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Book Aerosol Chemical Vapor Deposition of Metal Oxide Films

Download or read book Aerosol Chemical Vapor Deposition of Metal Oxide Films written by and published by . This book was released on 1994 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A process of preparing a film of a multicomponent metal oxide including: forming an aerosol from a solution comprised of a suitable solvent and at least two precursor compounds capable of volatilizing at temperatures lower than the decomposition temperature of said precursor compounds; passing said aerosol in combination with a suitable oxygen-containing carrier gas into a heated zone, said heated zone having a temperature sufficient to evaporate the solvent and volatilize said precursor compounds; and passing said volatilized precursor compounds against the surface of a substrate, said substrate having a sufficient temperature to decompose said volatilized precursor compounds whereby metal atoms contained within said volatilized precursor compounds are deposited as a metal oxide film upon the substrate is disclosed. In addition, a coated article comprising a multicomponent metal oxide film conforming to the surface of a substrate selected from the group consisting of silicon, magnesium oxide, yttrium-stabilized zirconium oxide, sapphire, or lanthanum gallate, said multicomponent metal oxide film characterized as having a substantially uniform thickness upon said FIELD OF THE INVENTION The present invention relates to the field of film coating deposition techniques, and more particularly to the deposition of multicomponent metal oxide films by aerosol chemical vapor deposition. This invention is the result of a contract with the Department of Energy (Contract No. W-7405-ENG-36).

Book Scalable Synthesis of Nanostructured Metal Oxide Films Using Aerosol Chemical Vapor Deposition for Energy Storage Applications

Download or read book Scalable Synthesis of Nanostructured Metal Oxide Films Using Aerosol Chemical Vapor Deposition for Energy Storage Applications written by Clayton T. Kacica and published by . This book was released on 2020 with total page 191 pages. Available in PDF, EPUB and Kindle. Book excerpt: As global energy consumption continues to rapidly increase, the need for new technologies to meet this demand in a sustainable way. Renewable sources such as solar and wind power are being increasingly utilized for electricity generation. However, the intermittent nature of these sources requires large-scale energy storage to reliably provide consistent power. Current grid-scale energy storage usually involves pumped hydroelectric systems, which are limited by location, or flywheel systems, which have limited use in high-power low-energy applications. Electrochemical storage solutions, such as lithium-ion batteries, provide robust energy storage that is not limited by location with a range of power and energy densities. Current lithium-ion battery technologies are used to power everything from electric vehicles (EVs) to handheld electronics. However, as the power and energy requirements of these devices continue to increase, new battery technologies will be needed. For example, the shift toward EVs faces issues related to vehicle batteries, including vehicle range, charging time, and cost.Thin-film batteries have several characteristics, such as high energy and power densities and long cycle life, that make them promising for next-generation lithium-ion batteries. Additionally, materials that have major drawbacks, such as large changes in volume during battery cycling, are possible to use in thin film systems. High-rate charging is also possible using thin film lithium-ion batteries due to the short distance lithium ions must intercalate during the charging process.In this thesis, an aerosol chemical vapor deposition (ACVD) technique is used to synthesize structured, single-crystal thin-film battery electrodes in a single-step process that operates at atmospheric pressure. Several materials were synthesized, such as SnO2, TiO2, and doped TiO2, for use as lithium-ion battery electrodes. A scale-up study on the ACVD reactor was conducted by developing a coupled computational fluid-dynamics -- aerosol dynamics model. This model was used to study the effect of reactor operating parameters on the resultant thin film morphology, deposition rate, and uniformity. Finally, a lithium-sulfur battery electrode was synthesized using a TiO2 thin film synthesized via ACVD combined with a metal-organic-framework synthesized using electrospray.

Book Characteristics of Aerosol Assisted and Conventional Chemical Vapour Deposition of Metal Oxide Thin Films on Glass  with Or Without Metal Dopants

Download or read book Characteristics of Aerosol Assisted and Conventional Chemical Vapour Deposition of Metal Oxide Thin Films on Glass with Or Without Metal Dopants written by Gillian Walters and published by . This book was released on 2012 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book The Chemical Vapor Deposition of Thin Metal Oxide Films

Download or read book The Chemical Vapor Deposition of Thin Metal Oxide Films written by Angus Buchanan Laurie and published by . This book was released on 1990 with total page 254 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Characteristics of Aerosol Assisted and Conventional Chemical Vapour Deposition of Metal Oxide Thin Films on Glass  with Or Without Metal Dopants

Download or read book Characteristics of Aerosol Assisted and Conventional Chemical Vapour Deposition of Metal Oxide Thin Films on Glass with Or Without Metal Dopants written by and published by . This book was released on 2012 with total page 646 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Chemical Vapor Deposition  CVD  of Transition Metal and Metal Oxide Thin Films

Download or read book Chemical Vapor Deposition CVD of Transition Metal and Metal Oxide Thin Films written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Chemical Vapour Deposition

    Book Details:
  • Author : Anthony C. Jones
  • Publisher : Royal Society of Chemistry
  • Release : 2009
  • ISBN : 0854044655
  • Pages : 600 pages

Download or read book Chemical Vapour Deposition written by Anthony C. Jones and published by Royal Society of Chemistry. This book was released on 2009 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket

Book Plasma Chemical Vapor Deposition of Thin Metal Oxide Films on Particles in the Riser of a Circulating Fluidized Bed

Download or read book Plasma Chemical Vapor Deposition of Thin Metal Oxide Films on Particles in the Riser of a Circulating Fluidized Bed written by Martin Josef Karches and published by . This book was released on 2002 with total page 114 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Design  Construction and Operation of a Chemical Vapor Deposition System of the Growth of Metal Oxide Thin Films

Download or read book Design Construction and Operation of a Chemical Vapor Deposition System of the Growth of Metal Oxide Thin Films written by John Wesley Bumgarner and published by . This book was released on 1995 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Aerosol Assisted Chemical Vapor Deposition of Copper  A Liquid Delivery Approach to Metal Thin Films

Download or read book Aerosol Assisted Chemical Vapor Deposition of Copper A Liquid Delivery Approach to Metal Thin Films written by and published by . This book was released on 1994 with total page 14 pages. Available in PDF, EPUB and Kindle. Book excerpt: Aerosol-Assisted Chemical Vapor Deposition (AACVD) has been used to attain high deposition rates (1000 A/min, up to 800 A/min at 140 deg C) of Cu films at low temperatures (120-200 deg C) from toluene solutions of (hfac)Cu(1, 5-COD) in a warm-wall reactor. The films are crystalline and exhibit resistivities close to bulk (1.7-3.5 micro omega cm). Activation energies calculated from the deposition rate as a function of the preheating temperature and the substrate temperature (varying also the nozzle-substrate distance) were 6.8, 8.9 (0.7 cm) and 9.1 (1.7 cm) kcal/mol, respectively.

Book On the Synthesis and Chemical Vapour Deposition of Group 13 Precursors Towards Metal Oxide Thin Films

Download or read book On the Synthesis and Chemical Vapour Deposition of Group 13 Precursors Towards Metal Oxide Thin Films written by L. G. Bloor and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Various routes towards novel chlorogallium bis(alkoxides) and heteroleptic gallium alkoxides have been investigated. Compounds of the type, [GaCl(OR2)2] and [Ga(OR2)2(OR')] (R = CH2CH2NMe2, CH2CH2NEt2, CH2CH2CH2NMe2; R' = Me, Et, iPr, tBu), were synthesised using air sensitive methods and analysed by a variety of techniques. The chlorogallium bis(alkoxides) showed diastereotopic NMR splitting and in depth 1H NMR studies and DFT calculations were carried out on [GaCl(OCH2CH2CH2NMe2)2] to investigate the in situ ring conversion mechanism. Thermogravimetric analysis was employed to study the decomposition characteristics of the compounds, which were then used as single-source precursors towards gallium oxide thin films using aerosol-assisted chemical vapour deposition (AACVD). Amorphous, transparent films of Ga2O3 were deposited at 450 °C onto glass and quartz substrates. Subsequent annealing at 1000 °C gave crystalline films. Nitrogen-doped indium oxide films were deposited by AACVD via the in situ reaction of [In{NtBu(SiMe3)}3] and three equivalents of HOCH2CH2NMe2. The resultant films had a range of morphologies depending on solvent and temperature employed during the deposition. The cubic phase In2O3 films deposited had band gaps of ~2.9 eV suggesting nitrogen incorporation. These films were tested on steel and titanium substrates for their visible light water-splitting properties. Films were tested for their hydrogen production but limited activity as a photocatalyst was observed in the visible region. However, In2O3 nanoparticles produced using a solvothermal method and Ti- and Ta-doped In2O3 thin films grown via AACVD were tested for their gas sensing properties. Sensors were tested against reducing oxidising gases. The In2O3 nanoparticles showed the highest response to all gases, in particular ethanol. In2O3:Ta also showed a significant response to ethanol and smaller responses to other gases. Overall, novel precursors have been used as single-source precursors to main group oxide thin films, which were deposited via AACVD. Photocatalytic and gas sensing applications of these films have been explored.