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Book Characteristics  Optimization  and Integrated Circuit Applications of Aluminum Gallium Nitride gallium Nitride High Electron Mobility Transistors

Download or read book Characteristics Optimization and Integrated Circuit Applications of Aluminum Gallium Nitride gallium Nitride High Electron Mobility Transistors written by Bruce McRae Green and published by . This book was released on 2001 with total page 406 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book GaN Transistors for Efficient Power Conversion

Download or read book GaN Transistors for Efficient Power Conversion written by Alex Lidow and published by John Wiley & Sons. This book was released on 2014-09-15 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Gallium nitride (GaN) is an emerging technology that promises to displace silicon MOSFETs in the next generation of power transistors. As silicon approaches its performance limits, GaN devices offer superior conductivity and switching characteristics, allowing designers to greatly reduce system power losses, size, weight, and cost. This timely second edition has been substantially expanded to keep students and practicing power conversion engineers ahead of the learning curve in GaN technology advancements. Acknowledging that GaN transistors are not one-to-one replacements for the current MOSFET technology, this book serves as a practical guide for understanding basic GaN transistor construction, characteristics, and applications. Included are discussions on the fundamental physics of these power semiconductors, layout and other circuit design considerations, as well as specific application examples demonstrating design techniques when employing GaN devices. With higher-frequency switching capabilities, GaN devices offer the chance to increase efficiency in existing applications such as DC–DC conversion, while opening possibilities for new applications including wireless power transfer and envelope tracking. This book is an essential learning tool and reference guide to enable power conversion engineers to design energy-efficient, smaller and more cost-effective products using GaN transistors. Key features: Written by leaders in the power semiconductor field and industry pioneers in GaN power transistor technology and applications. Contains useful discussions on device–circuit interactions, which are highly valuable since the new and high performance GaN power transistors require thoughtfully designed drive/control circuits in order to fully achieve their performance potential. Features practical guidance on formulating specific circuit designs when constructing power conversion systems using GaN transistors – see companion website for further details. A valuable learning resource for professional engineers and systems designers needing to fully understand new devices as well as electrical engineering students.

Book Analysis and Optimization of AlGaN GaN High Electron Mobility Transistors for Microwave Applications

Download or read book Analysis and Optimization of AlGaN GaN High Electron Mobility Transistors for Microwave Applications written by Michael Hosch and published by Cuvillier Verlag. This book was released on 2011-08-08 with total page 129 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis deals with the analysis and optimization of some of the most prominent non-ideal effects in AlGaN/GaN high electron mobility transistors used in microwave applications as well as the optimization of the RF gain. The effect of current collapse, the root cause of leakage currents as well as field-dependent self-heating effects have been investigated by eletrical characterization using well established techniques and have been analyzed using 2-dimensional physical device simulations. It will be shown that the origin of all effects is strongly related to the device surface and some are even competing effects making device optimization a challenge. However, a detailed localization of the regions affecting device performance will be given leading to a better understanding for fabrication process optimization. Finally, I simulation study is conducted giving suggestions for RF gain improvement based on very simple device layout variations.

Book Modeling Gallium nitride Based High Electron Mobility Transistors

Download or read book Modeling Gallium nitride Based High Electron Mobility Transistors written by Ujwal Radhakrishna and published by . This book was released on 2016 with total page 291 pages. Available in PDF, EPUB and Kindle. Book excerpt: Gallium-Nitride-based high electron mobility transistor (HEMTs) technology is increasingly finding space in high voltage (HV) and high frequency (HF) circuit application domains. The superior breakdown electric field, high electron mobility, and high temperature performance of GaN HEMTs are the key factors for its use as HV switches in converters and active components of RF-power amplifiers. Designing circuits in both application regimes requires accurate compact device models that are grounded in physics and can describe the non-linear terminal characteristics. Currently available compact models for HEMTs are empirical and hence are lacking in physical description of the device, which becomes a handicap in understanding key device-circuit interactions and in accurate estimation of device behavior in circuits. This thesis seeks to develop a physics-based compact model for GaN HEMTs from first principles which can be used as a design tool for technology optimization to identify device-performance bottlenecks on one hand and as a tool for circuit design to investigate the impact of behavioral nuances of the device on circuit performance, on the other. Part of this thesis consists of demonstrations of the capabilities of the model to accurately predict device characteristics such as terminal DC- and pulsed-currents, charges, small-signal S-parameters, large-signal switching characteristics, load-pull, source-pull and power-sweep, inter-modulation-distortion and noise-figure of both HV- and RF-devices. The thesis also aims to tie device-physics concepts of carrier transport and charge distribution in GaN HEMTs to circuit-design through circuit-level evaluation. In the HV-application regime benchmarking is conducted against switching characteristics of a GaN DC-DC converter to understand the impact of device capacitances, field plates, temperature and charge-trapping on switching slew rates. In the RF-application regime validation is done against the large-signal characteristics of GaN-power amplifiers to study the output-power, efficiency and compression characteristics as function of class-of-operation. Noise-figure of low-noise amplifiers is tested to estimate the contributions of device-level noise sources, and validation against switching frequency and phase-noise characteristics of voltage-controlled oscillators is done to evaluate the noise performance of GaN HEMT technology. Evaluation of model-accuracy in determining the conversion-efficiency of RF-converters and linearity metrics of saturated non-linear amplifiers is carried out. The key contribution of this work is to provide a tool in the form of a physics-based compact model to device-technology-engineers and circuit-designers, who can use it to evaluate the potential strengths and weaknesses of the emerging GaN technology.

Book Integrated Electronics on Aluminum Nitride

Download or read book Integrated Electronics on Aluminum Nitride written by Reet Chaudhuri and published by Springer Nature. This book was released on 2022-12-06 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis outlines the principles, device physics, and technological applications of electronics based on the ultra-wide bandgap semiconductor aluminum nitride. It discusses the basic principles of electrostatics and transport properties of polarization-induced two-dimensional electron and hole channels in semiconductor heterostructures based on aluminum nitride. It explains the discovery of high-density two-dimensional hole gases in undoped heterojunctions, and shows how these high conductivity n- and p-type channels are used for high performance nFETs and pFETs, along with wide bandgap RF, mm-wave, and CMOS applications. The thesis goes on to discuss how the several material advantages of aluminum nitride, such as its high thermal conductivity and piezoelectric coefficient, enable not just high performance of transistors, but also monolithic integration of passive elements such as high frequency filters, enabling a new form factor for integrated RF electronics.

Book Interface Study of High K Dielectric on Aluminium Gallium Nitride gallium Nitride Heterostructure

Download or read book Interface Study of High K Dielectric on Aluminium Gallium Nitride gallium Nitride Heterostructure written by Xiaoye Qin and published by . This book was released on 2014 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: AlGaN/GaN high electron mobility transistors are promising for high frequency and high power application due to their unique properties. The Al2 O3 and HfO2 are attractive materials which suppress the gate leakage current of AlGaN/GaN high electron mobility transistors. Since the interface quality of AlGaN and high k dielectrics are critical to the device performance, such as the threshold voltage and interface state density ( Dit ), it is therefore necessary to understand that the relationship between interface chemistry and device performance is fundamental for examining optimization strategies for device applications. Firstly, the impact of various chemical pretreatments on AlGaN surface is studied. Then the interfaces formed upon atomic layer deposition (ALD) of Al 2 O3 and HfO2 are investigated using in situ X-ray photoelectron spectroscopy (XPS). The impacts of ALD of Al2 O3 and HfO2 on native AlGaN are studied by capacitance voltage characterization. The XPS and device results uncover a high density of interface states. in situ N2 forming gas and O2 plasma pretreatments prior to ALD as optimization strategies are investigated using in situ XPS, LEED and C-V characterizations.

Book Two Dimensional Modeling of Aluminum Gallium Nitride Gallium Nitride High Electron Mobility Transistor

Download or read book Two Dimensional Modeling of Aluminum Gallium Nitride Gallium Nitride High Electron Mobility Transistor written by Kenneth L. Holmes and published by . This book was released on 2002-06-01 with total page 79 pages. Available in PDF, EPUB and Kindle. Book excerpt: Gallium Nitride (GaN) High Electron Mobility Transistors (HEMT's) are microwave power devices that have the performance characteristics to improve the capabilities of current and future Navy radar and communication systems. The Office of Naval Research (ONR) is funding research for the development of GaN- based microwave power amplifiers for use in future radar and communication systems. This thesis studies the effects of AIGaN/GaN HEMTs' polarization, piezoelectric (PZ) and spontaneous, properties utilizing the TM commercially available Silvaco Atlas software for modeling and simulation. The polarization properties are suspected to enhance the two-dimensional electron gas (2DEG) at the AIGaN/GaN interface.

Book Vertical Gallium Nitride PowerDevices  Fabrication and Characterisation

Download or read book Vertical Gallium Nitride PowerDevices Fabrication and Characterisation written by Rico Hentschel and published by BoD – Books on Demand. This book was released on 2021-01-03 with total page 156 pages. Available in PDF, EPUB and Kindle. Book excerpt: Efficient power conversion is essential to face the continuously increasing energy consumption of our society. GaN based vertical power field effect transistors provide excellent performance figures for power-conversion switches, due to their capability of handling high voltages and current densities with very low area consumption. This work focuses on a vertical trench gate metal oxide semiconductor field effect transistor (MOSFET) with conceptional advantages in a device fabrication preceded GaN epitaxy and enhancement mode characteristics. The functional layer stack comprises from the bottom an n+/n--drift/p-body/n+-source GaN layer sequence. Special attention is paid to the Mg doping of the p-GaN body layer, which is a complex topic by itself. Hydrogen passivation of magnesium plays an essential role, since only the active (hydrogen-free) Mg concentration determines the threshold voltage of the MOSFET and the blocking capability of the body diode. Fabrication specific challenges of the concept are related to the complex integration, formation of ohmic contacts to the functional layers, the specific implementation and processing scheme of the gate trench module and the lateral edge termination. The maximum electric field, which was achieved in the pn- junction of the body diode of the MOSFET is estimated to be around 2.1 MV/cm. From double-sweep transfer measurements with relatively small hysteresis, steep subthreshold slope and a threshold voltage of 3 - 4 V a reasonably good Al2O3/GaN interface quality is indicated. In the conductive state a channel mobility of around 80 - 100 cm2/Vs is estimated. This value is comparable to device with additional overgrowth of the channel. Further enhancement of the OFF-state and ON-state characteristics is expected for optimization of the device termination and the high-k/GaN interface of the vertical trench gate, respectively. From the obtained results and dependencies key figures of an area efficient and competitive device design with thick drift layer is extrapolated. Finally, an outlook is given and advancement possibilities as well as technological limits are discussed.

Book Properties  Processing and Applications of Gallium Nitride and Related Semiconductors

Download or read book Properties Processing and Applications of Gallium Nitride and Related Semiconductors written by James H. Edgar and published by Institution of Electrical Engineers. This book was released on 1999 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt: Based on its outstanding properties, including a wide energy band gap, high thermal conductivity, and high electron drift velocity, GaN is uniquely suited for many novel devices including solar-blind UV light detectors, high power microwave transistors, and cold cathode electron emitters. This excellent reference covers the basic physical and chemical properties, surveys existing processing technology, and presents summaries of the current state-of-the-art of devices.

Book Ohmic Metallizations to Aluminum Gallium Nitride gallium Nitride High Electron Mobility Transistors  Electrical and Microstructural Studies

Download or read book Ohmic Metallizations to Aluminum Gallium Nitride gallium Nitride High Electron Mobility Transistors Electrical and Microstructural Studies written by and published by . This book was released on 2008 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Gallium Nitride Processing for Electronics  Sensors and Spintronics

Download or read book Gallium Nitride Processing for Electronics Sensors and Spintronics written by Stephen J. Pearton and published by Springer Science & Business Media. This book was released on 2006-07-06 with total page 383 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor spintronics is expected to lead to a new generation of transistors, lasers and integrated magnetic sensors that can be used to create ultra-low power, high speed memory, logic and photonic devices. Useful spintronic devices will need materials with practical magnetic ordering temperatures and current research points to gallium and aluminium nitride magnetic superconductors as having great potential. This book details current research into the properties of III-nitride semiconductors and their usefulness in novel devices such as spin-polarized light emitters, spin field effect transistors, integrated sensors and high temperature electronics. Written by three leading researchers in nitride semiconductors, the book provides an excellent introduction to gallium nitride technology and will be of interest to all reseachers and industrial practitioners wishing to keep up to date with developments that may lead to the next generation of transistors, lasers and integrated magnetic sensors.

Book Gallium Nitride Based HEMT Devices Modeling and Performance Characterization

Download or read book Gallium Nitride Based HEMT Devices Modeling and Performance Characterization written by and published by . This book was released on 2008 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Gallium Nitride High Mobility Electron Transistors for Power Amplification Applications

Download or read book Gallium Nitride High Mobility Electron Transistors for Power Amplification Applications written by Oliver Peter Amnuayphol and published by . This book was released on 2019 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: With increasing demand for high power density switching devices and a more advanced cellular network, i.e. 5G, on the impending horizon, wide-bandgap semiconductors are quickly becoming the de facto semiconductor device type to serve this need, of which the Gallium Nitride (GaN) High Electron Mobility Transistor (HEMT) device in particular has seen increasing demand due to its unique combination of favorable compound material characteristics and highly efficient operation. In this project, GaN HEMT devices are designed, fabricated, and characterized, and a 12-element, empirical equivalent circuit for GaN HEMTs is modeled. For modeling, published intrinsic and extrinsic characteristics of a selected device were analyzed and used as a template for creating a Symbolically Defined Device (SSD) model in Keysight’s Advanced Design System (ADS) software. This model was then used to obtain a key device characterization parameter, namely current-voltage (I-V) curves, through a curve-fitting process utilizing analytical equations. The AlGaN/GaN HEMT device design and fabrication process flow is discussed, after which the device is characterized and analyzed with regards to the impact of nitride stress liners on AlGaN/GaN HEMT device performance.

Book Physics Based Virtual Source Compact Model of Gallium nitride High Electron Mobility Transistors

Download or read book Physics Based Virtual Source Compact Model of Gallium nitride High Electron Mobility Transistors written by Hao Zhang and published by . This book was released on 2017 with total page 77 pages. Available in PDF, EPUB and Kindle. Book excerpt: Gallium Nitride (GaN) based high electron mobility transistors (HEMTs) outperform Gallium Arsenide (GaAs) and silicon based transistors for radio frequency (RF) applications in terms of output power and efficiency due to its large bandgap (~3.4 eV@300 K) and high carrier mobility property (1500 - 2300 cm^2/(V-s)). These advantages have made GaN technology a promising candidate for future high-power microwave and potential millimeter-wave applications. Current GaN HEMT models used by the industry, such as Angelov Model, EEHEMT Model and DynaFET (Dynamic FET) model, are empirical or semi-empirical. Lacking the physical description of the device operations, these empirical models are not directly scalable. Circuit design that uses the models requires multiple iterations between the device and circuit levels, becoming a lengthy and expensive process. Conversely existing physics based models, such as surface potential model, are computationally intensive and thus impractical for full scale circuit simulation and optimization. To enable efficient GaN-based RF circuit design, computationally efficient physics based compact models are required. In this thesis, a physics based Virtual Source (VS) compact model is developed for GaN HEMTs targeting RF applications. While the intrinsic current and charge model are developed based on the Virtual Source model originally proposed by MIT researchers, the gate current model and parasitic element network are proposed based on our applications with a new efficient parameter extraction flow. Both direct current (DC) of drain and gate currents and RF measurements are conducted for model parameter extractions. The new flow first extracts device parasitic resistive values based on the DC measurement of gate current. Then parameters related with the intrinsic region are determined based on the transport characteristics in the subthreshold and above threshold regimes. Finally, the parasitic resistance, capacitance and inductance values are optimized based on the S-parameter measurement. This new extraction flow provides reliable and accurate extraction for parasitic element values while achieving reasonable resolutions holistically with both DC and RF characteristics. The model is validated against measurement data in terms of drain current, gate current and scattering parameter (S-parameter). This model provides simple yet clear physical description for GaN HEMTs with only a short list of model parameters compared with other empirical or physics based models. It can be easily integrated in circuit simulators for RF circuit design.

Book Undoped Aluminum Gallium Nitride gallium Nitride Based Heterostructure High Electron Mobility Transistors for Microwave Applications

Download or read book Undoped Aluminum Gallium Nitride gallium Nitride Based Heterostructure High Electron Mobility Transistors for Microwave Applications written by Yunju Sun and published by . This book was released on 2006 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: