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Book Applications of Spectroscopic Ellipsometry to Microelectronics

Download or read book Applications of Spectroscopic Ellipsometry to Microelectronics written by and published by . This book was released on 1993 with total page 43 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ellipsometry has been applied to problems in the microelectronics industry from the beginning in the 1960's. More recently spectroscopic ellipsometry has been introduced. In-situ during process ellipsometry offers great promise for monitoring and control of a wide variety of microelectronics processes. This review covers some applications in silicon technology such as oxidation, chemical vapor deposition, etching, interfaces, and new processing techniques such as plasma, ion beam and rapid thermal, in an effort to demonstrate the kinds of crucial microelectronics information and processes that modern ellipsometry can access. The conclusion is that single wavelength ellipsometry along is not sufficient; spectroscopic ellipsometry is required to establish the optimum ellipsometry measurement conditions. The future of ellipsometry in microelectronics is assessed.

Book Spectroscopic Ellipsometry

Download or read book Spectroscopic Ellipsometry written by Hiroyuki Fujiwara and published by John Wiley & Sons. This book was released on 2007-09-27 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.

Book Handbook of Ellipsometry

    Book Details:
  • Author : Harland Tompkins
  • Publisher : William Andrew
  • Release : 2005-01-06
  • ISBN : 0815517475
  • Pages : 887 pages

Download or read book Handbook of Ellipsometry written by Harland Tompkins and published by William Andrew. This book was released on 2005-01-06 with total page 887 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.

Book Introduction to Spectroscopic Ellipsometry of Thin Film Materials

Download or read book Introduction to Spectroscopic Ellipsometry of Thin Film Materials written by Andrew T. S. Wee and published by John Wiley & Sons. This book was released on 2022-03-08 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: A one-of-a-kind text offering an introduction to the use of spectroscopic ellipsometry for novel material characterization In Introduction to Spectroscopic Ellipsometry of Thin Film Materials: Instrumentation, Data Analysis and Applications, a team of eminent researchers delivers an incisive exploration of how the traditional experimental technique of spectroscopic ellipsometry is used to characterize the intrinsic properties of novel materials. The book focuses on the scientifically and technologically important two-dimensional transition metal dichalcogenides (2D-TMDs), magnetic oxides like manganite materials, and unconventional superconductors, including copper oxide systems. The distinguished authors discuss the characterization of properties, like electronic structures, interfacial properties, and the consequent quasiparticle dynamics in novel quantum materials. Along with illustrative and specific case studies on how spectroscopic ellipsometry is used to study the optical and quasiparticle properties of novel systems, the book includes: Thorough introductions to the basic principles of spectroscopic ellipsometry and strongly correlated systems, including copper oxides and manganites Comprehensive explorations of two-dimensional transition metal dichalcogenides Practical discussions of single layer graphene systems and nickelate systems In-depth examinations of potential future developments and applications of spectroscopic ellipsometry Perfect for master’s- and PhD-level students in physics and chemistry, Introduction to Spectroscopic Ellipsometry of Thin Film Materials will also earn a place in the libraries of those studying materials science seeking a one-stop reference for the applications of spectroscopic ellipsometry to novel developed materials.

Book Scientific and Technical Aerospace Reports

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 500 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Spectroscopic Ellipsometry Analysis of Nanoporous Low Dielectric Constant Films Processed Via Supercritical Carbon Dioxide for Next generation Microelectronic Devices

Download or read book Spectroscopic Ellipsometry Analysis of Nanoporous Low Dielectric Constant Films Processed Via Supercritical Carbon Dioxide for Next generation Microelectronic Devices written by Maslina Othman and published by . This book was released on 2007 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: My research will address issues at the back-end-of-line in microelectronics fabrication, specifically the need for Low-[kappa] extendibility. The International Roadmap for Semiconductors (2005) suggested that interconnect insulation must be replaced with a material having an ultra-low dielectric constant ([kappa]) of [lesser than] 2.0 and can withstand rigorous current process integration for the 65 nm technology. Creating porosity in the films produces [kappa]-values as low (1.0) air. In this research, supercritical CO (SCCO) process is utilized to create pores, remove water, repair plasma-damaged sample and seal pores. These multi-step processing does not only produce low-[kappa] film but also create device reliability. S22pectroscopy ellipsometric (SE) analysis is used to evaluate the performance of each process on porous film. In SE analysis, Cauchy, Bruggeman Effective Medium Approximation and graded models are used to model the processed samples. The depth profile SE analysis demonstrates the individual process performance based on its changes of refractive index (n) throughout the film thickness. SE also provide important film properties like thickness, porosity etc. In addition to SE, Fourier Transform Infra-red (FT-IR), Scanning Electron Microscopy (SEM) and electrical characterizations are used. Results show that SCCO2/co-solvents can extract porogens and remove water effectively at a significantly shorter time ([lesser than or equal to] 1 hr) and at a low temperature ([lesser than or equal to] 160°C) without thickness shrinkage in contrast with thermal annealing which uses 450°C and 5 hours without significantly shrinkage. SCCO2/TMCS removes water and terminates silanol group with methyl group, and hence preventing water re-adsorption which increases [kappa]. The dense layer on the sample surface that formed through the vapor treatment/HMDS helps to seal pores and prevent metal diffusion. This research also shows that patterning samples prior to porogen/water removal can minimize plasma damages on porous sample.

Book Handbook of Optical Metrology

Download or read book Handbook of Optical Metrology written by Toru Yoshizawa and published by CRC Press. This book was released on 2017-07-28 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Optical Metrology: Principles and Applications begins by discussing key principles and techniques before exploring practical applications of optical metrology. Designed to provide beginners with an introduction to optical metrology without sacrificing academic rigor, this comprehensive text: Covers fundamentals of light sources, lenses, prisms, and mirrors, as well as optoelectronic sensors, optical devices, and optomechanical elements Addresses interferometry, holography, and speckle methods and applications Explains Moiré metrology and the optical heterodyne measurement method Delves into the specifics of diffraction, scattering, polarization, and near-field optics Considers applications for measuring length and size, displacement, straightness and parallelism, flatness, and three-dimensional shapes This new Second Edition is fully revised to reflect the latest developments. It also includes four new chapters—nearly 100 pages—on optical coherence tomography for industrial applications, interference microscopy for surface structure analysis, noncontact dimensional and profile metrology by video measurement, and optical metrology in manufacturing technology.

Book Spectroscopic Ellipsometry

Download or read book Spectroscopic Ellipsometry written by Harland G. Tompkins and published by Momentum Press. This book was released on 2015-12-16 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.

Book A User s Guide to Ellipsometry

Download or read book A User s Guide to Ellipsometry written by Harland G. Tompkins and published by Courier Corporation. This book was released on 2013-03-21 with total page 496 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text on optics for graduate students explains how to determine material properties and parameters for inaccessible substrates and unknown films as well as how to measure extremely thin films. Its 14 case studies illustrate concepts and reinforce applications of ellipsometry — particularly in relation to the semiconductor industry and to studies involving corrosion and oxide growth. A User's Guide to Ellipsometry will enable readers to move beyond limited turn-key applications of ellipsometers. In addition to its comprehensive discussions of the measurement of film thickness and optical constants in film, it also considers the trajectories of the ellipsometric parameters Del and Psi and how changes in materials affect parameters. This volume also addresses the use of polysilicon, a material commonly employed in the microelectronics industry, and the effects of substrate roughness. Three appendices provide helpful references.

Book Advanced Characterization Techniques for Thin Film Solar Cells

Download or read book Advanced Characterization Techniques for Thin Film Solar Cells written by Daniel Abou-Ras and published by John Wiley & Sons. This book was released on 2016-07-13 with total page 760 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book focuses on advanced characterization methods for thin-film solar cells that have proven their relevance both for academic and corporate photovoltaic research and development. After an introduction to thin-film photovoltaics, highly experienced experts report on device and materials characterization methods such as electroluminescence analysis, capacitance spectroscopy, and various microscopy methods. In the final part of the book simulation techniques are presented which are used for ab-initio calculations of relevant semiconductors and for device simulations in 1D, 2D and 3D. Building on a proven concept, this new edition also covers thermography, transient optoelectronic methods, and absorption and photocurrent spectroscopy.

Book Oxide Based Materials and Structures

Download or read book Oxide Based Materials and Structures written by Rada Savkina and published by CRC Press. This book was released on 2020-05-07 with total page 317 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxide-based materials and structures are becoming increasingly important in a wide range of practical fields including microelectronics, photonics, spintronics, power harvesting, and energy storage in addition to having environmental applications. This book provides readers with a review of the latest research and an overview of cutting-edge patents received in the field. It covers a wide range of materials, techniques, and approaches that will be of interest to both established and early-career scientists in nanoscience and nanotechnology, surface and material science, and bioscience and bioengineering in addition to graduate students in these areas. Features: Contains the latest research and developments in this exciting and emerging field Explores both the fundamentals and applications of the research Covers a wide range of materials, techniques, and approaches

Book In Situ Characterization of Thin Film Growth

Download or read book In Situ Characterization of Thin Film Growth written by Gertjan Koster and published by Elsevier. This book was released on 2011-10-05 with total page 295 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques

Book Nano and Giga Challenges in Microelectronics

Download or read book Nano and Giga Challenges in Microelectronics written by J. Greer and published by Elsevier. This book was released on 2003-10-24 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book is designed as an introduction for engineers and researchers wishing to obtain a fundamental knowledge and a snapshot in time of the cutting edge in technology research. As a natural consequence, Nano and Giga Challenges is also an essential reference for the "gurus" wishing to keep abreast of the latest directions and challenges in microelectronic technology development and future trends. The combination of viewpoints presented within the book can help to foster further research and cross-disciplinary interaction needed to surmount the barriers facing future generations of technology design. Key Features: • Quickly becoming the hottest topic of the new millennium (2.4 billion dollars funding in US alone • Current status and future trends of micro and nanoelectronics research • Written by leading experts in the corresponding research areas • Excellent tutorial for graduate students and reference for "gurus"

Book Handbook of Ellipsometry

Download or read book Handbook of Ellipsometry written by Harland G. Tompkins and published by Springer. This book was released on 2010-11-16 with total page 870 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ever progressive miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research are propelling ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, to greater popularity in a widening array of applications. Ellipsometry, without contact and non-damaging to samples, is an ideal measurement technique to determine optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications occurring today, this book provides a much needed foundation of the science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, fiber optics, biotechnology, and pharmaceuticals. Divided into four sections, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas.

Book China

    Book Details:
  • Author : World Bank
  • Publisher : World Bank Publications
  • Release : 1993
  • ISBN : 9780821323953
  • Pages : 1422 pages

Download or read book China written by World Bank and published by World Bank Publications. This book was released on 1993 with total page 1422 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Republic of Korea's industrial policy has directed that nation's economy through nearly three decades of spectacular growth. But the authors of this paper maintain that this policy is showing signs of being outmoded. The time has come, the authors argue, for the Korean government to stop managing the economy's structural development and to redefine the responsibilities of business and government. Under this proposed compact, the allocation of resources would shift from the government to the private industrial and financial sectors. The transformation of the government bureaucracy from an ad hoc policy role to one of a transparent and predictable regulator is a key to the success of this undertaking. These new directions would present the government with enormous challenges. Greater competitive discipline and regulatory oversight would be required. While dealing with the complexities of the transition, the government would have to maintain macroeconomic stability and the momentum of savings and investment. For comparison, the study examines the industrial economies of France, Germany, Japan, and the United States, which underwent similar shifts.

Book Proceedings of the 2019 Joint Workshop of Fraunhofer IOSB and Institute for Anthropomatics  Vision and Fusion Laboratory

Download or read book Proceedings of the 2019 Joint Workshop of Fraunhofer IOSB and Institute for Anthropomatics Vision and Fusion Laboratory written by Beyerer, Jürgen and published by KIT Scientific Publishing. This book was released on 2020-10-23 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt: In 2019 fand wieder der jährliche Workshop des Fraunhofer IOSB und des Lehrstuhls für Interaktive Echtzeitsysteme des Karlsruher Insitut für Technologie statt. Die Doktoranden beider Institutionen präsentierten den Fortschritt ihrer Forschung in den Themen Maschinelles Lernen, Machine Vision, Messtechnik, Netzwerksicherheit und Usage Control. Die Ideen dieses Workshops sind in diesem Buch gesammelt in der Form technischer Berichte. - In 2019 again, the annual joint workshop of the Fraunhofer IOSB and the Vision and Fusion Laboratory of the Karlsruhe Institute of Technology took place. The doctoral students of both institutions presented extensive reports on the status of their research and discussed topics ranging from computer vision and optical metrology to network security, usage control and machine learning. The results and ideas presented at the workshop are collected in this book in the form of technical reports.

Book Handbook of Silicon Carbide Materials and Devices

Download or read book Handbook of Silicon Carbide Materials and Devices written by Zhe Chuan Feng and published by CRC Press. This book was released on 2023-07-10 with total page 465 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook presents the key properties of silicon carbide (SiC), the power semiconductor for the 21st century. It describes related technologies, reports the rapid developments and achievements in recent years, and discusses the remaining challenging issues in the field. The book consists of 15 chapters, beginning with a chapter by Professor W. J. Choyke, the leading authority in the field, and is divided into four sections. The topics include presolar SiC history, vapor-liquid-solid growth, spectroscopic investigations of 3C-SiC/Si, developments and challenges in the 21st century; CVD principles and techniques, homoepitaxy of 4H-SiC, cubic SiC grown on 4H-SiC, SiC thermal oxidation processes and MOS interface, Raman scattering, NIR luminescent studies, Mueller matrix ellipsometry, Raman microscopy and imaging, 4H-SiC UV photodiodes, radiation detectors, and short wavelength and synchrotron X-ray diffraction. This comprehensive work provides a strong contribution to the engineering, materials, and basic science knowledge of the 21st century, and will be of interest to material growers, designers, engineers, scientists, postgraduate students, and entrepreneurs.