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Book Beam Solid Interactions for Materials Synthesis and Characterization  Volume 354

Download or read book Beam Solid Interactions for Materials Synthesis and Characterization Volume 354 written by Dale C. Jacobson and published by . This book was released on 1995-11-20 with total page 776 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of the title symposium, held at the 1994 MRS Fall Meeting in Boston, 28 November-2 December 1994. Selected papers that were presented in both oral and poster sessions are divided into six topical groups: ion beam processing; defects and diffusion; ion-beam modification of polymers; analysis and characterization; sputtering; and laser-assisted and induced processes. Annotation copyright by Book News, Inc., Portland, OR

Book Ion Solid Interactions for Materials Modification and Processing  Volume 396

Download or read book Ion Solid Interactions for Materials Modification and Processing Volume 396 written by D. B. Poker and published by . This book was released on 1996-05-23 with total page 940 pages. Available in PDF, EPUB and Kindle. Book excerpt: Several beam-solid interaction techniques have been developed that can either stand alone or be used in connection with others for materials processing, for fabrication of devices with enhanced electro-optical and mechanical properties, and with enhanced resistance to corrosion and erosion. For example, advances in focused ion beams (FIB) have brought out-of-reach ideas and applications to fruition. This book from MRS focuses on the developments in ion-beam-assisted processing of materials and reviews successful applications of the techniques. Topics include: fundamentals of ion-solid interactions; ion-beam mixing; radiation damage; insulators and wide bandgap materials; polymers; optical materials; plasma and ion-assisted techniques; metals and tribology; focused ion beams; fundamental semiconductor processing and compound semiconductors.

Book Laser Induced Damage in Optical Materials

Download or read book Laser Induced Damage in Optical Materials written by and published by . This book was released on 1995 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Laser Ablation and Desorption

Download or read book Laser Ablation and Desorption written by and published by Academic Press. This book was released on 1997-12-10 with total page 671 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume introduces the subject of laser ablation and desorption to scientists and engineers. It covers fundamental experimental and theoretical tools, models, and techniques, and introduces the most important applications. Clearly written and organized in a straightforward manner, Laser Ablation and Desorption lead the reader straight through the fundamentals of laser-surface interactions. Each chapter is self-contained and includes references to other chapters as necessary, so that readers may begin with the topic of greatest interest and follow the references to other aspects of the subject contained within the book.Key Features* Provides up-to-date information about one of the most active fields in physics today* Written and edited by major figures in the field of laser ablation and desorption* Represents the most comprehensive treatment of the state-of-the-art available

Book Ion Beam Processing of Materials and Deposition Processes of Protective Coatings

Download or read book Ion Beam Processing of Materials and Deposition Processes of Protective Coatings written by P.L.F. Hemment and published by Newnes. This book was released on 2012-12-02 with total page 630 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.

Book Scientific Basis for Nuclear Waste Management XVIII

Download or read book Scientific Basis for Nuclear Waste Management XVIII written by Takashi Murakami and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Dynamics in Small Confining Systems

Download or read book Dynamics in Small Confining Systems written by and published by . This book was released on 1994 with total page 492 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Ionized Physical Vapor Deposition

Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes

Book In Situ Process Diagnostics and Intelligent Materials Processing  Volume 502

Download or read book In Situ Process Diagnostics and Intelligent Materials Processing Volume 502 written by Peter A. Rosenthal and published by Mrs Proceedings. This book was released on 1998-07-17 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: Focuses on the rapidly developing field of sensor technology for process monitoring and control during the fabrication of advanced materials and structures. Of high interest among the 39 papers are sensor-driven, closed-loop control of the fabrication process and product-state monitoring. Among the processes considered are several forms of vapor deposition, molecular beam epitaxy, rapid thermal processing, reactive-ion and plasma etching, electron beam evaporation, and sputtering. Monitoring variable such as temperature, composition, and thickness are described for a range of materials including electronic and optical thin-films, particles, and nanostructures. Annotation copyrighted by Book News, Inc., Portland, OR

Book Silicon Germanium Strained Layers and Heterostructures

Download or read book Silicon Germanium Strained Layers and Heterostructures written by M. Willander and published by Elsevier. This book was released on 2003-10-02 with total page 325 pages. Available in PDF, EPUB and Kindle. Book excerpt: The study of Silicone Germanium strained layers has broad implications for material scientists and engineers, in particular those working on the design and modelling of semi-conductor devices. Since the publication of the original volume in 1994, there has been a steady flow of new ideas, new understanding, new Silicon-Germanium (SiGe) structures and new devices with enhanced performance. Written for both students and senior researchers, the 2nd edition of Silicon-Germanium Strained Layers and Heterostructures provides an essential up-date of this important topic, describing in particular the recent developments in technology and modelling.* Fully-revised and updated 2nd edition incorporating important recent breakthroughs and a complete literature review* The extensive bibliography of over 400 papers provides a comprehensive and coherent overview of the subject* Appropriate for students and senior researchers

Book Solid State Ionics IV  Volume 369

Download or read book Solid State Ionics IV Volume 369 written by Gholam-Abbas Nazri and published by Mrs Proceedings. This book was released on 1995-07-05 with total page 748 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition

Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Science and Technology of Fullerene Materials  Volume 359

Download or read book Science and Technology of Fullerene Materials Volume 359 written by Patrick Bernier and published by . This book was released on 1995-04-05 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Book Separation by Plasma Implantation of Oxygen with Plasma Immersion Ion Implantation to Form Silicon on Insulator

Download or read book Separation by Plasma Implantation of Oxygen with Plasma Immersion Ion Implantation to Form Silicon on Insulator written by S. Sundar Kumar Iyer and published by . This book was released on 1998 with total page 252 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Synthesis and Properties of Advanced Catalytic Materials

Download or read book Synthesis and Properties of Advanced Catalytic Materials written by Enrique Iglesia and published by . This book was released on 1995 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Strained Layer Epitaxy  Volume 379

Download or read book Strained Layer Epitaxy Volume 379 written by Eugene Fitzgerald and published by . This book was released on 1995-11-09 with total page 552 pages. Available in PDF, EPUB and Kindle. Book excerpt: An interdisciplinary discussion of key materials issues and controversies in strained layer epitaxy is presented in this new volume from MRS. Research involving GeSi alloys and Si:C alloys are well represented. In the case of GeSi alloys, utilizing both strained and relaxed structures appears to be a strong component of the current research. Applications, devices and synthesis of improved relaxed and strained materials are featured. Special efforts to integrate the III-V and IV communities were also made during this symposium, and those efforts are reflected in the proceedings volume as well. Results on compositional graded layers in both the GeSi and III-V materials systems are presented. Topics include: general issues; ordering/low dimensional structures; characterization; device applications; growth of Si-based materials; and growth of compound semiconductors.