Download or read book Beam Processing Technologies written by Norman G. Einspruch and published by Academic Press. This book was released on 2014-12-01 with total page 559 pages. Available in PDF, EPUB and Kindle. Book excerpt: Beam Processing Technologies is a collection of papers that deals with the miniaturization of devices that will be faster, consume less power, and cost less per operation or fabrication. One paper discusses metal oxide semiconductor (MOS) integrated circuit technology including the operation of devices whose lateral and vertical dimensions are scaled down. If the devices' silicon doping profiles are increased by the same scale factor, they can operate on lower voltages and currents, with the same performance. Another paper describes laser beam processing and wafer-scale integration as techniques to increase the number of devices on a silicon chip. Electron beam technologies can be used in many fabrication processes such as in microlithography, selective oxidation, doping, metrology. Ion beam applications depend on the presence of the ion introduced into the device (e.g. implantation doping), on pseudoelastic collisions (e.g. physical sputtering or crystal damage), and on inelastic scattering (e.g. polymer resist exposure). Silicon molecular beam epitaxy (SiMBE) can also grow high-quality layers at low temperature, particularly concerning germanium, especially as reagrds the growth system design and utilization of n- and p-type doping. Chemical beam epitaxy (CBE) is another epitaxial growth technique that can surpass MBE and metal organic chemical vapor deposition (MO-CVD). The collection is suitable chemical engineers, industrial physicists, and researchers whose work involve micro-fabrication and development of integrated circuits.
Download or read book Beam Technologies for Integrated Processing written by National Research Council and published by National Academies Press. This book was released on 1992-02-01 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt: Beam technologies play an important role in microelectronic component fabrication and offer opportunities for application in other manufacturing schemes. Emerging beam technologies that incorporate potential for sensors, control, and information processing have created new opportunities for integrated processing of materials and components. This volume identifies various beam technologies and their applications in electronics and other potential manufacturing processes. Recommendations for research and development to enhance the understanding, capabilities, and applications of beam technologies are presented.
Download or read book Electron Beam Pasteurization and Complementary Food Processing Technologies written by Suresh Pillai and published by Elsevier. This book was released on 2014-11-28 with total page 355 pages. Available in PDF, EPUB and Kindle. Book excerpt: Food safety is a constant challenge for the food industry, and food irradiation technology has developed significantly since its introduction, moving from isotope irradiation to the use of electron beam technology. Electron Beam Pasteurization and Complementary Food Processing Technologies explores the application of electron beam pasteurization in conjunction with other food processing technologies to improve the safety and quality of food. Part one provides an overview of the issues surrounding electron beam pasteurization in food processing. Part two looks at different thermal and non-thermal food processing technologies that complement irradiation. Finally, a case study section on the commercial applications of e-beam processing provides examples from industry.
Download or read book VLSI Electronics Beam processing technologies written by Norman G. Einspruch and published by . This book was released on 1981 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book VLSI Electronics Beam processing technologies written by Norman G. Einspruch and published by . This book was released on 1981 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Beam Processing of Materials and Deposition Processes of Protective Coatings written by P.L.F. Hemment and published by Newnes. This book was released on 2012-12-02 with total page 630 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation. Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.
Download or read book Ion Implantation and Beam Processing written by J. S. Williams and published by Academic Press. This book was released on 2014-06-28 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.
Download or read book Ion Beam Technology and Applications written by Ozan Artun and published by BoD – Books on Demand. This book was released on 2023-11-22 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt: The scientific and commercial purposes of ion beams are remarkable in many fields because ion beam technology is a primary tool that provides a wide range of applications in science, medicine, space, and engineering. This book presents theoretical and experimental knowledge about ion beam applications and technology. It includes six chapters that address such topics as the interaction of ion beams with matter, the evaluation of nuclear material damage, surface microstructure changes, oblique Ar+ sputtered SiC thin films, electron beam processing, and ribbon ion beams.
Download or read book Electron Beam Wire Deposition Technology and Its Application written by Shuili Gong and published by Springer Nature. This book was released on 2022-05-16 with total page 346 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a systematic and comprehensive introduction to the technical principles, materials, processes, and equipment of the electron beam wire deposition technology (EBWD), while focusing on the research results of the author’s scientific research team engaged in this technology in China. It mainly introduces the conceptual connotation, principle, and characteristics of the EBWD technology, its position and function in the additive manufacturing technology system, the direction and trend of technological development at home and abroad, the fundamentals and application results of the EBWD technology, including technical principles, equipment technology, special materials, manufacturing technology, quality testing, and application practices. So this book can serve as a reference book for teachers, students, and scientific researchers in scientific research institutions who are engaged in relevant studies.
Download or read book Electron Beam Technology in Microelectronic Fabrication written by George Brewer and published by Elsevier. This book was released on 2012-12-02 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.
Download or read book Beam Technologies for Integrated Processing written by and published by . This book was released on 1992 with total page 100 pages. Available in PDF, EPUB and Kindle. Book excerpt: Beam technologies offer opportunities for application in many manufacturing schemes. Various beam technologies are reviewed, and applications to electronics and engineered materials are identified. Examples of existing manufacturing processes are described. Recommendations for R and D efforts are developed for enhancing the understanding of the operation and capabilities of beam technologies and their applications.
Download or read book Laser and Electron Beam Processing of Materials written by C.W. White and published by Elsevier. This book was released on 2012-12-02 with total page 788 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser and Electron Beam Processing of Materials contains the papers presented at the symposium on "Laser and Electron Beam Processing of Materials," held in Cambridge, Massachusetts, in November 1979, sponsored by the Materials Research Society. The compilation presents reports and research papers on the use of directed energy sources, such as lasers and electron beams for materials processing. The majority of the materials presented emphasize results on semiconductor materials research. Substantial findings on research on metals, alloys, and other materials are presented as well. Topics covered by the papers include the use of scanned cw sources (both photons and electrons) to recrystallize amorphous layers, enhanced substitutional solubility, solute trapping, zone refining of impurities, and constitutional supercooling. The use of lasers and electron beams to anneal ion implant damage and contacts formation, processing of ion-implanted metals, and surface alloying of films deposited on metallic surfaces are also discussed. Metallurgists, engineers, and materials scientists will find the book very insightful.
Download or read book Influence of Particle Beam Irradiation on the Structure and Properties of Graphene written by Xin Wu and published by Springer. This book was released on 2017-10-26 with total page 182 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis focuses on the nanomanufacturing of graphene—a newly discovered, two-dimensional material with extraordinary properties—in order to realize its numerous potential applications. Combining experimental implementation with theoretical modelling, it investigates three classes of graphene nanostructure fabrication using particle beam irradiation: (i) doping of graphene using low energy nitrogen irradiation; (ii) joining of graphene sheets with laser and C, N, and Ar ion beam irradiation; and (iii) fabrication of graphene nanopores by means of focused ion beam and electron beam irradiation. The feasibility of the nanomanufacture of graphene using particle beam irradiation is demonstrated by various experimental methods, and the mechanisms involved under different types of beam irradiation are revealed using theoretical calculations. Further, the book analyzes the mechanical and electrical properties of the fabricated graphene nanostructures by means of atomic simulations to predict the application potentials of the proposed methods. The findings help promote the implementation of graphene-structure applications in industry.
Download or read book Handbook of Ion Beam Processing Technology written by Jerome J. Cuomo and published by William Andrew. This book was released on 1989 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.
Download or read book Molecular Beam Epitaxy written by Robin F.C. Farrow and published by Elsevier. This book was released on 1995-12-31 with total page 795 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this volume, the editor and contributors describe the use of molecular beam epitaxy (MBE) for a range of key materials systems that are of interest for both technological and fundamental reasons. Prior books on MBE have provided an introduction to the basic concepts and techniques of MBE and emphasize growth and characterization of GaAs-based structures. The aim in this book is somewhat different; it is to demonstrate the versatility of the technique by showing how it can be utilized to prepare and explore a range of distinct and diverse materials. For each of these materials systems MBE has played a key role both in their development and application to devices.
Download or read book Ion Beams in Materials Processing and Analysis written by Bernd Schmidt and published by Springer Science & Business Media. This book was released on 2012-12-13 with total page 425 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
Download or read book Photon Beam and Plasma Assisted Processing written by E.F. Krimmel and published by Elsevier. This book was released on 1989-02-01 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt: This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.
