Download or read book A Numerical and Experimental Investigation of the Fluid Dynamics and Heat Transfer in a Barrel type Chemical Vapor Deposition CVD Reactor microform written by Shih, Ping-Ho Samuel and published by Ann Arbor, Mich. : University Microfilms International. This book was released on 1988 with total page 530 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book A Numerical Investigation of the Axial Flow and Heat Transfer in a Barrel type Chemical Vapor Deposition CVD Reactor written by P. Shih and published by . This book was released on 1988 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Experimental Study of Flow and Heat Transfer in a Rotating Chemical Vapor Deposition Reactor written by Sun Wong and published by . This book was released on 2015 with total page 54 pages. Available in PDF, EPUB and Kindle. Book excerpt: An experimental model was set up to study the rotating vertical impinging chemical vapor deposition reactor. Deposition occurs only when the system has enough thermal energy. Therefore, understanding the fluid characteristic and heat transfer of the system will provide a good basis to understand the full model. Growth rate and the uniformity of the film are the two most important factors in CVD process and it is depended on the flow and thermal characteristic within the system. Optimizing the operating parameters will result in better growth rate and uniformity. Operating parameters such as inflow velocity, inflow diameter and rotational speed are used to create different design simulations. Fluid velocities and various temperatures are recorded to see the effects of the different operating parameters. Velocities are recorded by using flow meter and hot wire anemometer. Temperatures are recorded by using various thermocouples and infrared thermometer. The result should provide a quantitative basis for the prediction, design and optimization of the system and process for design and fabrication of future CVD reactors. Further assessment of the system results will be discuss in detail such as effects of buoyancy and effects of rotation. The experimental study also coupled with a numerical study for further validation of both model. Comparisons between the two models are also presented.
Download or read book Flow Structure and Heat Transfer in an Impinging Jet CVD Reactor written by Nasir Memon and published by . This book was released on 2009 with total page 67 pages. Available in PDF, EPUB and Kindle. Book excerpt: A detailed experimental study is undertaken to investigate the flow structure and heat transfer in an impinging jet Chemical Vapor Deposition (CVD) reactor at atmospheric pressure. It is critical to develop models that predict flow patterns in such a reactor to achieve uniform deposition across the substrate. Free convection can negatively affect the gas flow as cold inlet gas impinges on the heated substrate, leading to vortices and disturbances in the normal flow path. This experimental research will be used to understand the buoyancy-induced and momentum-driven flow structure encountered in an impinging jet CVD reactor. Investigations are conducted for various operational parameters such as substrate temperature and inlet velocity. In addition, different reactor geometries with varying inlet length and height between the substrate and inlet are included in the study. Experimental results obtained from the study provide information on the temperature distribution, heat transfer rates, and flow field. Such results validate the operation of the reactor at atmospheric pressure and provide valuable insight into future design of impinging jet CVD reactors.
Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Download or read book Characterization of Metalorganic Chemical Vapor Deposition written by National Aeronautics and Space Administration (NASA) and published by . This book was released on 2018-08-16 with total page 26 pages. Available in PDF, EPUB and Kindle. Book excerpt: A series of experimental and numerical investigations to develop a more complete understanding of the reactive fluid dynamics of chemical vapor deposition were conducted. In the experimental phases of the effort, a horizontal CVD reactor configuration was used for the growth of InP at UVA and for laser velocimetry measurements of the flow fields in the reactor at LaRC. This horizontal reactor configuration was developed for the growth of III-V semiconductors and has been used by our research group in the past to study the deposition of both GaAs and InP. While the ultimate resolution of many of the heat and mass transport issues will require access to a reduced-gravity environment, the series of groundbased research makes direct contributions to this area while attempting to answer the design questions for future experiments of how low must gravity be reduced and for how long must this gravity level be maintained to make the necessary measurements. It is hoped that the terrestrial experiments will be useful for the design of future microgravity experiments which likely will be designed to employ a core set of measurements for applications in the microgravity environment such as HOLOC, the Fluid Physics/Dynamics Facility, or the Schlieren photography, the Laser Imaging Velocimetry and the Laser Doppler Velocimetry instruments under development for the Advanced Fluids Experiment Module. Jesser, W. A. Langley Research Center NGT-70404...
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Download or read book Principles of Chemical Vapor Deposition written by D.M. Dobkin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Download or read book Evaluation of Fluid Dynamic Effect on Thin Film Growth in a Horizontal Type Meso scale Chemical Vapor Deposition Reactor Using Computational Fluid Dynamics written by Sahar Tabatabaei Sadeghi and published by . This book was released on 2013 with total page 103 pages. Available in PDF, EPUB and Kindle. Book excerpt: To design and analyze chemical vapor deposition (CVD) reactors, computer models are regularly utilized. The foremost aim of this thesis research is to understand how thin film uniformity can be controlled in a CVD reactor. A complete understanding of chemical reactions that take place both in gas phase and at the deposition surface is required to predict thin film properties such as growth rate and composition precisely, however, deposition rates and surface topography can be determined by the arrival flux of reactants in a mass-transfer limited regime. In order to understand experimental thickness and roughness uniformity, a predictive model has been developed to study the fluid dynamic effect on thin film growth in a horizontal type reactor using velocity, temperature, pressure and viscosity as tunable parameters upon which velocity profiles within a CVD reactor have been evaluated using computational fluid dynamic (CFD) calculations. Through this predictive model, it is shown that fluid velocity is the major variable contributing to transverse roll cell formation compared to temperature and pressure gradients present during thin film deposition in a meso-scale CVD reactor. These results provide a physical insight regarding improved reactor operation conditions that influence uniformity.
Download or read book A Numerical Investigation of Fluid and Heat Flow in a Horizontal Chemical Vapor Deposition Reactor written by Ricardo A. Morales and published by . This book was released on 1990 with total page 244 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book CVD XII written by Klavs F. Jensen and published by . This book was released on 1993 with total page 460 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Numerical Modeling Tools for Chemical Vapor Deposition written by National Aeronautics and Space Adm Nasa and published by Independently Published. This book was released on 2018-11-07 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt: Development of general numerical simulation tools for chemical vapor deposition (CVD) was the objective of this study. Physical models of important CVD phenomena were developed and implemented into the commercial computational fluid dynamics software FLUENT. The resulting software can address general geometries as well as the most important phenomena occurring with CVD reactors: fluid flow patterns, temperature and chemical species distribution, gas phase and surface deposition. The physical models are documented which are available and examples are provided of CVD simulation capabilities. Jasinski, Thomas J. and Childs, Edward P. Unspecified Center...
Download or read book A Study of Fluid Flow Heat Transfer and Particle Deposition in Chemical Vapor Deposition Processes written by Shao-Luen Chou and published by . This book was released on 1999 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Flow and Heat Transfer in External Chemical Vapor Deposition Including the Effects of Chemistry written by Cheng-Kuan Wu and published by . This book was released on 1997 with total page 322 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition written by Jong-Hee Park and published by ASM International. This book was released on 2001 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt:
