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EBookClubs

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Book Application of Monte Carlo Method in Simulation of Sputtered Thin Film Surfaces

Download or read book Application of Monte Carlo Method in Simulation of Sputtered Thin Film Surfaces written by A. Biswas and published by . This book was released on 2005 with total page 15 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Combining Monte Carlo Transport and Level Set Surface Evolution for Modeling Vapor Phase Deposition of Thin Films Over Sub micron Features

Download or read book Combining Monte Carlo Transport and Level Set Surface Evolution for Modeling Vapor Phase Deposition of Thin Films Over Sub micron Features written by John Lewis Smith and published by . This book was released on 2014 with total page 58 pages. Available in PDF, EPUB and Kindle. Book excerpt: A hybrid scheme is used to model the vapor phase deposition of thin films at the feature scale. The transport of the chemical species to the substrate surface is modeled with a Collisionless Direct Simulation Monte Carlo (DSMC) method. The Level Set Method is used to model the growth of the thin-film on the substrate. The convergence criteria for these methods were not found in literature. The governing equations for the Level Set Method are, in general, non-linear partial differential equations. The coupling of the DSMC Method with the Level Set Method results in a set of non-Gaussian stochastic non-linear partial differential equations. Developing general convergence criteria proved exceedingly difficult, and only qualitative results are presented to support our convergence criteria. Simulation results are in qualitative agreement with experiments and other results from literature.

Book Evolution of Thin Film Morphology

Download or read book Evolution of Thin Film Morphology written by Matthew Pelliccione and published by Springer Science & Business Media. This book was released on 2008-01-29 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt: The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes.

Book Monte Carlo Modeling of Thin Film Deposition

Download or read book Monte Carlo Modeling of Thin Film Deposition written by and published by . This book was released on 2002 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this paper we discuss the use of atomistic Monte Carlo simulations to predict film microstructure evolution. We discuss physical vapor deposition, and are primarily concerned with films that are formed by the nucleation and coalescence of 3D islands. Multi-scale modeling is used in the sense that information obtained from molecular dynamics and first principles calculations provide atomic interaction energies, surface and grain boundary properties and diffusion rates for use in the Monte Carlo model. In this paper, we discuss some fundamental issues associated with thin film formation, together with an assessment of the sensitivity of the film morphology to the deposition conditions and materials properties.

Book How to Use the Monte Carlo Simulation Technique  Application

Download or read book How to Use the Monte Carlo Simulation Technique Application written by Fethi Khelfaoui and published by . This book was released on 2018 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many physical phenomena can be modeled using Monte Carlo simulation (MCS) because it is a powerful tool to study thermodynamic properties. MCS can be used to simulate interactions between several particles or bodies in the presence of local or external fields. The main idea is to create a high number of different random configurations; statistics can be taken according to appropriate algorithms (Metropolis algorithm). In this chapter, we present basic techniques of MCS as the choice of potential, reaction rates, simulation cell, random configurations, and algorithms. We present some principal ideas of MCS used to study particle-particle collisions in the gas and in plasmas. Other MCS techniques are presented briefly. A numerical application is presented for collisions in gas phase during thin film deposition by plasma-enhanced chemical vapor deposition (PECVD) processes. Parameters and results of the simulation are studied according to a chosen reactor and mixture.

Book Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition

Download or read book Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition written by Rafael Alvarez and published by MDPI. This book was released on 2021-04-22 with total page 178 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Special Issue deals with the synthesis of nanostructured surfaces and thin films by means of physical vapor deposition techniques such as pulsed laser deposition, magnetron sputtering, HiPIMS, or e-beam evaporation, among others. The nanostructuration of the surface modifies the way a material interacts with the environment, changing its optical, mechanical, electrical, tribological, or chemical properties. This can be applied in the development of photovoltaic cells, tribological coatings, optofluidic sensors, or biotechnology to name a few. This issue includes research presenting novel or improved applications of nanostructured thin films, such as photovoltaic solar cells, thin-film transistors, antibacterial coatings or chemical and biological sensors, while also studying the nanostructuration mechanisms, from a fundamental point of view, that produce rods, columns, helixes or hexagonal grids at the nanoscale.

Book Theory  Application  and Implementation of Monte Carlo Method in Science and Technology

Download or read book Theory Application and Implementation of Monte Carlo Method in Science and Technology written by Pooneh Saidi Bidokhti and published by BoD – Books on Demand. This book was released on 2019-12-18 with total page 189 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Monte Carlo method is a numerical technique to model the probability of all possible outcomes in a process that cannot easily be predicted due to the interference of random variables. It is a technique used to understand the impact of risk, uncertainty, and ambiguity in forecasting models. However, this technique is complicated by the amount of computer time required to achieve sufficient precision in the simulations and evaluate their accuracy. This book discusses the general principles of the Monte Carlo method with an emphasis on techniques to decrease simulation time and increase accuracy.

Book Investigation of Film Surface Roughness and Porosity Dependence on Lattice Size in a Porous Thin Film Deposition Process Via Kinetic Monte Carlo Simulations

Download or read book Investigation of Film Surface Roughness and Porosity Dependence on Lattice Size in a Porous Thin Film Deposition Process Via Kinetic Monte Carlo Simulations written by Jianqiao Huang and published by . This book was released on 2009 with total page 80 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Monte Carlo Simulations of ABC Stacked Kagome Lattice Thin Films

Download or read book Monte Carlo Simulations of ABC Stacked Kagome Lattice Thin Films written by Hennadii Yerzhakov and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: In this thesis properties of thin films of the frustrated antiferromagnet IrMn3 (chemically ordered phase) are examined using Metropolis Monte Carlo simulations, which is a step towards a better understanding of the exchange bias phenomenon in heterostructures with this material. This fcc compound has an unusual magnetic structure composed of ABC stacked (along cubic h111i axes) kagome layers of magnetic Mn ions. The kagome lattice is known to exhibit a high degree of frustration for antiferromagnetically coupled spins. A classical spin Heisenberg Hamiltonian is utilized, where symmetry breaking at the surfaces is modeled by introducing a local easy axis anisotropy perpendicular to the film. The impact of having an easy-axis anisotropy on the surface layers and cubic anisotropy in the middle layers is explored. The spin structure at the surface is shown to be different from that of the bulk 3D system, where spins tend to align along the surface [111] normal axis. This alignment tendency then propagates to the middle layers through exchange coupling. Results are shown for the specific heat, magnetization and sub-lattice order parameters for both surface and middle spins in three and six layer films as a function of increasing axial anisotropy. Preliminary results of simulations of the thin films with surface magnetic vacancies, which usually is present in real films, are also shown.

Book Applications of the Monte Carlo Method in Statistical Physics

Download or read book Applications of the Monte Carlo Method in Statistical Physics written by K. Binder and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 321 pages. Available in PDF, EPUB and Kindle. Book excerpt: Monte Carlo computer simulations are now a standard tool in scientific fields such as condensed-matter physics, including surface-physics and applied-physics problems (metallurgy, diffusion, and segregation, etc. ), chemical physics, including studies of solutions, chemical reactions, polymer statistics, etc. , and field theory. With the increasing ability of this method to deal with quantum-mechanical problems such as quantum spin systems or many-fermion problems, it will become useful for other questions in the fields of elementary-particle and nuclear physics as well. The large number of recent publications dealing either with applications or further development of some aspects of this method is a clear indication that the scientific community has realized the power and versatility of Monte Carlo simula tions, as well as of related simulation techniques such as "molecular dynamics" and "Langevin dynamics," which are only briefly mentioned in the present book. With the increasing availability of recent very-high-speed general-purpose computers, many problems become tractable which have so far escaped satisfactory treatment due to prac tical limitations (too small systems had to be chosen, or too short averaging times had to be used). While this approach is admittedly rather expensive, two cheaper alternatives have become available, too: (i) array or vector processors specifical ly suited for wide classes of simulation purposes; (ii) special purpose processors, which are built for a more specific class of problems or, in the extreme case, for the simulation of one single model system.

Book PVD for Microelectronics  Sputter Desposition to Semiconductor Manufacturing

Download or read book PVD for Microelectronics Sputter Desposition to Semiconductor Manufacturing written by and published by Elsevier. This book was released on 1998-10-29 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

Book A Monte Carlo Calculation of High energy Sputtering

Download or read book A Monte Carlo Calculation of High energy Sputtering written by D. T. Goldman and published by . This book was released on 1959 with total page 22 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Surface and Thin Film Analysis

Download or read book Surface and Thin Film Analysis written by Gernot Friedbacher and published by John Wiley & Sons. This book was released on 2011-03-31 with total page 514 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surveying and comparing all techniques relevant for practical applications in surface and thin film analysis, this second edition of a bestseller is a vital guide to this hot topic in nano- and surface technology. This new book has been revised and updated and is divided into four parts - electron, ion, and photon detection, as well as scanning probe microscopy. New chapters have been added to cover such techniques as SNOM, FIM, atom probe (AP),and sum frequency generation (SFG). Appendices with a summary and comparison of techniques and a list of equipment suppliers make this book a rapid reference for materials scientists, analytical chemists, and those working in the biotechnological industry. From a Review of the First Edition (edited by Bubert and Jenett) "... a useful resource..." (Journal of the American Chemical Society)

Book Kinetic Monte Carlo Simulations of Thin Film Deposition and Growth

Download or read book Kinetic Monte Carlo Simulations of Thin Film Deposition and Growth written by Oana Tataru Hogrefe and published by . This book was released on 2000 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Handbook of Thin Film Process Technology

Download or read book Handbook of Thin Film Process Technology written by David A Glocker and published by CRC Press. This book was released on 2018-01-18 with total page 90 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.