error, and the system-level pupil-dependent spectral-bandpass characteristics of the optic; the latter two properties are only measurable using at-wavelength interferometry.
Download or read book Radiation characteristics of extreme UV and soft X ray sources written by Tobias Mey and published by Göttingen University Press. This book was released on 2015 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electromagnetic radiation in the extreme UV and soft x-ray spectral range is of steadily increasing importance in fundamental research and industrial applications. An optimum use of the available photons can only be achieved under condition of a comprehensive beam characterization. Following that goal, this work addresses the pathway of extreme UV and soft x-ray radiation from its generation, through the beam transport by the beamline to the probe position. Experimentally, those aspects are optimized at a laser-produced plasma source and at an arrangement for the generation of high-harmonics. Additionally, the coherence of laser beams is analyzed by measurements of the Wigner distribution function. This method is applied to the photon beam of the free-electron laser FLASH, resulting in the entire characterization of its propagation properties.
Download or read book Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems written by Maksym Tryus and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Extreme Ultraviolet Interferometry written by Kenneth Alan Goldberg and published by . This book was released on 1997 with total page 548 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characterization and Application of Extreme Ultraviolet Radiation Generated by Frequency Tripling in a Pulsed Jet Expansion written by Lynn Michiko Tashiro and published by . This book was released on 1989 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Extreme Ultraviolet Interferometry written by and published by . This book was released on 1997 with total page 288 pages. Available in PDF, EPUB and Kindle. Book excerpt: EUV lithography is a promising and viable candidate for circuit fabrication with 0.1-micron critical dimension and smaller. In order to achieve diffraction-limited performance, all-reflective multilayer-coated lithographic imaging systems operating near 13-nm wavelength and 0.1 NA have system wavefront tolerances of 0.27 nm, or 0.02 waves RMS. Owing to the highly-sensitive resonant reflective properties of multilayer mirrors and extraordinarily tight tolerances set forth for their fabrication, EUV optical systems require at-wavelength EUV interferometry for final alignment and qualification. This dissertation discusses the development and successful implementation of high-accuracy EUV interferometric techniques. Proof-of-principle experiments with a prototype EUV point-diffraction interferometer for the measurement of Fresnel zoneplate lenses first demonstrated sub-wavelength EUV interferometric capability. These experiments spurred the development of the superior phase-shifting point-diffraction interferometer (PS/PDI), which has been implemented for the testing of an all-reflective lithographic-quality EUV optical system. Both systems rely on pinhole diffraction to produce spherical reference wavefronts in a common-path geometry. Extensive experiments demonstrate EUV wavefront-measuring precision beyond 0.02 waves RMS. EUV imaging experiments provide verification of the high-accuracy of the point-diffraction principle, and demonstrate the utility of the measurements in successfully predicting imaging performance. Complementary to the experimental research, several areas of theoretical investigation related to the novel PS/PDI system are presented. First-principles electromagnetic field simulations of pinhole diffraction are conducted to ascertain the upper limits of measurement accuracy and to guide selection of the pinhole diameter. Investigations of the relative merits of different PS/PDI configurations accompany a general study of the most significant sources of systematic measurement errors. To overcome a variety of experimental difficulties, several new methods in interferogram analysis and phase-retrieval were developed: the Fourier-Transform Method of Phase-Shift Determination, which uses Fourier-domain analysis to improve the accuracy of phase-shifting interferometry; the Fourier-Transform Guided Unwrap Method, which was developed to overcome difficulties associated with a high density of mid-spatial-frequency blemishes and which uses a low-spatial-frequency approximation to the measured wavefront to guide the phase unwrapping in the presence of noise; and, finally, an expedient method of Gram-Schmidt orthogonalization which facilitates polynomial basis transformations in wave-front surface fitting procedures.
Download or read book Characterisation and Applications of Ultrashort Extreme Ultraviolet Pulses written by Johan Norin and published by . This book was released on 2002 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Principles of Materials Characterization and Metrology written by Kannan M. Krishnan and published by Oxford University Press. This book was released on 2021-05-07 with total page 550 pages. Available in PDF, EPUB and Kindle. Book excerpt: Characterization enables a microscopic understanding of the fundamental properties of materials (Science) to predict their macroscopic behaviour (Engineering). With this focus, Principles of Materials Characterization and Metrology presents a comprehensive discussion of the principles of materials characterization and metrology. Characterization techniques are introduced through elementary concepts of bonding, electronic structure of molecules and solids, and the arrangement of atoms in crystals. Then, the range of electrons, photons, ions, neutrons and scanning probes, used in characterization, including their generation and related beam-solid interactions that determine or limit their use, is presented. This is followed by ion-scattering methods, optics, optical diffraction, microscopy, and ellipsometry. Generalization of Fraunhofer diffraction to scattering by a three-dimensional arrangement of atoms in crystals leads to X-ray, electron, and neutron diffraction methods, both from surfaces and the bulk. Discussion of transmission and analytical electron microscopy, including recent developments, is followed by chapters on scanning electron microscopy and scanning probe microscopies. The book concludes with elaborate tables to provide a convenient and easily accessible way of summarizing the key points, features, and inter-relatedness of the different spectroscopy, diffraction, and imaging techniques presented throughout. Principles of Materials Characterization and Metrology uniquely combines a discussion of the physical principles and practical application of these characterization techniques to explain and illustrate the fundamental properties of a wide range of materials in a tool-based approach. Based on forty years of teaching and research, this book incorporates worked examples, to test the reader's knowledge with extensive questions and exercises.
Download or read book Research and Technology Program Digest written by United States. National Aeronautics and Space Administration and published by . This book was released on with total page 792 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Out of band Exposure Characterization with the SEMATECH Berkeley 0 3 NA Microfield Exposure Tool written by and published by . This book was released on 2009 with total page 11 pages. Available in PDF, EPUB and Kindle. Book excerpt: For the commercialization of extreme ultraviolet lithography (EUVL), discharge or laser produced, pulsed plasma light sources are being considered. These sources are known to emit into a broad range of wavelengths that are collectively referred to as the out-of-band (OOB) radiation by lithographers. Multilayer EUV optics reflect OOB radiation emitted by the EUV sources onto the wafer plane resulting in unwanted background exposure of the resist (flare) and reduced image contrast. The reflectivity of multilayer optics at the target wavelength of 13.5 nm is comparable to that of their reflectivity in the deep ultraviolet (DUV) and UV regions from 100-350 nm. The aromatic molecular backbones of many of the resists used for EUV are equally absorptive at specific DUV wavelengths as well. In order to study the effect of these wavelengths on imaging performance in a real system, we are in the process of integrating a DUV source into the SEMATECH Berkeley 0.3-NA Microfield Exposure Tool (MET). The MET plays an active role in advanced research in resist and mask development for EUVL and as such, we will utilize this system to systematically evaluate the imaging impact of DUV wavelengths in a EUV system. In this paper, we present the optical design for the new DUV component and the simulation-based imaging results predicting the potential impact of OOB based on known resist, mask, and multilayer conditions. It should be noted that because the projection optics work equally well as imaging optics at DUV wavelengths, the OOB radiation cannot be treated simply as uniform background or DC flare.
Download or read book Literature 1991 Part 2 written by Astronomisches Rechen-Institut and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 1592 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Astronomy and Astrophysics Abstracts" appearing twice a year has become oneof the fundamental publications in the fields of astronomy, astrophysics andneighbouring sciences. It is the most important English-language abstracting journal in the mentioned branches. The abstrats are classified under more than a hundred subject categories, thus permitting a quick survey of the whole extended material. The AAA is a valuable and important publication for all students and scientists working in the fields of astronomy and related sciences. As such it represents a necessary ingredient of any astronomical library all over the world.
Download or read book Research and Technology Objectives and Plans Summary RTOPS written by and published by . This book was released on 1993 with total page 208 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book NASA Technical Memorandum written by and published by . This book was released on 1963 with total page 242 pages. Available in PDF, EPUB and Kindle. Book excerpt:
