Download or read book A Very Low Pressure Chemical Vapor Deposition Process for Blanket and Selective Titanium Silicide Films written by Vida Ilderem and published by . This book was released on 1988 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book A Low Pressure Chemical Vapor Deposition Process for Titanium Disilicide Films with and Without Plasma Enhancement written by Jaegab Lee and published by . This book was released on 1991 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Research in Materials written by and published by . This book was released on 1990 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Low Pressure Chemical Vapor Deposition of Titanium Silicide written by Vida Ilderem and published by . This book was released on 1985 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Research in Materials written by Massachusetts Institute of Technology and published by . This book was released on 1990 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Physics Briefs written by and published by . This book was released on 1994 with total page 934 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Selective Rapid Thermal Chemical Vapor Deposition of Titanium Silicide written by Xiaowei Ren and published by . This book was released on 1995 with total page 244 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 2012-12-02 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Download or read book ULSI Technology written by C. Y. Chang and published by McGraw-Hill Science, Engineering & Mathematics. This book was released on 1996 with total page 756 pages. Available in PDF, EPUB and Kindle. Book excerpt: "This text follows the tradition of Sze's highly successful pioneering text on VLSI technology and is updated with the latest advances in the field of microelectronic chip fabrication. Since computer chips are foundations of modern electronics, these topics are essential for the next generation of USLI technologies, allowing more transistors to be packaged on a single chip. Contributing to each chapter are industry experts, specializing in topics such as epitaxy with low temperature process, rapid thermal processes, low damage plasma reactive ion etching, fine line litography, cleaning technology, clean room technology, packing and reliability."--
Download or read book Proceedings of the Eighth International Conference on Chemical Vapor Deposition written by J. M. Blocher and published by . This book was released on 1981 with total page 844 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Science and Engineering of Microelectronic Fabrication written by Stephen A. Campbell and published by Oxford University Press, USA. This book was released on 1996 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Science and Engineering of Microelectronic Fabrication provides an introduction to microelectronic processing. Geared towards a wide audience, it may be used as a textbook for both first year graduate and upper level undergraduate courses and as a handy reference for professionals. The text covers all the basic unit processes used to fabricate integrated circuits including photolithography, plasma and reactive ion etching, ion implantation, diffusion, oxidation, evaporation, vapor phase epitaxial growth, sputtering and chemical vapor deposition. Advanced processing topics such as rapid thermal processing, nonoptical lithography, molecular beam epitaxy, and metal organic chemical vapor deposition are also presented. The physics and chemistry of each process is introduced along with descriptions of the equipment used for the manufacturing of integrated circuits. The text also discusses the integration of these processes into common technologies such as CMOS, double poly bipolar, and GaAs MESFETs. Complexity/performance tradeoffs are evaluated along with a description of the current state-of-the-art devices. Each chapter includes sample problems with solutions. The book also makes use of the process simulation package SUPREM to demonstrate impurity profiles of practical interest.
Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition written by Jong-Hee Park and published by ASM International. This book was released on 2001 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Download or read book Selective Rapid Thermal Chemical Vapor Deposition of Titanium Silicide on Heavily Doped Silicon written by Hua Fang and published by . This book was released on 1999 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Principles of Chemical Vapor Deposition written by D.M. Dobkin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Download or read book Selective Low Pressure Chemical Vapor Deposition of TaSi 2 on Silicon written by Thomas P. Wendling and published by . This book was released on 1990 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt:
