Download or read book A Systematic Approach to Modeling Yield for Integrated Circuits written by Aparna Srinivasan and published by . This book was released on 1995 with total page 179 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Yield Simulation for Integrated Circuits written by D.M. Walker and published by Springer Science & Business Media. This book was released on 1987-09-30 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the summer of 1981 I was asked to consider the possibility of manufacturing a 600,000 transistor microprocessor in 1985. It was clear that the technology would only be capable of manufacturing 100,000-200,000 transistor chips with acceptable yields. The control store ROM occupied approximately half of the chip area, so I considered adding spare rows and columns to increase ROM yield. Laser-programmed polysilicon fuses would be used to switch between good and bad circuits. Since only half the chip area would have redundancy, I was concerned that the increase in yield would not outweigh the increased costs of testing and redundancy programming. The fabrication technology did not yet exist, so I was unable to experimentally verify the benefits of redundancy. When the technology did become available, it would be too late in the development schedule to spend time running test chips. The yield analysis had to be done analytically or by simulation. Analytic yield analysis techniques did not offer sufficient accuracy for dealing with complex structures. The simulation techniques then available were very labor-intensive and seemed more suitable for redundant memories and other very regular structures [Stapper 80J. I wanted a simulator that would allow me to evaluate the yield of arbitrary redundant layouts, hence I termed such a simulator a layout or yield simulator. Since I was unable to convince anyone to build such a simulator for me, I embarked on the research myself.
Download or read book Integrated Circuit Manufacturability written by José Pineda de Gyvez and published by John Wiley & Sons. This book was released on 1998-10-30 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt: "INTEGRATED CIRCUIT MANUFACTURABILITY provides comprehensive coverage of the process and design variables that determine the ease and feasibility of fabrication (or manufacturability) of contemporary VLSI systems and circuits. This book progresses from semiconductor processing to electrical design to system architecture. The material provides a theoretical background as well as case studies, examining the entire design for the manufacturing path from circuit to silicon. Each chapter includes tutorial and practical applications coverage. INTEGRATED CIRCUIT MANUFACTURABILITY illustrates the implications of manufacturability at every level of abstraction, including the effects of defects on the layout, their mapping to electrical faults, and the corresponding approaches to detect such faults. The reader will be introduced to key practical issues normally applied in industry and usually required by quality, product, and design engineering departments in today's design practices: * Yield management strategies * Effects of spot defects * Inductive fault analysis and testing * Fault-tolerant architectures and MCM testing strategies. This book will serve design and product engineers both from academia and industry. It can also be used as a reference or textbook for introductory graduate-level courses on manufacturing."
Download or read book Predictive Modeling of Integrated Circuit Manufacturing Variation written by Swamy V. Muddu and published by . This book was released on 2007 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt: Continuous scaling of feature sizes in CMOS integrated circuits (IC) pushes the design performance envelope as well as design complexity higher with each successive technology node. Advancements in materials and optics of the manufacturing process enable the scaling and manufacturability of devices in ICs. As device feature dimensions approach the physical limits of lithography and the manufacturing process, the smallest geometric and material variations manifest as design-level performance and power variability. One of the main pathological effects of IC scaling is the increase in design variability as a fraction of performance with each technology node. This design variability directly affects IC parametric (i.e., performance-limited) and catastrophic (i.e., defect-limited) yield, and consequently, IC cost. To address the increase in manufacturing variability in deep-submicron (DSM) technologies and to improve IC yield, a new design for manufacturability (DFM) paradigm has emerged in the recent past. The DFM paradigm encompasses a set of design methodologies that address manufacturing and process non-idealities at the design level to make ICs more robust to variations. DFM is also interpreted as a set of post-layout design fixing techniques that enhance and ease manufacturability. In general, the objective of DFM is to improve IC yield and cost by increasing manufacturing-awareness in the design phase, as well as design-awareness in the manufacturing phase. To achieve this dual objective of DFM, design must be driven by models of variation in the manufacturing process and the manufacturing process, must be made aware of the design intent. Variations in the IC manufacturing process are manifested as (1) deviation from the intended shapes of IC geometries, and (2) variations in impurity (i.e., dopant) concentrations. These variations are composed of systematic and random components. The systematic component of variation can be attributed to specific sources in the manufacturing process, while the random component is usually a result of confounding of several sources of variation and cannot be attributed to specific sources. A significant fraction of the total variation in shapes of IC geometries is systematic in sources such as focus, exposure dose, lens aberrations, etc. The objective of this thesis is to model the impact of the raw sources of variation at the mask making and wafer pattern transfer phases in manufacturing. The primary goal in the associated research is to develop models that can drive systematic variation-aware design. We propose techniques to model the impact of mask-level and wafer-level sources of variation on IC geometries. At the mask-level, proximity effects and resist heating caused by electron-beam writing are the two main sources of mask critical dimension (CD) errors. We propose a novel methodology to model resist heating caused by electron-beam writing on the mask resist. We use the resist heating model to drive temperature-aware mask writing schedules that minimize resist temperature, and consequently minimize mask CD error. Sub-wavelength optical lithography in sub-100nm technology nodes is enabled by resolution enhancement techniques (RETs) that allow patterning of layout features on silicon wafers. Optical proximity correction (OPC) is the most prominent RET used to compensate a design layout for optical and process effects prior to mask making and lithography. OPC modifies the shapes of layout features, and consequently increases mask complexity and cost. We develop a model of post-OPC mask cost of design features, to drive design-aware mask cost optimization. Despite advanced RETs and illumination techniques, several sources of variation in the pattern transfer process result in variations in chip-level performance and power. At 45nm and below, accurate design-level performance and power analyses must consider litho-simulated non-idealities in patterning. However, the simulation of exposure, resist and etch processing steps in lithography is computationally expensive to perform at chip-scale, and essentially infeasible during iterative design optimization. In this thesis, We develop a predictive model of post-OPC linewidth of devices in standard cells across the process window. The predictive model is fast, accurate and highly scalable, enabling its use in the design phase at full-chip scale without actually performing OPC and litho simulation. Last, we demonstrate the use of predictive linewidth models in fast and accurate leakage estimation and optimization. First, We discuss the use of through-focus systematic linewidth models to achieve accurate leakage estimation. We then discuss a novel detailed placement perturbation approach that leverages systematic pitch and focus interactions to improve leakage in light of systematic linewidth variation. These two methods demonstrate the use of predictive models of variation in driving variation-aware design analysis and optimization.
Download or read book Yield and Variability Optimization of Integrated Circuits written by Jian Cheng Zhang and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 244 pages. Available in PDF, EPUB and Kindle. Book excerpt: Traditionally, Computer Aided Design (CAD) tools have been used to create the nominal design of an integrated circuit (IC), such that the circuit nominal response meets the desired performance specifications. In reality, however, due to the disturbances ofthe IC manufacturing process, the actual performancesof the mass produced chips are different than those for the nominal design. Even if the manufacturing process were tightly controlled, so that there were little variations across the chips manufactured, the environmentalchanges (e. g. those oftemperature, supply voltages, etc. ) would alsomakethe circuit performances vary during the circuit life span. Process-related performance variations may lead to low manufacturing yield, and unacceptable product quality. For these reasons, statistical circuit design techniques are required to design the circuit parameters, taking the statistical process variations into account. This book deals with some theoretical and practical aspects of IC statistical design, and emphasizes how they differ from those for discrete circuits. It de scribes a spectrum of different statistical design problems, such as parametric yield optimization, generalized on-target design, variability minimization, per formance tunning, and worst-case design. The main emphasis of the presen tation is placed on the principles and practical solutions for performance vari ability minimization. It is hoped that the book may serve as an introductory reference material for various groups of IC designers, and the methodologies described will help them enhance the circuit quality and manufacturability. The book containsseven chapters.
Download or read book Integrated Circuit and System Design written by Enrico Macii and published by Springer. This book was released on 2004-08-24 with total page 926 pages. Available in PDF, EPUB and Kindle. Book excerpt: WelcometotheproceedingsofPATMOS2004,thefourteenthinaseriesofint- national workshops. PATMOS 2004 was organized by the University of Patras with technical co-sponsorship from the IEEE Circuits and Systems Society. Over the years, the PATMOS meeting has evolved into an important - ropean event, where industry and academia meet to discuss power and timing aspects in modern integrated circuit and system design. PATMOS provides a forum for researchers to discuss and investigate the emerging challenges in - sign methodologies and tools required to develop the upcoming generations of integrated circuits and systems. We realized this vision this year by providing a technical program that contained state-of-the-art technical contributions, a keynote speech, three invited talks and two embedded tutorials. The technical program focused on timing, performance and power consumption, as well as architectural aspects, with particular emphasis on modelling, design, charac- rization, analysis and optimization in the nanometer era. This year a record 152 contributions were received to be considered for p- sible presentation at PATMOS. Despite the choice for an intense three-day m- ting, only 51 lecture papers and 34 poster papers could be accommodated in the single-track technical program. The Technical Program Committee, with the - sistance of additional expert reviewers, selected the 85 papers to be presented at PATMOS and organized them into 13 technical sessions. As was the case with the PATMOS workshops, the review process was anonymous, full papers were required, and several reviews were received per manuscript.
Download or read book Integrated Circuit and System Design Power and Timing Modeling Optimization and Simulation written by José L. Ayala and published by Springer. This book was released on 2013-01-03 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book constitutes the refereed proceedings of the 22nd International Conference on Integrated Circuit and System Design, PATMOS 2012, held in Newcastle, UK Spain, in September 2012. The 25 revised full papers presented were carefully reviewed and selected from numerous submissions. The paper feature emerging challenges in methodologies and tools for the design of upcoming generations of integrated circuits and systems, including reconfigurable hardware such as FPGAs. The technical program focus on timing, performance and power consumption as well as architectural aspects with particular emphasis on modeling, design, characterization, analysis and optimization.
Download or read book Computer Aided Design of Analog Integrated Circuits and Systems written by Rob A. Rutenbar and published by John Wiley & Sons. This book was released on 2002-05-06 with total page 773 pages. Available in PDF, EPUB and Kindle. Book excerpt: The tools and techniques you need to break the analog design bottleneck! Ten years ago, analog seemed to be a dead-end technology. Today, System-on-Chip (SoC) designs are increasingly mixed-signal designs. With the advent of application-specific integrated circuits (ASIC) technologies that can integrate both analog and digital functions on a single chip, analog has become more crucial than ever to the design process. Today, designers are moving beyond hand-crafted, one-transistor-at-a-time methods. They are using new circuit and physical synthesis tools to design practical analog circuits; new modeling and analysis tools to allow rapid exploration of system level alternatives; and new simulation tools to provide accurate answers for analog circuit behaviors and interactions that were considered impossible to handle only a few years ago. To give circuit designers and CAD professionals a better understanding of the history and the current state of the art in the field, this volume collects in one place the essential set of analog CAD papers that form the foundation of today's new analog design automation tools. Areas covered are: * Analog synthesis * Symbolic analysis * Analog layout * Analog modeling and analysis * Specialized analog simulation * Circuit centering and yield optimization * Circuit testing Computer-Aided Design of Analog Integrated Circuits and Systems is the cutting-edge reference that will be an invaluable resource for every semiconductor circuit designer and CAD professional who hopes to break the analog design bottleneck.
Download or read book Integrated Circuit Design Power and Timing Modeling Optimization and Simulation written by Bertrand Hochet and published by Springer Science & Business Media. This book was released on 2002-08-28 with total page 510 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book constitutes the refereed proceedings of the 12th International Workshop on Power and Timing Modeling, Optimization and Simulation, PATMOS 2002, held in Seville, Spain in September 2002. The 37 revised full papers and 12 poster papers presented were carefully reviewed and selected from numerous submissions. The papers are organized in topical sections on arithmetics, low-level modeling and characterization, asynchronous and adiabatic techniques, CAD tools and algorithms, timing, gate-level modeling and design, and communications modeling and activity reduction.
Download or read book Yield reliability Modeling for Integrated Circuits written by Thomas S. Barnett and published by . This book was released on 2002 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Recent Topics on Modeling of Semiconductor Processes Devices and Circuits written by Rasit Onur Topaloglu and published by Bentham Science Publishers. This book was released on 2011-09-09 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The last couple of years have been very busy for the semiconductor industry and researchers. The rapid speed of production channel length reduction has brought lithographic challenges to semiconductor modeling. These include stress optimization, transisto"
Download or read book Integrated Circuit and System Design written by Jos Monteiro and published by . This book was released on 2010-10-25 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Selected Papers on Statistical Design of Integrated Circuits written by Andrzej J. Strojwas and published by . This book was released on 1987 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Design for Manufacturability and Statistical Design written by Michael Orshansky and published by Springer Science & Business Media. This book was released on 2007-10-28 with total page 319 pages. Available in PDF, EPUB and Kindle. Book excerpt: Design for Manufacturability and Statistical Design: A Comprehensive Approach presents a comprehensive overview of methods that need to be mastered in understanding state-of-the-art design for manufacturability and statistical design methodologies. Broadly, design for manufacturability is a set of techniques that attempt to fix the systematic sources of variability, such as those due to photolithography and CMP. Statistical design, on the other hand, deals with the random sources of variability. Both paradigms operate within a common framework, and their joint comprehensive treatment is one of the objectives of this book and an important differentation.
Download or read book Reliability Yield and Stress Burn In written by Way Kuo and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 407 pages. Available in PDF, EPUB and Kindle. Book excerpt: The international market is very competitive for high-tech manufacturers to day. Achieving competitive quality and reliability for products requires leader ship from the top, good management practices, effective and efficient operation and maintenance systems, and use of appropriate up-to-date engineering de sign tools and methods. Furthermore, manufacturing yield and reliability are interrelated. Manufacturing yield depends on the number of defects found dur ing both the manufacturing process and the warranty period, which in turn determines the reliability. the production of microelectronics has evolved into Since the early 1970's, one of the world's largest manufacturing industries. As a result, an important agenda is the study of reliability issues in fabricating microelectronic products and consequently the systems that employ these products, particularly, the new generation of microelectronics. Such an agenda should include: • the economic impact of employing the microelectronics fabricated by in dustry, • a study of the relationship between reliability and yield, • the progression toward miniaturization and higher reliability, and • the correctness and complexity of new system designs, which include a very significant portion of software.
Download or read book Fundamentals of Semiconductor Manufacturing and Process Control written by Gary S. May and published by John Wiley & Sons. This book was released on 2006-05-26 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt: A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Download or read book The Circuits and Filters Handbook written by Wai-Kai Chen and published by CRC Press. This book was released on 2002-12-23 with total page 3076 pages. Available in PDF, EPUB and Kindle. Book excerpt: A bestseller in its first edition, The Circuits and Filters Handbook has been thoroughly updated to provide the most current, most comprehensive information available in both the classical and emerging fields of circuits and filters, both analog and digital. This edition contains 29 new chapters, with significant additions in the areas of computer-