Download or read book Angle resolved Studies of Tin Laser Plasma Extreme Ultraviolet Sources written by Oran Morris and published by . This book was released on 2008 with total page 143 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Extreme ultraviolet Radiation Transport in Small Scale Length Laser produced Tin Plasmas written by Kevin Lamar Williams Sequoia and published by . This book was released on 2009 with total page 179 pages. Available in PDF, EPUB and Kindle. Book excerpt: The majority of the studies on laser-produced plasmas as an efficient extreme ultraviolet (EUV) light source have focused on relatively large plasmas produced at large laser facilities. However, to develop a commercially viable light source for EUV lithography, much smaller lasers and hence much smaller plasmas must be employed. Smaller plasmas behave quite differently than large plasmas in that the temperature and density are less uniform, and lateral expansion is more important. These differences affect the energy transport and, in particular, the radiation transport. This work studies the EUV radiation transport in small scale length tin plasmas, focusing on the effects of target geometry and laser pulse duration. Both planar and spherical tin targets were irradiated with an Nd:YAG laser operating at 1.064 [Mu]m. Conversion efficiency of laser light to 13.5 nm radiation (in-band), EUV emission spectrum, two-dimensional in-band emission profile, and the plasma electron density were measured experimentally. These measurements provide insight into where the laser is absorbed, where the in-band emission is produced, and how the radiation is transmitted. The plasma evolution in these experiments were simulated with a two-dimensional radiation hydrodynamic code, while the radiation transport and atomic kinetics where modeled with a collisional radiative code. Additional experiments were conducted using planar targets where the pulse duration was varied from 0.5 ns to 16 ns to understand the effects of laser pulse duration. It was found that the optimum plasma temperature for efficient generation and transmission of in-band emission is 20 eV. This is lower than the previously reported optimum temperature of 30 eV. The use of a 1.064 [Mu]m heating laser results in overheating of the plasma in a region that is much too dense to transmit the in-band emission. This overheating is necessary for the plasma to reach the optimum temperature in the region where the density is low enough to transmit the in-band emission.
Download or read book Laser Plasma Radiation Studies for Droplet Sources in the Extreme Ultraviolet written by Reuvani D. Kamtaprasad and published by . This book was released on 2010 with total page 73 pages. Available in PDF, EPUB and Kindle. Book excerpt: The advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desire to use EUV as a source for semiconductor device printing. Laser plasmas based on a mass-limited target concept, developed within the Laser Plasma Laboratory demonstrate a much needed versatility for satisfying rigorous source requirements. This concept produces minimal debris concerns and allows for the attainment of high repetition rates as well as the accommodation of various laser and target configurations. This work demonstrates the generation of EUV radiation by creating laser plasmas from mass-limited targets with indium, tin, and antimony doped droplets. Spectral emission from the laser plasmas is quantified using a flat-field spectrometer. COWAN code oscillator strength predications for each of the dopants were convolved with narrow Gaussian functions creating synthetic spectra for the EUV region between 10 nm - 20 nm. A preliminary comparison was made between the theoretical spectra and experimental results. From this comparison, ion stage transitions for each of the hot dense plasmas generated were assessed.
Download or read book Extreme Ultraviolet Source Development Using Laser Plasmas Containing Tin written by Patrick Hayden and published by . This book was released on 2007 with total page 204 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Studies of Extreme Ultraviolet Emission from Laser Produced Plasmas as Sources for Next Generation Lithography written by and published by . This book was released on 2013 with total page 193 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Download or read book Laser plasma Sources for Extreme ultraviolet Lithography written by Björn A. M. Hansson and published by . This book was released on 2003 with total page 58 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Laser Techniques in Extreme Ultraviolet written by Stephen Ernest Harris and published by American Institute of Physics. This book was released on 1984 with total page 552 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Extreme Ultraviolet Lithography with Laser Plasma Sources written by and published by . This book was released on 1995 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Studies on Laser triggered Discharge Plasmas as Extreme Ultraviolet Light Sources written by Girum A. Beyene and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Spectroscopy of Laser Produced Plasmas with Potential for Extreme Ultraviolet Sources written by Aodh O'Connor and published by . This book was released on 2009 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book High power Extreme Ultraviolet Source Based on Gas Jets written by and published by . This book was released on 1998 with total page 11 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authors report on the development of a high power laser plasma Extreme Ultraviolet (EUV) source for Extreme Ultraviolet Lithography. The source is based on the plasma emission of a recycled jet beam of large Xe clusters and produces no particulate debris. The source will be driven by a pulsed laser delivering 1,500 W of focused average power to the cluster jet target. To develop condensers and to optimize source performance, a low power laboratory cluster jet prototype has been used to study the spectroscopy, angular distributions, and EUV source images of the cluster jet plasma emission. In addition, methods to improve the reflectance lifetimes of nearby plasma facing condenser mirrors have been developed. The resulting source yields EUV conversion efficiencies up to 3.8% and mirror lifetimes of 109 plasma pulses.
Download or read book Radiation Studies of the Tin doped Microscopic Droplet Laser Plasma Light Source Specific to EUV Lithography written by Chiew-Seng Koay and published by . This book was released on 2006 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the other research program, debris mitigation and debris characterization of the source are also being carried out, and promising results have been demonstrated.
Download or read book Spatio temporally Resolved Dual Laser Plasma Photoabsorption Studies of Thorium Plasmas with Extreme UV Continuum Light Source written by J. T. Costello and published by . This book was released on 1999 with total page 30 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Analytical Heat Diffusion Theory written by Alekseĭ Vasilʹevich Lykov and published by Academic Press. This book was released on 1968-01-28 with total page 700 pages. Available in PDF, EPUB and Kindle. Book excerpt: Analytical Heat Diffusion Theory is a revised edition of an earlier book by Academician Luikov, which was widely used throughout the Soviet Union and the surrounding socialist countries. This book is divided into 15 chapters that treat heat conduction problems by the classical methods and emphasize the advantages of the transform method, particularly in obtaining short time solutions of many transient problems. This book starts with a discussion on the physical fundamentals, generalized variables, and solution of boundary value problems of heat transfer. Considerable chapters are devoted to the basic classical heat transfer problems and problems in which the body surface temperature is a specified function of time. Other chapters explore the heat transfer problems under different heat sources, including continuous and pulse-type. The discussion then shifts to the problem of freezing wet ground, two-dimensional temperature field, and heat conduction with variable transfer coefficients. The final chapters deal with the fundamentals of the integral transforms and their application to heat conduction problems. These chapters also look into the application of the theory of analytic functions to the heat conduction theory of mathematical physics. This book is an invaluable source for advanced undergraduate or graduate in analytical heat transfer.
Download or read book Second Topical Meeting on Laser Techniques in the Extreme Ultraviolet written by J. W. Quinn and published by . This book was released on 1985 with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt: The topical meeting on Laser Techniques in the Extreme Ultraviolet dealt with the development of sources of high energy photons produced by direct lasing action, nonlinear mixing, and laser produced plasmas; basic research relevant to molecular physics; and selected novel applications such as holography and x-ray lithography. The conference also addressed novel spectroscopic techniques applicable in the extreme ultraviolet. Topics covered include: laser produced xuv radiation sources; high resolution and excited state spectroscopy; harmonic generation and frequency conversion; multiphoton excitation and ionization studies; laser-synchrotron experiments; soft x-ray lasers; anti-stokes Raman techniques; and xuv reflectors and optics. (Author).
