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Book Noble and Precious Metals

Download or read book Noble and Precious Metals written by Mohindar Seehra and published by BoD – Books on Demand. This book was released on 2018-07-04 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: The use of copper, silver, gold and platinum in jewelry as a measure of wealth is well known. This book contains 19 chapters written by international authors on other uses and applications of noble and precious metals (copper, silver, gold, platinum, palladium, iridium, osmium, rhodium, ruthenium, and rhenium). The topics covered include surface-enhanced Raman scattering, quantum dots, synthesis and properties of nanostructures, and its applications in the diverse fields such as high-tech engineering, nanotechnology, catalysis, and biomedical applications. The basis for these applications is their high-free electron concentrations combined with high-temperature stability and corrosion resistance and methods developed for synthesizing nanostructures. Recent developments in all these areas with up-to-date references are emphasized.

Book MEMS Materials and Processes Handbook

Download or read book MEMS Materials and Processes Handbook written by Reza Ghodssi and published by Springer Science & Business Media. This book was released on 2011-03-18 with total page 1211 pages. Available in PDF, EPUB and Kindle. Book excerpt: MEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs.

Book Copper Interconnect Technology

Download or read book Copper Interconnect Technology written by Tapan Gupta and published by Springer Science & Business Media. This book was released on 2010-01-22 with total page 433 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since overall circuit performance has depended primarily on transistor properties, previous efforts to enhance circuit and system speed were focused on transistors as well. During the last decade, however, the parasitic resistance, capacitance, and inductance associated with interconnections began to influence circuit performance and will be the primary factors in the evolution of nanoscale ULSI technology. Because metallic conductivity and resistance to electromigration of bulk copper (Cu) are better than aluminum, use of copper and low-k materials is now prevalent in the international microelectronics industry. As the feature size of the Cu-lines forming interconnects is scaled, resistivity of the lines increases. At the same time electromigration and stress-induced voids due to increased current density become significant reliability issues. Although copper/low-k technology has become fairly mature, there is no single book available on the promise and challenges of these next-generation technologies. In this book, a leader in the field describes advanced laser systems with lower radiation wavelengths, photolithography materials, and mathematical modeling approaches to address the challenges of Cu-interconnect technology.

Book Ultra thin Chip Technology and Applications

Download or read book Ultra thin Chip Technology and Applications written by Joachim Burghartz and published by Springer Science & Business Media. This book was released on 2010-11-18 with total page 471 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ultra-thin chips are the "smart skin" of a conventional silicon chip. This book shows how very thin and flexible chips can be fabricated and used in many new applications in microelectronics, Microsystems, biomedical and other fields. It provides a comprehensive reference to the fabrication technology, post processing, characterization and the applications of ultra-thin chips.

Book Electrochemical Nanotechnologies

Download or read book Electrochemical Nanotechnologies written by Tetsuya Osaka and published by Springer Science & Business Media. This book was released on 2009-12-15 with total page 283 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this book, the term "electrochemical nanotechnology" is defined as nanoprocessing by means of electrochemical techniques. This introductory book reviews the application of electrochemical nanotechnologies with the aim of understanding their wider applicability in evolving nanoindustries. These advances have impacted microelectronics, sensors, materials science, and corrosion science, generating new fields of research that promote interaction between biology, medicine, and microelectronics. This volume reviews nanotechnology applications in selected high technology areas with particular emphasis on advances in such areas. Chapters are classified under four different headings: Nanotechnology for energy devices - Nanotechnology for magnetic storage devices - Nanotechnology for bio-chip applications - Nanotechnology for MEMS/Packaging.

Book Handbook of Semiconductor Manufacturing Technology

Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2017-12-19 with total page 3276 pages. Available in PDF, EPUB and Kindle. Book excerpt: Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Book Advanced Nanoscale ULSI Interconnects  Fundamentals and Applications

Download or read book Advanced Nanoscale ULSI Interconnects Fundamentals and Applications written by Yosi Shacham-Diamand and published by Springer Science & Business Media. This book was released on 2009-09-19 with total page 545 pages. Available in PDF, EPUB and Kindle. Book excerpt: In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application. In- grated circuit technology is the base for all modern electronics systems. You can ?nd electronics systems today everywhere: from toys and home appliances to a- planes and space shuttles. Electronics systems form the hardware that together with software are the bases of the modern information society. The rapid growth and vast exploitation of modern electronics system create a strong demand for new and improved electronic circuits as demonstrated by the amazing progress in the ?eld of ULSI technology. This progress is well described by the famous “Moore’s law” which states, in its most general form, that all the metrics that describe integrated circuit performance (e. g. , speed, number of devices, chip area) improve expon- tially as a function of time. For example, the number of components per chip d- bles every 18 months and the critical dimension on a chip has shrunk by 50% every 2 years on average in the last 30 years. This rapid growth in integrated circuits te- nology results in highly complex integrated circuits with an increasing number of interconnects on chips and between the chip and its package. The complexity of the interconnect network on chips involves an increasing number of metal lines per interconnect level, more interconnect levels, and at the same time a reduction in the interconnect line critical dimensions.

Book Advanced Interconnects for ULSI Technology

Download or read book Advanced Interconnects for ULSI Technology written by Mikhail Baklanov and published by John Wiley & Sons. This book was released on 2012-02-17 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirements Low-k materials: fundamentals, advances and mechanical properties Conductive layers and barriers Integration and reliability including mechanical reliability, electromigration and electrical breakdown New approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.

Book Metallization

    Book Details:
  • Author : S. P. Murarka
  • Publisher : Butterworth-Heinemann
  • Release : 1993
  • ISBN :
  • Pages : 268 pages

Download or read book Metallization written by S. P. Murarka and published by Butterworth-Heinemann. This book was released on 1993 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This title covers fundemental concepts, properties and applicabilities of metals and alloys for use in various metallization schemes. Metallizations form the key components on electronic circuits - controlling device properties and providing power and device interconnections with the outside world or with other devices. The recent advent of submicron dimensions and increasingly faster devices in the semiconductor have challenged researchers to keep metallization schemes in line with new demanding requirements.

Book Handbook of Silicon Based MEMS Materials and Technologies

Download or read book Handbook of Silicon Based MEMS Materials and Technologies written by Markku Tilli and published by Elsevier. This book was released on 2009-12-08 with total page 670 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive guide to MEMS materials, technologies and manufacturing, examining the state of the art with a particular emphasis on current and future applications. Key topics covered include: - Silicon as MEMS material - Material properties and measurement techniques - Analytical methods used in materials characterization - Modeling in MEMS - Measuring MEMS - Micromachining technologies in MEMS - Encapsulation of MEMS components - Emerging process technologies, including ALD and porous silicon Written by 73 world class MEMS contributors from around the globe, this volume covers materials selection as well as the most important process steps in bulk micromachining, fulfilling the needs of device design engineers and process or development engineers working in manufacturing processes. It also provides a comprehensive reference for the industrial R&D and academic communities. - Veikko Lindroos is Professor of Physical Metallurgy and Materials Science at Helsinki University of Technology, Finland. - Markku Tilli is Senior Vice President of Research at Okmetic, Vantaa, Finland. - Ari Lehto is Professor of Silicon Technology at Helsinki University of Technology, Finland. - Teruaki Motooka is Professor at the Department of Materials Science and Engineering, Kyushu University, Japan. - Provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques - Shows how to protect devices from the environment and decrease package size for dramatic reduction of packaging costs - Discusses properties, preparation, and growth of silicon crystals and wafers - Explains the many properties (mechanical, electrostatic, optical, etc), manufacturing, processing, measuring (incl. focused beam techniques), and multiscale modeling methods of MEMS structures

Book 3D Microelectronic Packaging

Download or read book 3D Microelectronic Packaging written by Yan Li and published by Springer. This book was released on 2016-10-29 with total page 560 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides a comprehensive reference for graduate students and professionals in both academia and industry on the fundamentals, processing details, and applications of 3D microelectronic packaging, an industry trend for future microelectronic packages. Chapters written by experts cover the most recent research results and industry progress in the following areas: TSV, die processing, micro bumps, direct bonding, thermal compression bonding, advanced materials, heat dissipation, thermal management, thermal mechanical modeling, quality, reliability, fault isolation, and failure analysis of 3D microelectronic packages. Numerous images, tables, and didactic schematics are included throughout. This essential volume equips readers with an in-depth understanding of all aspects of 3D packaging, including packaging architecture, processing, thermal mechanical and moisture related reliability concerns, common failures, developing areas, and future challenges, providing insights into key areas for future research and development.

Book National Semiconductor Metrology Program

Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1995 with total page 146 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Fuel Cells I

    Book Details:
  • Author : Günther G. Scherer
  • Publisher : Springer Science & Business Media
  • Release : 2008-09-11
  • ISBN : 3540697551
  • Pages : 279 pages

Download or read book Fuel Cells I written by Günther G. Scherer and published by Springer Science & Business Media. This book was released on 2008-09-11 with total page 279 pages. Available in PDF, EPUB and Kindle. Book excerpt: See table of contents

Book Atmospheric Corrosion

    Book Details:
  • Author : Christofer Leygraf
  • Publisher : John Wiley & Sons
  • Release : 2016-06-07
  • ISBN : 1118762347
  • Pages : 401 pages

Download or read book Atmospheric Corrosion written by Christofer Leygraf and published by John Wiley & Sons. This book was released on 2016-06-07 with total page 401 pages. Available in PDF, EPUB and Kindle. Book excerpt: ATMOSPHERIC CORROSION Presents a comprehensive look at atmospheric corrosion, combining expertise in corrosion science and atmospheric chemistry Atmospheric corrosion has been a subject of engineering study, largely empirical, for nearly a century. Scientists came to the field rather later on and had considerable difficulty bringing their arsenal of tools to bear on the problem. Atmospheric corrosion was traditionally studied by specialists in corrosion having little knowledge of atmospheric chemistry, history, or prospects. Atmospheric Corrosion provides a combined approach bringing together experimental corrosion and atmospheric chemistry. The second edition expands on this approach by including environmental aspects of corrosion, atmospheric corrosion modeling, and international corrosion exposure programs. The combination of specialties provides a more comprehensive coverage of the topic. These scientific insights into the corrosion process and its amelioration are the focus of this book. Key topics include the following: Basic principles of atmospheric corrosion chemistry Corrosion mechanisms in controlled and uncontrolled environments Degradation of materials in architectural, transport, and structural applications; electronic devices; and cultural artifacts Protection of existing materials and choosing new ones that resist corrosion Prediction of how and where atmospheric corrosion may evolve in the future Complete with appendices discussing experimental techniques, computer models, and the degradation of specific metals, Atmospheric Corrosion, Second Edition continues to be an invaluable resource for corrosion scientists, corrosion engineers, conservators, environmental scientists, and anyone interested in the theory and application of this evolving field. The book concerns primarily the atmospheric corrosion of metals and is written at a level suitable for advanced undergraduates or beginning graduate students in any of the physical or engineering sciences.

Book Electrochemical Nanotechnology

Download or read book Electrochemical Nanotechnology written by Wolfgang J. Lorenz and published by John Wiley & Sons. This book was released on 2008-07-11 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new window to local studies of interface phenomena at solid state surfaces has been opened by the development of local probe techniques such as Scanning Tunneling Microscopy (STM) or Atomic Force Microscopy (AFM) and related methods during the past fifteen years. The in-situ application of local probe methods in different systems belongs to modern nanotechnology and has two aspects: an analytical aspect and a preparative aspect. The first aspect covers the application of the local probe methods to characterize thermodynamic, structural and dynamic properties of solid state surfaces and interfaces and to investigate local surface reactions. Two methods which are still in the beginning of their development represent the second aspect: tip and cantilever. They can be used to form defined nano-objects such as molecular or atomic clusters, quantum dots etc. as well as to structure or modify solid state surfaces in the nanometer range. This IUPAC monograph is a comprehensive treatment of both aspects and presents the current state of knowledge. It is written for scientists active in the area of nanotechnology.

Book Particle Adhesion

    Book Details:
  • Author : David J. Quesnel
  • Publisher : CRC Press
  • Release : 2002-02-07
  • ISBN : 9789056997250
  • Pages : 546 pages

Download or read book Particle Adhesion written by David J. Quesnel and published by CRC Press. This book was released on 2002-02-07 with total page 546 pages. Available in PDF, EPUB and Kindle. Book excerpt: Whenever a curved surface interacts with another surface, the principles of adhesion are at work. From the cells in your body to the dust on your glasses, intermolecular forces cause materials to attract one another. Elastic deformations resulting from these adhesive interactions store strain that can be liberated during particle detachment. Time dependent changes in adhesion can result from plastic deformation that both increases the real effective contact area and reduces the stored energy available to assist in particle removal. Processes such as these, based on the fundamentals tenets of particle adhesion, are now finding applications across many disciplines leading to a rich and rapid development of knowledge. This book documents the use of particle adhesion concepts in a variety of disciplines. Fields as varied as the cleaning of semiconductors, to the controlling of cancer metastasis, to the abatement of environmental pollution all benefit from applications of particle adhesion concepts.

Book Electrochemical Microsystem Technologies

Download or read book Electrochemical Microsystem Technologies written by J. Walter Schultze and published by CRC Press. This book was released on 2002-09-05 with total page 594 pages. Available in PDF, EPUB and Kindle. Book excerpt: Driven by the electronics industry, electrochemical technology has rapidly evolved, finding increasing applications in microelectronics, batteries, sensors, materials science, industrial fabrication, corrosion, microbiology, neurobiology and medicine. Electrochemical Microsystem Technologies provides an overview of the technological status; the dev