Download or read book Atomic Layer Deposition of Materials for Electronic and Photonic Applications written by Francis Chalvet and published by . This book was released on 2008 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic Layer Deposition (ALD) is a technique to deposit extremely uniform thin films through surface-controlled reactions of gaseous precursors. It is the method of choice for ultrathin oxide and metal layers in the next generations of logic and memory devices, but finds application as well in nanotechnology and catalysis. An ALD reactor at laboratory scale was designed and built to study the growth of metal oxides such as Al2O3 and HfO2 on flat and porous surfaces. During the design of the process, the key aspects were the choice of two complementary chemical precursors and the time controlled injection of precursor fluxes into the deposition chamber. After assembly of the reactor the operation parameters (pressure, nitrogen throughput, precursor fluxes) were optimised. The reactor worked at vacuum pressures of about 1 torr and used a continuous flow of nitrogen for the transport of precursor gases. Uniform and controlled film growth was observed during growth of Al2O3 from trimethylaluminium and water, and during growth of HfO2 from hafnium-tetrakisdimethylamide and water. Electrical characterisation of MOS capacitors with a Pd/HfO2/Si structure and 3 or 9 nm thin layers of HfO2 showed the high quality of the insulating oxide. The deposition technique was then used to coat porous structures. Membranes with high aspect ratios pores (L/d = 300) were coated with HfO2 without modifying the process used for coating flat surfaces. The possibility offered by ALD to coat pores with a high level of control was used to tune the optical characteristics of porous photonic crystals. Opal-type photonic crystals were infiltrated with layers of Al2O3, TiO2 and VOx. The results obtained show the deposition of high quality oxide films with a thickness controllable at the nanoscale, on both flat and porous surfaces.
Download or read book Atomic Layer Deposition written by Tommi Kääriäinen and published by John Wiley & Sons. This book was released on 2013-05-28 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Download or read book Thin Film Organic Photonics written by Tetsuzo Yoshimura and published by CRC Press. This book was released on 2017-12-19 with total page 490 pages. Available in PDF, EPUB and Kindle. Book excerpt: Among the many atomic/molecular assembling techniques used to develop artificial materials, molecular layer deposition (MLD) continues to receive special attention as the next-generation growth technique for organic thin-film materials used in photonics and electronics. Thin-Film Organic Photonics: Molecular Layer Deposition and Applications describes how photonic/electronic properties of thin films can be improved through MLD, which enables precise control of atomic and molecular arrangements to construct a wire network that achieves "three-dimensional growth". MLD facilitates dot-by-dot—or molecule-by-molecule—growth of polymer and molecular wires, and that enhanced level of control creates numerous application possibilities. Explores the wide range of MLD applications in solar energy and optics, as well as proposed uses in biomedical photonics This book addresses the prospects for artificial materials with atomic/molecular-level tailored structures, especially those featuring MLD and conjugated polymers with multiple quantum dots (MQDs), or polymer MQDs. In particular, the author focuses on the application of artificial organic thin films to: Photonics/electronics, particularly in optical interconnects used in computers Optical switching and solar energy conversion systems Bio/ medical photonics, such as photodynamic therapy Organic photonic materials, devices, and integration processes With its clear and concise presentation, this book demonstrates exactly how MLD enables electron wavefunction control, thereby improving material performance and generating new photonic/electronic phenomena.
Download or read book Atomic Layer Deposition of Epitaxial Perovskites for Electronic and Photonic Applications written by Edward Lawrence Lin and published by . This book was released on 2018 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: This research focuses on growth of ferroelectric and conductive perovskite oxides for both electronic and photonic applications. The advancement of computing technologies requires new device architectures, new materials, and new processing techniques. Perovskite class oxides, which have the general formula of ABO3, possess various types of properties. The ability to grow perovskite oxides epitaxially on Si and Ge(001) single crystals provides an opportunity for incorporating various properties of perovskite onto semiconductor devices. In particular, barium titanate (BaTiO3, BTO) is ferroelectric enabling opportunities in reducing transistor power consumption and fabricating photonic devices. The advancement in growing epitaxial perovskite oxides on Si(001) with a strontium titanate (SrTiO3, STO) buffer layer via atomic layer deposition (ALD) shows the promise of using ALD to integrate perovskite properties into semiconductor materials. In order to realize the benefit brought by BTO, BTO films deposited by ALD need to exhibit ferroelectric polarization. This work initially focuses on ALD growth of BTO on Ge(001) and STO-buffered Si(001) single crystal substrates. Ferroelectric polarization was observed on the BTO films deposited on STO-buffered Si(001) substrates. The c-axis direction, which is the direction of BTO ferroelectric polarization, of BTO films with thickness up to 66 nm can be controlled by adjusting post-deposition annealing parameters. Ferroelectric switching of BTO on STO-buffered Si(001) in out- of-plane and in-plane directions were demonstrated by piezoresponse force microscopy and electro-optic measurement, respectively. Another part of this work concerns the mismatch between the range of BTO polarization and the polarization range needed to switch Si transistor channels. One proposal to address the mismatch is to introduce a thin conductive layer to attenuate BTO polarization. An MBE-ALD approach was developed to grow the conductive La:STO layer between a ferroelectric BTO film and the Si(001) substrate. Capacitance-voltage measurements of the BTO/La:STO film grown on STO-buffered Si(001) demonstrate attenuation of an externally applied electric field by La:STO, which is a result of the La:STO film conductivity. Lastly, this work explores the possibility of selective growth of BTO. Pattern transfer of the ALD grown film was observed by atomic force microscopy. The patterned film crystallizes after annealing the film in vacuum to the temperature of 800 °C.
Download or read book Atomic Layer Deposition Applications 2 written by Ana Londergan and published by The Electrochemical Society. This book was released on 2007 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue gives an overview of the cutting edge research in the various areas where Atomic Layer Deposition (ALD) can be used, enabling the identification of issues, challenges, and areas where further research is needed. Contributions include: Memory applications, Interconnects and contacts, ALD Productivity enhancement and precursor development, ALD for optical and photonic applications, and Applications in other areas, such as MEMs, nanotechnology, fabrication of sensors and catalysts, etc.
Download or read book Atomic Layer Deposition Applications 14 written by F. Roozeboom and published by The Electrochemical Society. This book was released on 2018-09-21 with total page 83 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Atomic Layer Deposition written by David Cameron and published by MDPI. This book was released on 2020-12-28 with total page 142 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing – known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.
Download or read book Atomic Layer Deposition Applications 3 written by Ana Londergan and published by The Electrochemical Society. This book was released on 2007 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt: The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the symposium focus. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties. Following two successful years, this symposium is well on its way to becoming a forum for the sharing of cutting edge research in the various areas where ALD is used.
Download or read book Atomic Layer Deposition Applications 6 written by J. W. Elam and published by The Electrochemical Society. This book was released on 2010-10 with total page 469 pages. Available in PDF, EPUB and Kindle. Book excerpt: The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the focus of this reoccurring symposium. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topographies with controlled thickness and composition. This issue of ECS Transactions contains peer reviewed papers presented at the symposium. A broad spectrum of ALD applications is featured, including novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics, and a variety of other emerging applications.
Download or read book Atomic Layer Deposition Applications 10 written by F. Roozeboom and published by The Electrochemical Society. This book was released on 2014 with total page 311 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Atomic Layer Deposition Applications 7 written by J. W. Elam and published by The Electrochemical Society. This book was released on 2011 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Atomic Layer Deposition Applications 5 written by S. de Gendt and published by The Electrochemical Society. This book was released on 2009-09 with total page 425 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic Layer Deposition can enable precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties for a wide range of applications.
Download or read book Atomic Layer Deposition for Energy and Ssemiconductor Applications written by Yongmin Kim and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: In this thesis, I contribute to two instrumental sectors in our current society -- semiconductor and energy -- by developing novel materials through advanced nanoscale engineering through atomic layer deposition (ALD). ALD is a deposition technique in vacuum, which can make highly uniform films with a thickness range of 1-100 nm on both 2-D and 3-D structured substrates. ALD chemistries enable the deposition of a wide diversity of materials. Furthermore, performing diverse ALD chemistries in single deposition is possible, leading to fabrication of both homogenous mixtures and heterogeneous structures (e.g. nanolaminate and metal/metal-oxide composite). First, I will discuss about the use of ALD to fabricate barium titanates and silicon nitrides for the applications in key semiconductor components in Chapters 2 and 3. The continuous downscaling of integrated circuits (ICs) necessitates the development of ultrathin oxides and nitrides, mainly used for dielectric materials and sidewall spacers in transistors, respectively. Oxide films with high dielectric constants (i.e. high-k) and low electrical leakage currents are essential for the applications of information storage devices such as dynamic random-access memory (DRAM). Using ALD, ultrathin (
Download or read book Atomic Layer Deposition Applications 13 written by F. Roozeboom and published by The Electrochemical Society. This book was released on with total page 128 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Springer Handbook of Electronic and Photonic Materials written by Safa Kasap and published by Springer. This book was released on 2017-10-04 with total page 1536 pages. Available in PDF, EPUB and Kindle. Book excerpt: The second, updated edition of this essential reference book provides a wealth of detail on a wide range of electronic and photonic materials, starting from fundamentals and building up to advanced topics and applications. Its extensive coverage, with clear illustrations and applications, carefully selected chapter sequencing and logical flow, makes it very different from other electronic materials handbooks. It has been written by professionals in the field and instructors who teach the subject at a university or in corporate laboratories. The Springer Handbook of Electronic and Photonic Materials, second edition, includes practical applications used as examples, details of experimental techniques, useful tables that summarize equations, and, most importantly, properties of various materials, as well as an extensive glossary. Along with significant updates to the content and the references, the second edition includes a number of new chapters such as those covering novel materials and selected applications. This handbook is a valuable resource for graduate students, researchers and practicing professionals working in the area of electronic, optoelectronic and photonic materials.
Download or read book Ultrathin Two Dimensional Semiconductors for Novel Electronic Applications written by Mohammad Karbalaei Akbari and published by CRC Press. This book was released on 2020-07-30 with total page 341 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering perspective on both the scientific and engineering aspects of 2D semiconductors, Ultrathin Two-Dimensional Semiconductors for Novel Electronic Applications discusses how to successfully engineer 2D materials for practical applications. It also covers several novel topics regarding 2D semiconductors which have not yet been discussed in any other publications. Features: Provides comprehensive information and data about wafer-scale deposition of 2D semiconductors, ranging from scientific discussions up to the planning of experiments and reliability testing of the fabricated samples Precisely discusses wafer-scale ALD and CVD of 2D semiconductors and investigates various aspects of deposition techniques Covers the new group of 2D materials synthesized from surface oxide of liquid metals and also explains the device fabrication and post-treatment of these 2D nanostructures Addresses a wide range of scientific and practical applications of 2D semiconductors and electronic and optoelectronic devices based on these nanostructures Offers novel coverage of 2D heterostructures and heterointerfaces and provides practical information about fabrication and application of these heterostructures Introduces the latest advancement in fabrication of novel memristors, artificial synapses and sensorimotor devices based on 2D semiconductors This work offers practical information valuable for engineering applications that will appeal to researchers, academics, and scientists working with and interested in developing an array of semiconductor electronic devices.
Download or read book Oxide Based Materials and Structures written by Rada Savkina and published by CRC Press. This book was released on 2020-05-07 with total page 271 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxide-based materials and structures are becoming increasingly important in a wide range of practical fields including microelectronics, photonics, spintronics, power harvesting, and energy storage in addition to having environmental applications. This book provides readers with a review of the latest research and an overview of cutting-edge patents received in the field. It covers a wide range of materials, techniques, and approaches that will be of interest to both established and early-career scientists in nanoscience and nanotechnology, surface and material science, and bioscience and bioengineering in addition to graduate students in these areas. Features: Contains the latest research and developments in this exciting and emerging field Explores both the fundamentals and applications of the research Covers a wide range of materials, techniques, and approaches
